Takebe; Yoko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takebe; Yoko.The latest application filed is for "pellicle for lithography, pellicle-mounted photomask, and exposure treatment method".

Company Profile

0.17.26

Takebe; Yoko - Tokyo JP
Takebe; Yoko - Chiyoda-ku JP
Takebe; Yoko - Kanagawa JP
Takebe; Yoko - Yokohama-shi JP
Takebe; Yoko - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method Grant 9,223,200 - Takebe December 29, 2	2015-12-29
Pellicle For Lithography, Pellicle-mounted Photomask, And Exposure Treatment Method App 20140147773 - TAKEBE; Yoko	2014-05-29
Fluorine-containing Aromatic Compound, Organic Semiconductor Material And Organic Thin Film Device App 20130119363 - SASAKI; Takashi ; et al.	2013-05-16
Fluorinated compound, fluoropolymer and method for producing the compound Grant 8,236,901 - Murata , et al. August 7, 2	2012-08-07
Coating Material Composition For Liquid Immersion Exposure Apparatus, Laminate, Method For Forming Laminate, And Liquid Immersion Exposure Apparatus App 20120156504 - TAKEBE; Yoko ; et al.	2012-06-21
Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for impart Grant 8,178,983 - Ishibashi , et al. May 15, 2	2012-05-15
Fluorocompound Having Highly Fluorinated Norbornane Structure, Fluoropolymer, And Their Production Processes App 20120065347 - MATSUKAWA; Yasuhisa ; et al.	2012-03-15
Fluorocompound having highly fluorinated norbornane structure, fluoropolymer, and their production processes Grant 8,134,033 - Matsukawa , et al. March 13, 2	2012-03-13
Water Repellant Composition For Substrate To Be Exposed, Method For Forming Resist Pattern, Electronic Device Produced By The Formation Method, Treatment Method For Imparting Water Repellency To Substrate To Be Exposed, Water Repellant Set For Substrate To Be Exposed, And Treatment Method For Impart App 20110221077 - Ishibashi; Takeo ; et al.	2011-09-15
Novel Fluorinated Compound, Fluoropolymer And Method For Producing The Compound App 20100317808 - MURATA; Koichi ; et al.	2010-12-16
Fluorinated compound, fluoropolymer and method for producing the compound Grant 7,825,275 - Murata , et al. November 2, 2	2010-11-02
Novel Fluorinated Compound, Fluoropolymer And Method For Producing The Compound App 20100016532 - Murata; Koichi ; et al.	2010-01-21
Fluorinated Compound, And Fluoropolymer, Process For Its Production And Resist Composition Containing It App 20090221845 - Takebe; Yoko ; et al.	2009-09-03
Fluorocompound Having Highly Fluorinated Norbornane Structure, Fluoropolymer, And Their Production Processes App 20090192330 - MATSUKAWA; Yasuhisa ; et al.	2009-07-30
Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it Grant 7,550,545 - Takebe , et al. June 23, 2	2009-06-23
Material For Resist Protective Film For Immersion Lithography App 20090061360 - Takebe; Yoko ; et al.	2009-03-05
Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film Grant 7,498,393 - Takebe , et al. March 3, 2	2009-03-03
Fluorinated Compound, And Fluoropolymer, Process For Its Production And Resist Composition Containing It App 20070207409 - TAKEBE; Yoko ; et al.	2007-09-06
Fluorinated compound, fluoropolymer and process for its production Grant 7,244,545 - Takebe , et al. July 17, 2	2007-07-17
Fluorinated Compound, Fluoropolymer, Resist Composition, And Composition For Resist Protective Film App 20070154844 - TAKEBE; Yoko ; et al.	2007-07-05
Fluorocopolymer, method for its production and resist composition containing it App 20070083021 - Eda; Masataka ; et al.	2007-04-12
Fluorinated compound, fluoropolymer and process for its production App 20060188816 - Takebe; Yoko ; et al.	2006-08-24
Fluoropolymer and resist composition Grant 7,091,294 - Takebe , et al. August 15, 2	2006-08-15
Fluorinated copolymer process for its production and resist composition containing it App 20060135663 - Takebe; Yoko ; et al.	2006-06-22
Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it App 20060122348 - Takebe; Yoko ; et al.	2006-06-08
Fluoropolymer Grant 7,026,416 - Kawaguchi , et al. April 11, 2	2006-04-11
Fluorinated compound, fluoropolymer and process for its production Grant 7,015,366 - Kodama , et al. March 21, 2	2006-03-21
Fluorinated compound, fluoropolymer and process for its production Grant 6,984,704 - Kodama , et al. January 10, 2	2006-01-10
Fluorinated compound, fluoropolymer and process for its production App 20060004164 - Kodama; Shun-ichi ; et al.	2006-01-05
Fluoropolymer and resist composition App 20050234206 - Takebe, Yoko ; et al.	2005-10-20
Fluoropolymer App 20050209409 - Kawaguchi, Yasuhide ; et al.	2005-09-22
Resist composition App 20050202345 - Kawaguchi, Yasuhide ; et al.	2005-09-15
Resist composition Grant 6,916,590 - Kaneko , et al. July 12, 2	2005-07-12
Fluorinated compound, fluoropolymer and process for its production App 20050143542 - Kodama, Shun-ichi ; et al.	2005-06-30
Fluorinated compound, fluoropolymer and process for its production Grant 6,858,692 - Kaneko , et al. February 22, 2	2005-02-22
Resist composition Grant 6,818,258 - Kaneko , et al. November 16, 2	2004-11-16
Resist composition Grant 6,815,146 - Okada , et al. November 9, 2	2004-11-09
Fluorinated compound, fluoropolymer and process for its production App 20040132940 - Kaneko, Isamu ; et al.	2004-07-08
Resist composition Grant 6,733,952 - Kaneko , et al. May 11, 2	2004-05-11
Resist composition App 20040033439 - Kaneko, Isamu ; et al.	2004-02-19
Resist composition App 20040013970 - Okada, Shinji ; et al.	2004-01-22
Resist composition App 20030148213 - Kaneko, Isamu ; et al.	2003-08-07
Resist composition App 20030130409 - Kaneko, Isamu ; et al.	2003-07-10

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