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Patent applications and USPTO patent grants for TAKAYAMA; Takamitsu.The latest application filed is for "method of cleaning stage in plasma processing apparatus, and the plasma processing apparatus".
Patent | Date |
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Method Of Cleaning Stage In Plasma Processing Apparatus, And The Plasma Processing Apparatus App 20210162468 - TAKAYAMA; Takamitsu ;   et al. | 2021-06-03 |
Plasma processing method Grant 10,192,719 - Takayama , et al. Ja | 2019-01-29 |
Substrate Transfer Apparatus And Substrate Transfer Method App 20170004984 - NAGAIKE; Hiroshi ;   et al. | 2017-01-05 |
Plasma Processing Method App 20160196957 - TAKAYAMA; Takamitsu ;   et al. | 2016-07-07 |
Plasma processing method and plasma processing apparatus Grant 9,330,891 - Nonaka , et al. May 3, 2 | 2016-05-03 |
Plasma Processing Method And Plasma Processing Apparatus App 20150114930 - NONAKA; Ryo ;   et al. | 2015-04-30 |
Ti-based film forming method and storage medium Grant 8,263,181 - Narushima , et al. September 11, 2 | 2012-09-11 |
Ti-BASED FILM FORMING METHOD AND STORAGE MEDIUM App 20090208650 - NARUSHIMA; Kensaku ;   et al. | 2009-08-20 |
Temperature measuring device Grant 6,004,031 - Takayama , et al. December 21, 1 | 1999-12-21 |
Method and apparatus for measuring temperature using an optical fiber Grant 5,730,527 - Takayama , et al. March 24, 1 | 1998-03-24 |
Ellipsometer and method of controlling coating thickness therewith Grant 5,438,415 - Kazama , et al. August 1, 1 | 1995-08-01 |
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