Takahashi; Riichiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takahashi; Riichiro.The latest application filed is for "substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle".

Company Profile

0.11.17

Takahashi; Riichiro - Yokohama JP
TAKAHASHI; Riichiro - Yokohama-shi JP
Takahashi; Riichiro - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Processing method, manufacturing method of semiconductor device, and processing apparatus Grant 7,727,853 - Takeishi , et al. June 1, 2	2010-06-01
Substrate Treating Method, Substrate-processing Apparatus, Developing Method, Method Of Manufacturing A Semiconductor Device, And Method Of Cleaning A Developing Solution Nozzle App 20100104988 - HAYASAKI; Kei ; et al.	2010-04-29
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle Grant 7,669,608 - Hayasaki , et al. March 2, 2	2010-03-02
Processing method, manufacturing method of semiconductor device, and processing apparatus App 20090039275 - Takeishi; Tomoyuki ; et al.	2009-02-12
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method Grant 7,399,578 - Takahashi , et al. July 15, 2	2008-07-15
Processing method, manufacturing method of semiconductor device, and processing apparatus App 20080050677 - Takeishi; Tomoyuki ; et al.	2008-02-28
Processing method, manufacturing method of semiconductor device, and processing apparatus App 20080035851 - Takeishi; Tomoyuki ; et al.	2008-02-14
Processing method, manufacturing method of semiconductor device, and processing apparatus Grant 7,288,466 - Takeishi , et al. October 30, 2	2007-10-30
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method App 20070037099 - Takahashi; Riichiro ; et al.	2007-02-15
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method Grant 7,097,960 - Takahashi , et al. August 29, 2	2006-08-29
Chemical liquid processing apparatus for processing a substrate and the method thereof App 20060151015 - Ito; Shinichi ; et al.	2006-07-13
Chemical liquid processing apparatus for processing a substrate Grant 7,067,033 - Ito , et al. June 27, 2	2006-06-27
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle Grant 7,018,481 - Hayasaki , et al. March 28, 2	2006-03-28
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle App 20050087217 - Hayasaki, Kei ; et al.	2005-04-28
Alkaline solution and manufacturing method, and alkaline solution applied to patern forming method, resist film removing method, solution application method, substrate treatment method, solotion supply method, and semiconductor device manufacturing method App 20050058944 - Takahashi, Riichiro ; et al.	2005-03-17
Observation device, ultraviolet microscope and observation method Grant 6,842,281 - Tsurumune , et al. January 11, 2	2005-01-11
Method of forming a pattern Grant 6,818,387 - Takahashi , et al. November 16, 2	2004-11-16
Chemical liquid processing apparatus for processing a substrate and the method thereof App 20040159398 - Ito, Shinichi ; et al.	2004-08-19
Alkaline Solution And Manufacturing Method, And Alkaline Solution Applied To Pattern Forming Method, Resist Film Removing Method, Solution Application Method, Substrate Treatment Method, Solution Supply Method, And Semiconductor Device Manufacturing Method Grant 6,742,944 - Takahashi , et al. June 1, 2	2004-06-01
Chemical liquid processing apparatus for processing a substrate and the method thereof Grant 6,709,531 - Ito , et al. March 23, 2	2004-03-23
Processing method, manufacturing method of semiconductor device, and processing apparatus App 20040043310 - Takeishi, Tomoyuki ; et al.	2004-03-04
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle App 20040029026 - Hayasaki, Kei ; et al.	2004-02-12
Pattern forming method App 20030219660 - Ito, Shinichi ; et al.	2003-11-27
Observation device, ultraviolet microscope and observation method App 20030202238 - Tsurumune, Atsushi ; et al.	2003-10-30
Chemical liquid processing apparatus for processing a substrate and the method thereof App 20030159719 - Ito, Shinichi ; et al.	2003-08-28
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method App 20030068579 - Takahashi, Riichiro ; et al.	2003-04-10
Method for forming a pattern App 20020155391 - Takahashi, Riichiro ; et al.	2002-10-24
Chemical liquid processing apparatus for processing a substrate and the method thereof App 20010028920 - Ito, Shinichi ; et al.	2001-10-11

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