Takei; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takei; Satoshi.The latest application filed is for "composition for forming resist underlayer film for nanoimprint".

Company Profile

2.25.22

Takei; Satoshi - Toyama N/A JP
Takei; Satoshi - Funabashi JP
TAKEI; Satoshi - Funabashi-shi JP
TAKEI; Satoshi - Toyama-shi JP
Takei; Satoshi - Toyoma N/A JP
Takei, Satoshi - Chiba JP
Takei; Satoshi - Amagasakishi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Underlying coating forming composition for lithography containing compound having protected carboxyl group Grant 10,509,320 - Takei , et al. Dec	2019-12-17
Composition for forming resist underlayer film for nanoimprint Grant 9,946,158 - Takei , et al. April 17, 2	2018-04-17
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating Grant 9,134,610 - Takei , et al. September 15, 2	2015-09-15
Composition For Forming Resist Underlayer Film For Nanoimprint App 20150099070 - TAKEI; Satoshi ; et al.	2015-04-09
Underlayer coating forming composition containing dextrin ester compound Grant 8,916,327 - Takei , et al. December 23, 2	2014-12-23
Resist Underlayer Coating Forming Composition For Forming Photo-crosslinking Cured Resist Underlayer Coating App 20130189850 - TAKEI; Satoshi ; et al.	2013-07-25
Resist underlayer film forming composition containing liquid additive Grant 8,481,247 - Horiguchi , et al. July 9, 2	2013-07-09
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating Grant 8,426,111 - Takei , et al. April 23, 2	2013-04-23
Composition for forming resist underlayer film for lithography and production method of semiconductor device Grant 8,283,103 - Imamura , et al. October 9, 2	2012-10-09
Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing Grant 8,227,172 - Horiguchi , et al. July 24, 2	2012-07-24
Composition For Forming Resist Underlayer Film For Nanoimprint App 20120128891 - Takei; Satoshi ; et al.	2012-05-24
Underlayer coating forming composition for lithography containing polysilane compound Grant 8,163,460 - Takei , et al. April 24, 2	2012-04-24
Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom Grant 8,088,546 - Takei , et al. January 3, 2	2012-01-03
Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating Grant 8,048,615 - Takei , et al. November 1, 2	2011-11-01
Acrylic polymer-containing gap fill material forming composition for lithography Grant 8,007,979 - Takei , et al. August 30, 2	2011-08-30
Composition For Forming Resist Underlayer Film For Lithography And Production Method Of Semiconductor Device App 20110045404 - Imamura; Hikaru ; et al.	2011-02-24
Method for manufacturing semiconductor device using quadruple-layer laminate Grant 7,842,620 - Takei , et al. November 30, 2	2010-11-30
Composition for forming nitride coating film for hard mask Grant 7,727,902 - Takei , et al. June 1, 2	2010-06-01
Underlayer coating forming composition for lithography containing cyclodextrin compound Grant 7,687,223 - Takei , et al. March 30, 2	2010-03-30
Method for manufacturing semiconductor device using quadruple-layer laminate App 20100022089 - Takei; Satoshi ; et al.	2010-01-28
Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing App 20100022092 - Horiguchi; Yusuke ; et al.	2010-01-28
Resist Underlayer Film Forming Composition Containing Liquid Additive App 20090311624 - Horiguchi; Yusuke ; et al.	2009-12-17
Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating App 20090162782 - Takei; Satoshi ; et al.	2009-06-25
Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating App 20090130594 - Takei; Satoshi ; et al.	2009-05-21
Composition for forming gap-filling material for lithography Grant 7,517,633 - Takei , et al. April 14, 2	2009-04-14
Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound App 20080318158 - Takei; Satoshi ; et al.	2008-12-25
Composition for forming anti-reflective coating for use in lithography Grant 7,425,347 - Takei , et al. September 16, 2	2008-09-16
Underlayer Coating Forming Composition For Lythography Containing Compound Having Protected Carboxyl Group App 20080102649 - Takei; Satoshi ; et al.	2008-05-01
Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating Grant 7,365,023 - Takei , et al. April 29, 2	2008-04-29
Alkali-soluble gap fill material forming composition for lithography Grant 7,361,718 - Takei , et al. April 22, 2	2008-04-22
Underlayer Coating Forming Composition For Lithography Containing Cyclodextrin Compound App 20070292767 - Takei; Satoshi ; et al.	2007-12-20
Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom App 20070238029 - Takei; Satoshi ; et al.	2007-10-11
Composition for forming nitride coating film for hard mask App 20070148557 - Takei; Satoshi ; et al.	2007-06-28
Underlayer coating forming composition containing dextrin ester compound App 20070135581 - Takei; Satoshi ; et al.	2007-06-14
Underlayer coating forming composition for lithography containing compound having protected carboxyl group Grant 7,226,721 - Takei , et al. June 5, 2	2007-06-05
Porous underlayer film and underlayer film forming composition used for forming the same App 20060211256 - Takei; Satoshi ; et al.	2006-09-21
Composition for forming lower layer film for lithography comprising compound having protected carboxyl group App 20060210915 - Takei; Satoshi ; et al.	2006-09-21
Acrylic polymer-containing gap filler forming composition for lithography App 20060068526 - Takei; Satoshi ; et al.	2006-03-30
Alkali-soluble gap filling material forming composition for lithography App 20060041078 - Takei; Satoshi ; et al.	2006-02-23
Composition for forming anti-reflective coating for use in lithography App 20050008964 - Takei, Satoshi ; et al.	2005-01-13
Lithographic gap-filler forming composition App 20030146416 - Takei, Satoshi ; et al.	2003-08-07
Thermosetting anti-reflective coatings for full-fill dual damascene process App 20020132123 - Takei, Satoshi ; et al.	2002-09-19
Aqueous solution containing a quinolone carboxylic acid Grant 4,780,465 - Ogata , et al. October 25, 1	1988-10-25

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