Takemiya; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takemiya; Satoshi.The latest application filed is for "single-crystal silicon-carbide substrate and polishing solution".

Company Profile

0.6.17

Takemiya; Satoshi - Tokyo JP
Takemiya; Satoshi - Chiyoda-ku JP
Takemiya; Satoshi - Yokohama-shi JP
Takemiya; Satoshi - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Single-crystal silicon-carbide substrate and polishing solution Grant 10,138,397 - Yoshida , et al. Nov	2018-11-27
Single crystal silicon-carbide substrate and polishing solution Grant 10,040,972 - Yoshida , et al. August 7, 2	2018-08-07
Single-crystal Silicon-carbide Substrate And Polishing Solution App 20170342298 - Yoshida; Iori ; et al.	2017-11-30
Single-crystal Silicon-carbide Substrate And Polishing Solution App 20170283987 - YOSHIDA; Iori ; et al.	2017-10-05
Polishing method of non-oxide single-crystal substrate Grant 9,129,901 - Yoshida , et al. September 8, 2	2015-09-08
Polishing agent and polishing method Grant 9,085,714 - Yoshida , et al. July 21, 2	2015-07-21
Additive For Polishing Agent, And Polishing Method App 20140308879 - YOSHIDA; Yuiko ; et al.	2014-10-16
Single-crystal Silicon-carbide Substrate And Polishing Solution App 20140220299 - YOSHIDA; Iori ; et al.	2014-08-07
Polishing Agent And Polishing Method App 20140187043 - YOSHIDA; Iori ; et al.	2014-07-03
Polishing Agent And Polishing Method App 20140094032 - YOSHIDA; Iori ; et al.	2014-04-03
Polishing Method Of Non-oxide Single-crystal Substrate App 20140057438 - YOSHIDA; Iori ; et al.	2014-02-27
Polishing Composition And Polishing Method App 20110008965 - Takemiya; Satoshi ; et al.	2011-01-13
Polishing composition and polishing method App 20100323522 - Takemiya; Satoshi ; et al.	2010-12-23
Polishing compound, method for production thereof, and polishing method Grant 7,854,777 - Takemiya , et al. December 21, 2	2010-12-21
Polishing Composition And Method For Manufacturing Semiconductor Integrated Circuit Device App 20100099259 - TAKEMIYA; Satoshi ; et al.	2010-04-22
Method Of Polishing Glass Substrate App 20100086864 - KOJIMA; Hiroshi ; et al.	2010-04-08
Polishing Agent Composition And Method For Manufacturing Semiconductor Integrated Circuit Device App 20100035433 - TAKEMIYA; Satoshi ; et al.	2010-02-11
Polishing Composition, Polishing Method, And Method For Forming Copper Wiring For Semiconductor Integrated Circuit App 20080261400 - YOSHIDA; Iori ; et al.	2008-10-23
Polishing Compound, Method For Polishing Surface To Be Polished, And Process For Producing Semiconductor Integrated Circuit Device App 20080200033 - TAKEMIYA; Satoshi	2008-08-21
Polishing compound and method for producing semiconductor integrated circuit device App 20080171441 - Takemiya; Satoshi	2008-07-17
Polishing composition and polishing method App 20070004210 - Takemiya; Satoshi ; et al.	2007-01-04
Polishing compound, method for production thereof, and polishing method App 20040194392 - Takemiya, Satoshi ; et al.	2004-10-07
Solid electrolytic capacitor Grant 4,858,078 - Morimoto , et al. August 15, 1	1989-08-15

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