Takahashi; Hyou

Patent Applications and Registrations

Patent applications and USPTO patent grants for Takahashi; Hyou.The latest application filed is for "organic residue inspecting method and liquid discharge head producing method".

Company Profile

1.24.27

Takahashi; Hyou - Fukushima JP
Takahashi; Hyou - Fukushima-shi JP
Takahashi; Hyou - Kunitachi JP
Takahashi; Hyou - Kunitachi-shi JP
Takahashi; Hyou - Shizuoka JP
Takahashi; Hyou - Haibara-gun N/A JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Organic residue inspecting method and liquid discharge head producing method Grant 10,859,482 - Takahashi , et al. December 8, 2	2020-12-08
Organic Residue Inspecting Method And Liquid Discharge Head Producing Method App 20180149572 - Takahashi; Hyou ; et al.	2018-05-31
Liquid Ejection Head, Method For Producing Liquid Ejection Head, And Printing Method App 20180143534 - Takahashi; Hyou	2018-05-24
Liquid-ejecting head and method of manufacturing the liquid-ejecting head Grant 9,707,759 - Takahashi , et al. July 18, 2	2017-07-18
Photosensitive negative resin composition Grant 9,707,757 - Takahashi July 18, 2	2017-07-18
Liquid-ejecting Head And Method Of Manufacturing The Liquid-ejecting Head App 20160236467 - Takahashi; Hyou ; et al.	2016-08-18
Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head Grant 9,268,222 - Takahashi , et al. February 23, 2	2016-02-23
Positive photosensitive composition and method of forming pattern using the same Grant 9,052,594 - Takahashi , et al. June 9, 2	2015-06-09
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same Grant 9,046,766 - Kato , et al. June 2, 2	2015-06-02
Photosensitive negative resin composition Grant 8,975,003 - Takahashi , et al. March 10, 2	2015-03-10
Print head and inkjet printing apparatus Grant 8,936,350 - Takei , et al. January 20, 2	2015-01-20
Photosensitive Negative Resin Composition, Fine Structure, Production Process Of Fine Structure And Liquid Ejection Head App 20140329175 - Takahashi; Hyou ; et al.	2014-11-06
Photosensitive Negative Resin Composition App 20140307022 - Takahashi; Hyou	2014-10-16
Liquid ejection head and method of manufacturing the same Grant 8,785,110 - Kodoi , et al. July 22, 2	2014-07-22
Print Head And Inkjet Printing Apparatus App 20140125735 - Takei; Yasunori ; et al.	2014-05-08
Liquid Ejection Head And Method Of Manufacturing The Same App 20140030659 - Kodoi; Takuma ; et al.	2014-01-30
Photosensitive Negative Resin Composition App 20130235119 - Takahashi; Hyou ; et al.	2013-09-12
Positive Photosensitive Composition And Method Of Forming Pattern Using The Same App 20120058431 - TAKAHASHI; Hyou ; et al.	2012-03-08
Positive photosensitive composition and method of forming pattern using the same Grant 8,080,361 - Takahashi , et al. December 20, 2	2011-12-20
Resist composition and method of pattern formation with the same Grant 7,914,965 - Takahashi , et al. March 29, 2	2011-03-29
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method Using Same App 20100009288 - Kato; Takayuki ; et al.	2010-01-14
Resist composition for electron beam, EUV or X-ray Grant 7,521,168 - Mizutani , et al. April 21, 2	2009-04-21
Chemical amplification resist composition and pattern-forming method using the same Grant 7,425,404 - Tarutani , et al. September 16, 2	2008-09-16
Resist composition for immersion exposure and pattern formation method using the same Grant 7,326,516 - Nishiyama , et al. February 5, 2	2008-02-05
Positive resist composition and pattern formation method using the same Grant 7,285,369 - Takahashi October 23, 2	2007-10-23
Positive photosensitive composition and method of forming pattern using the same App 20070172761 - Takahashi; Hyou ; et al.	2007-07-26
Positive-working resist composition Grant 7,241,551 - Takahashi , et al. July 10, 2	2007-07-10
Positive resist composition Grant 7,105,273 - Yasunami , et al. September 12, 2	2006-09-12
Stimulus sensitive compound and stimulus sensitive composition containing the same Grant 7,094,515 - Kodama , et al. August 22, 2	2006-08-22
Resist composition Grant 7,083,892 - Takahashi , et al. August 1, 2	2006-08-01
Resist composition App 20060147837 - Takahashi; Hyou ; et al.	2006-07-06
Resist composition and method of pattern formation with the same App 20060068320 - Takahashi; Hyou ; et al.	2006-03-30
Chemical amplification resist composition and pattern-forming method using the same App 20060040208 - Tarutani; Shinji ; et al.	2006-02-23
Resist composition for immersion exposure and pattern formation method using the same App 20050186503 - Nishiyama, Fumiyuki ; et al.	2005-08-25
Resist composition Grant 6,902,862 - Takahashi , et al. June 7, 2	2005-06-07
Positive resist composition and pattern forming method using the same App 20050079441 - Takahashi, Hyou	2005-04-14
Positive resist composition and pattern formation method using the same App 20050064329 - Takahashi, Hyou	2005-03-24
Positive-working resist composition App 20040248035 - Takahashi, Hyou ; et al.	2004-12-09
Stimulus sensitive compound and stimulus sensitive composition containing the same App 20040185378 - Kodama, Kunihiko ; et al.	2004-09-23
Resist composition App 20040058272 - Takahashi, Hyou ; et al.	2004-03-25
Resist composition App 20040053160 - Takahashi, Hyou ; et al.	2004-03-18
Positive resist composition App 20040043323 - Yasunami, Shoichiro ; et al.	2004-03-04
Resist composition App 20040005513 - Takahashi, Hyou ; et al.	2004-01-08
Resist composition for electron beam, EUV or X-ray App 20030198894 - Mizutani, Kazuyoshi ; et al.	2003-10-23
Negative resist composition App 20030165772 - Takahashi, Hyou ; et al.	2003-09-04