| Patent | Date |
|---|
Polymer Material For Self-assembly, Self-assembled Film, Method Of Producing Self-assembled Film, And Projection And Depression Pattern
App 20180282466 - TAKEDA; Takanobu ; et al. | 2018-10-04 |
Continuous Reaction Apparatus And Method Of Continuous Polymerization Using The Same
App 20170022300 - HIRAHARA; Kazuhiro ; et al. | 2017-01-26 |
Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device
Grant 9,448,482 - Iwato , et al. September 20, 2 | 2016-09-20 |
Pattern Forming Method, Resist Pattern Formed By The Method, Method For Manufacturing Electronic Device Using The Same, And Electronic Device
App 20150253673 - IWATO; Kaoru ; et al. | 2015-09-10 |
Chemically amplified negative resist composition and patterning process
Grant 9,075,306 - Takeda , et al. July 7, 2 | 2015-07-07 |
Adhesive composition and adhesive dry film
Grant 8,889,810 - Takeda , et al. November 18, 2 | 2014-11-18 |
Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts
Grant 8,729,148 - Asai , et al. May 20, 2 | 2014-05-20 |
Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film
Grant 8,697,333 - Soga , et al. April 15, 2 | 2014-04-15 |
Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film
Grant 8,481,244 - Takeda , et al. July 9, 2 | 2013-07-09 |
Silphenylene skeleton-containing silicone type polymer and method for manufacturing the same
Grant 8,476,379 - Yasuda , et al. July 2, 2 | 2013-07-02 |
Alcoholic hydroxyl-containing compounds and making method
Grant 8,378,148 - Sakurai , et al. February 19, 2 | 2013-02-19 |
Preparation process of chemically amplified resist composition
Grant 8,367,295 - Masunaga , et al. February 5, 2 | 2013-02-05 |
Photomask blank, resist pattern forming process, and photomask preparation process
Grant 8,343,694 - Koitabashi , et al. January 1, 2 | 2013-01-01 |
Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation
Grant 8,263,308 - Tagami , et al. September 11, 2 | 2012-09-11 |
Chemically amplified positive resist composition and resist patterning process
Grant 8,252,518 - Tanaka , et al. August 28, 2 | 2012-08-28 |
Adhesive Composition And Adhesive Dry Film
App 20120213993 - TAKEDA; Takanobu ; et al. | 2012-08-23 |
Chemically-amplified positive resist composition and patterning process thereof
Grant 8,202,677 - Takeda , et al. June 19, 2 | 2012-06-19 |
Synthesis of photoresist polymer
Grant 8,193,307 - Takeda , et al. June 5, 2 | 2012-06-05 |
Photocurable Resin Composition, Dry Film Thereof, Pattern Forming Method, And Electrical/electronic Part Protective Film
App 20120094222 - SOGA; Kyoko ; et al. | 2012-04-19 |
Resist patterning process and manufacturing photo mask
Grant 8,110,335 - Takeda , et al. February 7, 2 | 2012-02-07 |
Photomask Blank, Resist Pattern Forming Process, And Photomask Preparation Process
App 20110294047 - Koitabashi; Ryuji ; et al. | 2011-12-01 |
Novel Silphenylene Skeleton-containing Silicone Type Polymer And Method For Manufacturing The Same
App 20110275768 - YASUDA; Hiroyuki ; et al. | 2011-11-10 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20110177464 - Takeda; Takanobu ; et al. | 2011-07-21 |
Resist composition and patterning process
Grant 7,977,027 - Takeda , et al. July 12, 2 | 2011-07-12 |
Photocurable Dry Film, Method For Preparing Same, Patterning Method And Film For Protecting Electric And Electronic Parts
App 20110143092 - ASAI; Satoshi ; et al. | 2011-06-16 |
Positive resist composition and patterning process using the same
Grant 7,923,195 - Hatakeyama , et al. April 12, 2 | 2011-04-12 |
Alcoholic Hydroxyl-containing Compounds And Making Method
App 20110082321 - SAKURAI; Takato ; et al. | 2011-04-07 |
Epoxy-containing Polymer, Photo-curable Resin Composition, Patterning Process, And Electric/electronic Part Protective Film
App 20110076465 - Takeda; Takanobu ; et al. | 2011-03-31 |
Positive resist composition and patterning process using the same
Grant 7,887,991 - Hatakeyama , et al. February 15, 2 | 2011-02-15 |
Novel Polyimide Silicone, Photosensitive Resin Composition Containing The Novel Polyimide Silicone, And Method For Pattern Formation
App 20100233619 - TAGAMI; Shohei ; et al. | 2010-09-16 |
Chemically amplified positive resist composition and resist patterning process
App 20100167207 - Tanaka; Akinobu ; et al. | 2010-07-01 |
Bottom resist layer composition and patterning process using the same
Grant 7,745,104 - Hatakeyama , et al. June 29, 2 | 2010-06-29 |
Negative resist composition and patterning process using the same
Grant 7,655,378 - Hatakeyama , et al. February 2, 2 | 2010-02-02 |
Chemically-amplified positive resist composition and patterning process thereof
App 20100009286 - Takeda; Takanobu ; et al. | 2010-01-14 |
Resist patterning process and manufacturing photo mask
App 20100009271 - Takeda; Takanobu ; et al. | 2010-01-14 |
Resist composition and patterning process
Grant 7,618,763 - Takeda , et al. November 17, 2 | 2009-11-17 |
Resist Composition And Patterning Process
App 20090214960 - Takeda; Takanobu ; et al. | 2009-08-27 |
Positive resist composition and patterning process using the same
App 20090202947 - Hatakeyama; Jun ; et al. | 2009-08-13 |
Positive resist composition and patterning process using the same
App 20090202940 - Hatakeyama; Jun ; et al. | 2009-08-13 |
Polymer, resist composition and patterning process using the same
Grant 7,501,223 - Takeda , et al. March 10, 2 | 2009-03-10 |
Polymers, positive resist compositions and patterning process
Grant 7,491,483 - Hatakeyama , et al. February 17, 2 | 2009-02-17 |
Synthesis Of Photoresist Polymer
App 20090030177 - TAKEDA; Takanobu ; et al. | 2009-01-29 |
Resist composition and patterning process
Grant 7,476,486 - Hatakeyama , et al. January 13, 2 | 2009-01-13 |
Photomask Blank, Resist Pattern Forming Process, And Photomask Preparation Process
App 20080305411 - KOITABASHI; Ryuji ; et al. | 2008-12-11 |
Positive resist compositions and patterning process
Grant 7,449,277 - Hatakeyama , et al. November 11, 2 | 2008-11-11 |
Preparation Process Of Chemically Amplified Resist Composition
App 20080274422 - Masunaga; Keiichi ; et al. | 2008-11-06 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20080241751 - TAKEDA; Takanobu ; et al. | 2008-10-02 |
Photoresist undercoat-forming material and patterning process
Grant 7,416,833 - Hatakeyama , et al. August 26, 2 | 2008-08-26 |
Resist Composition And Patterning Process
App 20080096128 - TAKEDA; Takanobu ; et al. | 2008-04-24 |
Novel polymer, resist composition and patterning process using the same
App 20080090179 - Takeda; Takanobu ; et al. | 2008-04-17 |
Bottom resist layer composition and patterning process using the same
App 20080038662 - Hatakeyama; Jun ; et al. | 2008-02-14 |
Negative resist composition and patterning process using the same
App 20080020290 - Hatakeyama; Jun ; et al. | 2008-01-24 |
Novel polymer, positive resist composition and patterning process using the same
App 20080020289 - Hatakeyama; Jun ; et al. | 2008-01-24 |
Self-assembling polymer film material, self-assembled pattern, and pattern forming method
App 20070219338 - Takeda; Takanobu ; et al. | 2007-09-20 |
Resist composition and patterning process
Grant 7,267,923 - Takeda , et al. September 11, 2 | 2007-09-11 |
Polymers, positive resist compositions and patterning process
App 20070207408 - Hatakeyama; Jun ; et al. | 2007-09-06 |
Resist Composition And Patterning Process
App 20070148584 - Takeda; Takanobu ; et al. | 2007-06-28 |
Resist composition and patterning process
Grant 7,232,638 - Hatakeyama , et al. June 19, 2 | 2007-06-19 |
Negative Resist Composition And Patterning Process
App 20070111139 - TAKEDA; Takanobu ; et al. | 2007-05-17 |
Resist Composition And Patterning Process
App 20070105042 - TAKEDA; Takanobu ; et al. | 2007-05-10 |
Positive resist compositions and patterning process
App 20070072115 - Hatakeyama; Jun ; et al. | 2007-03-29 |
Polymer, resist composition and patterning process
Grant 7,135,269 - Hatakeyama , et al. November 14, 2 | 2006-11-14 |
Resist composition and patterning process
App 20060188809 - Hatakeyama; Jun ; et al. | 2006-08-24 |
Positive resist composition, and patterning process using the same
App 20060183051 - Takeda; Takanobu ; et al. | 2006-08-17 |
Negative resist composition and patterning process
App 20060166133 - Koitabashi; Ryuji ; et al. | 2006-07-27 |
Silicon-containing polymer, resist composition and patterning process
Grant 6,994,945 - Takeda , et al. February 7, 2 | 2006-02-07 |
Silicon-containing polymer, resist composition and patterning process
Grant 6,994,946 - Hatakeyama , et al. February 7, 2 | 2006-02-07 |
Photoresist undercoat-forming material and patterning process
App 20060014106 - Hatakeyama; Jun ; et al. | 2006-01-19 |
Resist polymer, making method, and chemically amplified positive resist composition
App 20050271978 - Takeda, Takanobu ; et al. | 2005-12-08 |
Polymer, resist composition and patterning process
App 20050260521 - Hatakeyama, Jun ; et al. | 2005-11-24 |
Resist composition and patterning process
Grant 6,949,323 - Takeda , et al. September 27, 2 | 2005-09-27 |
Silicon-containing polymer, resist composition and patterning process
Grant 6,919,161 - Hatakeyama , et al. July 19, 2 | 2005-07-19 |
Silicon-containing polymer, resist composition and patterning process
Grant 6,902,772 - Takeda , et al. June 7, 2 | 2005-06-07 |
Resist composition and patterning process
Grant 6,869,748 - Takeda , et al. March 22, 2 | 2005-03-22 |
Negative resist material and pattern formation method using the same
Grant 6,861,198 - Takeda , et al. March 1, 2 | 2005-03-01 |
Chemical amplification, positive resist compositions
Grant 6,838,224 - Ohsawa , et al. January 4, 2 | 2005-01-04 |
Preparation of polymer, and resist composition using the polymer
Grant 6,835,804 - Takeda , et al. December 28, 2 | 2004-12-28 |
Preparation of polymer and resist composition
App 20040260031 - Takeda, Takanobu ; et al. | 2004-12-23 |
Silicon-containing polymer, resist composition and patterning process
App 20040242821 - Hatakeyama, Jun ; et al. | 2004-12-02 |
Resist composition and patterning process
Grant 6,746,817 - Takeda , et al. June 8, 2 | 2004-06-08 |
Chemical amplification resist compositions
Grant 6,737,214 - Takeda , et al. May 18, 2 | 2004-05-18 |
Resist compostion and patterning process
App 20040023153 - Takeda, Takanobu ; et al. | 2004-02-05 |
Negative resist material and pattern formation method using the same
App 20040023151 - Takeda, Takanobu ; et al. | 2004-02-05 |
Chemical amplification, positive resist compositions
Grant 6,682,869 - Ohsawa , et al. January 27, 2 | 2004-01-27 |
Silicon-containing polymer, resist composition and patterning process
App 20040013980 - Hatakeyama, Jun ; et al. | 2004-01-22 |
Silicon-containing polymer, resist composition and patterning process
App 20040006191 - Takeda, Takanobu ; et al. | 2004-01-08 |
Resist composition and patterning process
App 20030224291 - Hatakeyama, Jun ; et al. | 2003-12-04 |
Chemical amplification type resist composition
Grant 6,653,044 - Takeda , et al. November 25, 2 | 2003-11-25 |
Resist composition and patterning process
Grant 6,641,975 - Takeda , et al. November 4, 2 | 2003-11-04 |
Resist composition and patterning process
App 20030118934 - Takeda, Takanobu ; et al. | 2003-06-26 |
Silicon-containing polymer, resist composition and patterning process
App 20020168581 - Takeda, Takanobu ; et al. | 2002-11-14 |
Resist compositions and patterning process
Grant 6,455,223 - Hatakeyama , et al. September 24, 2 | 2002-09-24 |
Preparation of polymer, and resist composition using the polymer
App 20020111459 - Takeda, Takanobu ; et al. | 2002-08-15 |
Resist composition and patterning process
App 20020081521 - Takeda, Takanobu ; et al. | 2002-06-27 |
Resist composition and patterning process
App 20020039701 - Takeda, Takanobu ; et al. | 2002-04-04 |
Chemical amplification, positive resist compositions
App 20010038971 - Ohsawa, Youichi ; et al. | 2001-11-08 |
Ester compounds, polymers, resist compositions and patterning process
Grant 6,312,867 - Kinsho , et al. November 6, 2 | 2001-11-06 |
Chemically amplified positive resist composition and patterning method
App 20010035394 - Takeda, Takanobu ; et al. | 2001-11-01 |
Chemical amplification type resist composition
App 20010036593 - Takeda, Takanobu ; et al. | 2001-11-01 |
Chemical amplification, positive resist compositions
App 20010033994 - Ohsawa, Youichi ; et al. | 2001-10-25 |
Chemical amplification resist compositions
App 20010031421 - Takeda, Takanobu ; et al. | 2001-10-18 |
Positive resist composition
Grant 6,156,481 - Takeda , et al. December 5, 2 | 2000-12-05 |
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