Takamure; Noboru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takamure; Noboru.The latest application filed is for "methods for forming doped silicon oxide thin films".

Company Profile

6.15.16

Takamure; Noboru - Tokyo JP
Takamure; Noboru - Kawasaki JP
Takamure; Noboru - Killara AU
TAKAMURE; Noboru - Kawasaki-shi JP
Takamure; Noboru - Tama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods for forming doped silicon oxide thin films Grant 11,302,527 - Takamure , et al. April 12, 2	2022-04-12
Methods For Forming Doped Silicon Oxide Thin Films App 20200388487 - Takamure; Noboru ; et al.	2020-12-10
Methods for forming doped silicon oxide thin films Grant 10,784,105 - Takamure , et al. Sept	2020-09-22
Methods For Forming Doped Silicon Oxide Thin Films App 20200185218 - Takamure; Noboru ; et al.	2020-06-11
Methods for forming doped silicon oxide thin films Grant 10,510,530 - Takamure , et al. Dec	2019-12-17
Methods For Forming Doped Silicon Oxide Thin Films App 20190172708 - Takamure; Noboru ; et al.	2019-06-06
Methods for forming doped silicon oxide thin films Grant 10,147,600 - Takamure , et al. De	2018-12-04
Methods For Forming Doped Silicon Oxide Thin Films App 20180211834 - Takamure; Noboru ; et al.	2018-07-26
Methods for forming doped silicon oxide thin films Grant 9,875,893 - Takamure , et al. January 23, 2	2018-01-23
Methods For Forming Doped Silicon Oxide Thin Films App 20170338111 - Takamure; Noboru ; et al.	2017-11-23
Film forming apparatus, and method of manufacturing semiconductor device Grant 9,673,092 - Nakano , et al. June 6, 2	2017-06-06
Methods for forming doped silicon oxide thin films Grant 9,564,314 - Takamure , et al. February 7, 2	2017-02-07
Method for forming Ti-containing film by PEALD using TDMAT or TDEAT Grant 9,556,516 - Takamure , et al. January 31, 2	2017-01-31
Method for forming dielectric film in trenches by PEALD using H-containing gas Grant 9,455,138 - Fukazawa , et al. September 27, 2	2016-09-27
Methods For Forming Doped Silicon Oxide Thin Films App 20160196970 - Takamure; Noboru ; et al.	2016-07-07
Methods for forming doped silicon oxide thin films Grant 9,368,352 - Takamure , et al. June 14, 2	2016-06-14
Methods for forming doped silicon oxide thin films Grant 9,153,441 - Takamure , et al. October 6, 2	2015-10-06
Film Forming Apparatus, And Method Of Manufacturing Semiconductor Device App 20150252479 - NAKANO; Ryu ; et al.	2015-09-10
Methods For Forming Doped Silicon Oxide Thin Films App 20150147875 - Takamure; Noboru ; et al.	2015-05-28
Method for Forming Ti-Containing Film by PEALD using TDMAT or TDEAT App 20150099072 - Takamure; Noboru ; et al.	2015-04-09
Methods For Forming Doped Silicon Oxide Thin Films App 20150017794 - Takamure; Noboru ; et al.	2015-01-15
Method for forming Si-containing film using two precursors by ALD Grant 8,912,101 - Tsuji , et al. December 16, 2	2014-12-16
Methods for forming doped silicon oxide thin films Grant 8,679,958 - Takamure , et al. March 25, 2	2014-03-25
Method for Forming Si-Containing Film Using Two Precursors by ALD App 20130244446 - Tsuji; Naoto ; et al.	2013-09-19
Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bond App 20130224964 - Fukazawa; Atsuki ; et al.	2013-08-29
Methods For Forming Doped Silicon Oxide Thin Films App 20130115763 - Takamure; Noboru ; et al.	2013-05-09
Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Grant 8,329,599 - Fukazawa , et al. December 11, 2	2012-12-11
Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen App 20120214318 - Fukazawa; Atsuki ; et al.	2012-08-23
Method for forming dielectric SiOCH film having chemical stability Grant 7,807,566 - Tsuji , et al. October 5, 2	2010-10-05
METHOD FOR FORMING DIELECTRIC SiOCH FILM HAVING CHEMICAL STABILITY App 20090148964 - Tsuji; Naoto ; et al.	2009-06-11

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