Takahashi; Koutarou

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takahashi; Koutarou.The latest application filed is for "actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device".

Company Profile

2.13.13

Takahashi; Koutarou - Shizuoka JP
Takahashi; Koutarou - Haibara-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic devic Grant 10,545,405 - Yamaguchi , et al. Ja	2020-01-28
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing elect Grant 10,526,266 - Yokokawa , et al. J	2020-01-07
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound Grant 10,324,374 - Yamaguchi , et al.	2019-06-18
Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device Grant 10,139,727 - Tsuchimura , et al. Nov	2018-11-27
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device Grant 10,120,281 - Takahashi , et al. November 6, 2	2018-11-06
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound Grant 10,011,576 - Yamaguchi , et al. July 3, 2	2018-07-03
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device Grant 9,904,168 - Yokokawa , et al. February 27, 2	2018-02-27
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Including Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Forming Method, And Method For Manufacturing Electronic Device App 20170351176 - YAMAGUCHI; Shuhei ; et al.	2017-12-07
Manufacturing Method For Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Comprising Actinic Ray-sensitive Or Radiation-sensitive Film, Photo Mask, Forming Met App 20170003591 - MOCHIZUKI; Hidehiro ; et al.	2017-01-05
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device App 20160320700 - YOKOKAWA; Natsumi ; et al.	2016-11-03
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Photomask, Pattern Forming Method, Method For Manufacturing Electronic Device, Electronic Device, Compound, A App 20160280621 - YOKOKAWA; Natsumi ; et al.	2016-09-29
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Photomask, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device App 20160282720 - TAKAHASHI; Koutarou ; et al.	2016-09-29
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Forming Method, Method For Manufacturing Electronic Device, Electronic Device, And Compound App 20160280675 - YAMAGUCHI; Shuhei ; et al.	2016-09-29
Active Light Sensitive Or Radiation Sensitive Resin Composition, Active Light Sensitive Or Radiation Sensitive Film, Mask Blank Provided With Active Light Sensitive Or Radiation Sensitive Film, Pattern Forming Method, Method For Manufacturing Electronic Device, Electronic Device And Novel Compound App 20160209746 - YAMAGUCHI; Shuhei ; et al.	2016-07-21
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern Grant 9,316,908 - Takahashi April 19, 2	2016-04-19
Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition Grant 9,285,679 - Tsuchimura , et al. March 15, 2	2016-03-15
Chemical Amplification Resist Composition, Resist Film Using The Same, Resist-coated Mask Blank, Method Of Forming Photomask And Pattern, And Method Of Manufacturing Electronic Device And Electronic Device App 20150072274 - TSUCHIMURA; Tomotaka ; et al.	2015-03-12
Actinic Ray-sensitive Or Radiation-sensitive Composition, And Resist Film, Resist-coated Mask Blanks, Resist Pattern Forming Method And Photomask Each Using The Composition App 20150010855 - TSUCHIMURA; Tomotaka ; et al.	2015-01-08
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film, Photomask Blank And Method Of Forming Pattern App 20140370425 - TAKAHASHI; Koutarou	2014-12-18
Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks Grant 8,889,339 - Tsuchihashi , et al. November 18, 2	2014-11-18
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method Grant 8,735,048 - Inasaki , et al. May 27, 2	2014-05-27
Resist Pattern Forming Method, Resist Pattern, Crosslinkable Negative Chemical Amplification Resist Composition For Organic Solvent Development, Resist Film And Resist-coated Mask Blanks App 20140030640 - TSUCHIHASHI; Toru ; et al.	2014-01-30
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Composition And Pattern Forming Method App 20120301817 - Inasaki; Takeshi ; et al.	2012-11-29

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