| Patent | Date |
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Method For Improving Endometriosis And Method For Producing A Material Used Therefor
App 20220257562 - AMAMI; Tomohiro ; et al. | 2022-08-18 |
Material For Improving Endometriosis And Method For Producing The Same
App 20200155499 - AMAMI; Tomohiro ; et al. | 2020-05-21 |
Photomask defect correcting method and device
Grant 8,815,474 - Takaoka August 26, 2 | 2014-08-26 |
Photomask Defect Correcting Method And Device
App 20120328974 - TAKAOKA; Osamu | 2012-12-27 |
Photomask defect correcting method and device
Grant 8,257,887 - Takaoka September 4, 2 | 2012-09-04 |
Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method
Grant 8,062,494 - Iwata , et al. November 22, 2 | 2011-11-22 |
Method for fabricating EUVL mask
Grant 7,927,769 - Hagiwara , et al. April 19, 2 | 2011-04-19 |
Method of observing and method of working diamond stylus for working of atomic force microscope
Grant 7,804,067 - Takaoka September 28, 2 | 2010-09-28 |
Photomask Defect Correcting Method And Device
App 20100178601 - Takaoka; Osamu | 2010-07-15 |
Method for fabricating EUVL mask
App 20090226825 - Hagiwara; Ryoji ; et al. | 2009-09-10 |
Method of correcting opaque defect of photomask using atomic force microscope fine processing device
Grant 7,571,639 - Doi , et al. August 11, 2 | 2009-08-11 |
Photomask Defect Correction Device And Photomask Defect Correction Method
App 20090092905 - Nakaue; Takuya ; et al. | 2009-04-09 |
Photomask Defect Correction Device And Photomask Defect Correction Method
App 20090038383 - Nakaue; Takuya ; et al. | 2009-02-12 |
Photomask Defect-shape Recognition Apparatus, Photomask Defect-shape Recognition Method, And Photomask Defect Correction Method
App 20090028420 - Nakaue; Takuya ; et al. | 2009-01-29 |
Working method using scanning probe
Grant 7,442,925 - Yasutake , et al. October 28, 2 | 2008-10-28 |
Mold Inspecting Method And Resin Residue Removing Method Of Nanoimprint Lithography
App 20080191372 - Takaoka; Osamu | 2008-08-14 |
Method Of Observing And Method Of Working Diamond Stylus For Working Of Atomic Force Microscope
App 20080141764 - Takaoka; Osamu | 2008-06-19 |
Method of Correcting Photomask Defect
App 20080131792 - Takaoka; Osamu ; et al. | 2008-06-05 |
Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method
App 20080132151 - Iwata; Futoshi ; et al. | 2008-06-05 |
Processing probe
Grant 7,378,654 - Wakiyama , et al. May 27, 2 | 2008-05-27 |
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
Grant 7,375,352 - Takaoka , et al. May 20, 2 | 2008-05-20 |
Method of Correcting Photomask Defect
App 20080107975 - Takaoka; Osamu ; et al. | 2008-05-08 |
Method of correcting opaque defect of chrome mask, in which atomic force microscope fine working apparatus has been used
App 20080073522 - Takaoka; Osamu | 2008-03-27 |
Ion beam processing method
Grant 7,323,685 - Aita , et al. January 29, 2 | 2008-01-29 |
Method of correcting opaque defect of photomask using atomic force microscope fine processing device
App 20070281222 - Doi; Toshio ; et al. | 2007-12-06 |
Processing method using atomic force microscope microfabrication device
App 20070278177 - Kondo; Kazushige ; et al. | 2007-12-06 |
Scratch repairing processing method and scanning probe microscope (SPM) used therefor
Grant 7,285,792 - Watanabe , et al. October 23, 2 | 2007-10-23 |
Method of processing vertical cross-section using atomic force microscope
Grant 7,278,299 - Takaoka , et al. October 9, 2 | 2007-10-09 |
Processing method using probe of scanning probe microscope
Grant 7,259,372 - Takaoka , et al. August 21, 2 | 2007-08-21 |
Method of removing particle of photomask using atomic force microscope
Grant 7,232,995 - Takaoka , et al. June 19, 2 | 2007-06-19 |
Method of correcting amplitude defect in multilayer film of EUVL mask
Grant 7,189,655 - Takaoka March 13, 2 | 2007-03-13 |
Scanning probe device and processing method by scanning probe
App 20060254347 - Watanabe; Naoya ; et al. | 2006-11-16 |
Scanning probe device and processing method of scanning probe
App 20060254348 - Watanabe; Naoya ; et al. | 2006-11-16 |
Working method using scanning probe
App 20060219901 - Yasutake; Masatoshi ; et al. | 2006-10-05 |
Scanning probe device and processing method by scanning probe
Grant 7,107,826 - Watanabe , et al. September 19, 2 | 2006-09-19 |
Ion beam processing method
App 20060097194 - Aita; Kazuo ; et al. | 2006-05-11 |
Electron beam processing method
Grant 7,018,683 - Takaoka , et al. March 28, 2 | 2006-03-28 |
Method of correcting amplitude defect in multilayer film of EUVL mask
App 20060040418 - Takaoka; Osamu | 2006-02-23 |
Method of removing particle of photomask using atomic force microscope
App 20060022134 - Takaoka; Osamu ; et al. | 2006-02-02 |
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
App 20050285033 - Takaoka, Osamu ; et al. | 2005-12-29 |
Electron beam processing method
App 20050276932 - Takaoka, Osamu ; et al. | 2005-12-15 |
Method of processing vertical cross-section using atomic force microscope
App 20050262685 - Takaoka, Osamu ; et al. | 2005-12-01 |
Processing method using probe of scanning probe microscope
App 20050263700 - Takaoka, Osamu ; et al. | 2005-12-01 |
Scanning probe device and processing method by scanning probe
App 20050223785 - Watanabe, Naoya ; et al. | 2005-10-13 |
Scratch repairing processing method and scanning probe microscope (SPM) used therefor
App 20050205805 - Watanabe, Naoya ; et al. | 2005-09-22 |
Processing probe
App 20050199809 - Wakiyama, Shigeru ; et al. | 2005-09-15 |
Defect correction method for a photomask
App 20040209172 - Takaoka, Osamu ; et al. | 2004-10-21 |
Method and system for surface or cross-sectional processing and observation
App 20040154744 - Kaito, Takashi ; et al. | 2004-08-12 |
Mask defect repair method
Grant 6,703,626 - Takaoka , et al. March 9, 2 | 2004-03-09 |
Mask defect repair method
App 20020096635 - Takaoka, Osamu ; et al. | 2002-07-25 |
Electron beam device
Grant 6,037,589 - Yonezawa , et al. March 14, 2 | 2000-03-14 |
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