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Patent applications and USPTO patent grants for Takatori; Masashige.The latest application filed is for "radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent".
Patent | Date |
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Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent Grant 6,020,104 - Hosaka , et al. February 1, 2 | 2000-02-01 |
Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent Grant 5,925,492 - Hosaka , et al. July 20, 1 | 1999-07-20 |
Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent Grant 5,494,784 - Hosaka , et al. February 27, 1 | 1996-02-27 |
Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent Grant 5,405,720 - Hosaka , et al. * April 11, 1 | 1995-04-11 |
Positive type radiation-sensitive resin composition Grant 5,087,548 - Hosaka , et al. February 11, 1 | 1992-02-11 |
Process for forming patterns using ionizing radiation sensitive resist Grant 4,623,609 - Harita , et al. November 18, 1 | 1986-11-18 |
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