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Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphone
Grant 10,246,324 - Fukuzawa , et al. | 2019-04-02 |
Strain And Pressure Sensing Device, Microphone, Method For Manufacturing Strain And Pressure Sensing Device, And Method For Manufacturing Microphone
App 20180009656 - FUKUZAWA; Hideaki ; et al. | 2018-01-11 |
Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphone
Grant 9,790,087 - Fukuzawa , et al. October 17, 2 | 2017-10-17 |
Strain And Pressure Sensing Device, Microphone, Method For Manufacturing Strain And Pressure Sensing Device, And Method For Manufacturing Microphone
App 20150118779 - FUKUZAWA; Hideaki ; et al. | 2015-04-30 |
Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphone
Grant 8,958,574 - Fukuzawa , et al. February 17, 2 | 2015-02-17 |
Deep well structures with single depth shallow trench isolation regions
Grant 8,846,486 - Koburger, III , et al. September 30, 2 | 2014-09-30 |
Strain And Pressure Sensing Device, Microphone, Method For Manufacturing Strain And Pressure Sensing Device, And Method For Manufacturing Microphone
App 20130170669 - FUKUZAWA; Hideaki ; et al. | 2013-07-04 |
Deep Well Structures With Single Depth Shallow Trench Isolation Regions
App 20120178237 - Koburger, III; Charles W. ; et al. | 2012-07-12 |
Deep well structures with single depth shallow trench isolation regions
Grant 8,198,700 - Koburger, III , et al. June 12, 2 | 2012-06-12 |
Semiconductor device and method for manufacturing the same
Grant 8,134,209 - Yagishita , et al. March 13, 2 | 2012-03-13 |
Composite Material Comprising High-Molecular-Weight Matrix and Low-Molecular-Weight Organic Compound and Process For Producing Same
App 20110251281 - Taguchi; Tetsushi ; et al. | 2011-10-13 |
Deep Well Structures With Single Depth Shallow Trench Isolation Regions
App 20110175190 - Koburger, III; Charles W. ; et al. | 2011-07-21 |
Semiconductor Device And Method For Manufacturing The Same
App 20110147839 - Yagishita; Atsushi ; et al. | 2011-06-23 |
Multiple thickness and/or composition high-K gate dielectrics and methods of making thereof
Grant 7,944,004 - Takayanagi May 17, 2 | 2011-05-17 |
Programmable element and manufacturing method of semiconductor device
Grant 7,910,970 - Takayanagi March 22, 2 | 2011-03-22 |
Semiconductor device manufacturing method
Grant 7,816,215 - Matsushita , et al. October 19, 2 | 2010-10-19 |
Multiple Thickness And/or Composition High-k Gate Dielectrics And Methods Of Making Thereof
App 20100244207 - Takayanagi; Mariko | 2010-09-30 |
Semiconductor device and manufacturing method of semiconductor device
Grant 7,696,585 - Takayanagi April 13, 2 | 2010-04-13 |
Programmable Element And Manufacturing Method Of Semiconductor Device
App 20090078987 - Takayanagi; Mariko | 2009-03-26 |
Semiconductor Device And Manufacturing Method Of Semiconductor Device
App 20080203498 - TAKAYANAGI; Mariko | 2008-08-28 |
Semiconductor device includes gate insulating film having a high dielectric constant
Grant 7,396,748 - Takayanagi July 8, 2 | 2008-07-08 |
Semiconductor Device
App 20070158705 - Takayanagi; Mariko | 2007-07-12 |
Semiconductor device includes gate insulating film having a high dielectric constant
App 20050263803 - Takayanagi, Mariko | 2005-12-01 |
Semiconductor device includes gate insulating film having a high dielectric constant
Grant 6,949,425 - Takayanagi September 27, 2 | 2005-09-27 |
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof
Grant 6,927,459 - Hokazono , et al. August 9, 2 | 2005-08-09 |
Semiconductor device manufacturing method
App 20050064667 - Matsushita, Daisuke ; et al. | 2005-03-24 |
Semiconductor device and method of fabricating the same
Grant 6,746,943 - Takayanagi , et al. June 8, 2 | 2004-06-08 |
Semiconductor device and method of manufacturing the same
App 20040070037 - Takayanagi, Mariko | 2004-04-15 |
Apparatus for and method of preparing pattern data of electronic part
Grant 6,675,368 - Takayanagi , et al. January 6, 2 | 2004-01-06 |
Semiconductor device includes gate insulating film having a high dielectric constant
Grant 6,664,577 - Takayanagi December 16, 2 | 2003-12-16 |
Semiconductor device and method of fabricating the same
App 20030207555 - Takayanagi, Mariko ; et al. | 2003-11-06 |
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof
App 20030141551 - Hokazono, Akira ; et al. | 2003-07-31 |
Semiconductor device and method of fabricating the same
Grant 6,600,212 - Takayanagi , et al. July 29, 2 | 2003-07-29 |
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof
Grant 6,545,317 - Hokazono , et al. April 8, 2 | 2003-04-08 |
Semiconductor device and method of manufacturing the same
App 20020140098 - Takayanagi, Mariko | 2002-10-03 |
Semiconductor device and method of fabricating the same
App 20020130393 - Takayanagi, Mariko ; et al. | 2002-09-19 |
Apparatus for and method of preparing pattern data of electronic part
App 20020042906 - Takayanagi, Mariko ; et al. | 2002-04-11 |
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof
App 20020000611 - Hokazono, Akira ; et al. | 2002-01-03 |
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