loadpatents
name:-0.018509864807129
name:-0.014791965484619
name:-0.00048089027404785
Takayasu; Jun Patent Filings

Takayasu; Jun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takayasu; Jun.The latest application filed is for "cleaning apparatus and cleaning method".

Company Profile
0.15.15
  • Takayasu; Jun - Yokkaichi JP
  • Takayasu; Jun - Mie-ken JP
  • TAKAYASU; Jun - Mie JP
  • Takayasu; Jun - Yokkaichi-shi JP
  • Takayasu; Jun - Kawasaki JP
  • Takayasu; Jun - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Cleaning apparatus and cleaning method
Grant 10,441,979 - Takagi , et al. Oc
2019-10-15
Polishing device and polishing method
Grant 10,249,518 - Adachi , et al.
2019-04-02
Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
Grant 9,947,555 - Watanabe , et al. April 17, 2
2018-04-17
Polishing apparatus, polishing method, and semiconductor manufacturing method
Grant 9,902,038 - Fukushima , et al. February 27, 2
2018-02-27
Cleaning Apparatus And Cleaning Method
App 20170053816 - TAKAGI; Jun ;   et al.
2017-02-23
Semiconductor Manufacturing Apparatus And Method Of Manufacturing Semiconductor Device
App 20170040189 - WATANABE; Takashi ;   et al.
2017-02-09
Retainer ring, polish apparatus, and polish method
Grant 9,539,696 - Fukushima , et al. January 10, 2
2017-01-10
Polish apparatus, polish method, and method of manufacturing semiconductor device
Grant 9,502,318 - Fukushima , et al. November 22, 2
2016-11-22
Polishing Device And Polishing Method
App 20160260625 - ADACHI; Masayoshi ;   et al.
2016-09-08
Semiconductor Device And Method Of Manufacturing The Same
App 20160247710 - Morita; Toshiyuki ;   et al.
2016-08-25
Polishing Apparatus, Polishing Method, And Semiconductor Manufacturing Method
App 20160233101 - FUKUSHIMA; Dai ;   et al.
2016-08-11
Polishing apparatus and polishing method
Grant 9,296,083 - Fukushima , et al. March 29, 2
2016-03-29
Polish Apparatus, Polish Method, And Method Of Manufacturing Semiconductor Device
App 20150364389 - FUKUSHIMA; Dai ;   et al.
2015-12-17
Retainer Ring, Polish Apparatus, And Polish Method
App 20150183082 - FUKUSHIMA; Dai ;   et al.
2015-07-02
Polishing Apparatus And Polishing Method
App 20140342640 - Fukushima; Dai ;   et al.
2014-11-20
Semiconductor device and method for manufacturing same
Grant 8,823,079 - Watanabe , et al. September 2, 2
2014-09-02
Semiconductor Device And Method For Manufacturing Same
App 20130334590 - WATANABE; Takashi ;   et al.
2013-12-19
Method For Fabricating Semiconductor Device
App 20120202348 - TOMIYAMA; Mio ;   et al.
2012-08-09
Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry
Grant 7,037,839 - Takayasu , et al. May 2, 2
2006-05-02
Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry
App 20060006142 - Takayasu; Jun ;   et al.
2006-01-12
Semiconductor device having high-voltage and low-voltage operation regions and method of fabricating the same
App 20050167760 - Takayasu, Jun
2005-08-04
Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive
Grant 6,878,631 - Takayasu April 12, 2
2005-04-12
Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive
App 20050026441 - Takayasu, Jun
2005-02-03
Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus
Grant 6,723,226 - Takayasu , et al. April 20, 2
2004-04-20
Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry
App 20040067652 - Takayasu, Jun ;   et al.
2004-04-08
Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive
App 20040036149 - Takayasu, Jun
2004-02-26
Abrasive and method for polishing semiconductor substrate
Grant 6,354,913 - Miyashita , et al. March 12, 2
2002-03-12
Method of manufacturing a semiconductor device and an apparatus for manufacturing the same
Grant 6,098,638 - Miyashita , et al. August 8, 2
2000-08-08
Apparatus and method for manufacturing electrolytic ionic water and washing method using electroyltic ionic water
Grant 6,007,696 - Takayasu , et al. December 28, 1
1999-12-28
Method for purifying pure water and an apparatus for the same
Grant 6,001,238 - Takayasu , et al. December 14, 1
1999-12-14

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