Patent | Date |
---|
Organic residue inspecting method and liquid discharge head producing method Grant 10,859,482 - Takahashi , et al. December 8, 2 | 2020-12-08 |
Organic Residue Inspecting Method And Liquid Discharge Head Producing Method App 20180149572 - Takahashi; Hyou ;   et al. | 2018-05-31 |
Liquid Ejection Head, Method For Producing Liquid Ejection Head, And Printing Method App 20180143534 - Takahashi; Hyou | 2018-05-24 |
Liquid-ejecting head and method of manufacturing the liquid-ejecting head Grant 9,707,759 - Takahashi , et al. July 18, 2 | 2017-07-18 |
Photosensitive negative resin composition Grant 9,707,757 - Takahashi July 18, 2 | 2017-07-18 |
Liquid-ejecting Head And Method Of Manufacturing The Liquid-ejecting Head App 20160236467 - Takahashi; Hyou ;   et al. | 2016-08-18 |
Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head Grant 9,268,222 - Takahashi , et al. February 23, 2 | 2016-02-23 |
Positive photosensitive composition and method of forming pattern using the same Grant 9,052,594 - Takahashi , et al. June 9, 2 | 2015-06-09 |
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same Grant 9,046,766 - Kato , et al. June 2, 2 | 2015-06-02 |
Photosensitive negative resin composition Grant 8,975,003 - Takahashi , et al. March 10, 2 | 2015-03-10 |
Print head and inkjet printing apparatus Grant 8,936,350 - Takei , et al. January 20, 2 | 2015-01-20 |
Photosensitive Negative Resin Composition, Fine Structure, Production Process Of Fine Structure And Liquid Ejection Head App 20140329175 - Takahashi; Hyou ;   et al. | 2014-11-06 |
Photosensitive Negative Resin Composition App 20140307022 - Takahashi; Hyou | 2014-10-16 |
Liquid ejection head and method of manufacturing the same Grant 8,785,110 - Kodoi , et al. July 22, 2 | 2014-07-22 |
Print Head And Inkjet Printing Apparatus App 20140125735 - Takei; Yasunori ;   et al. | 2014-05-08 |
Liquid Ejection Head And Method Of Manufacturing The Same App 20140030659 - Kodoi; Takuma ;   et al. | 2014-01-30 |
Photosensitive Negative Resin Composition App 20130235119 - Takahashi; Hyou ;   et al. | 2013-09-12 |
Positive Photosensitive Composition And Method Of Forming Pattern Using The Same App 20120058431 - TAKAHASHI; Hyou ;   et al. | 2012-03-08 |
Positive photosensitive composition and method of forming pattern using the same Grant 8,080,361 - Takahashi , et al. December 20, 2 | 2011-12-20 |
Resist composition and method of pattern formation with the same Grant 7,914,965 - Takahashi , et al. March 29, 2 | 2011-03-29 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method Using Same App 20100009288 - Kato; Takayuki ;   et al. | 2010-01-14 |
Resist composition for electron beam, EUV or X-ray Grant 7,521,168 - Mizutani , et al. April 21, 2 | 2009-04-21 |
Chemical amplification resist composition and pattern-forming method using the same Grant 7,425,404 - Tarutani , et al. September 16, 2 | 2008-09-16 |
Resist composition for immersion exposure and pattern formation method using the same Grant 7,326,516 - Nishiyama , et al. February 5, 2 | 2008-02-05 |
Positive resist composition and pattern formation method using the same Grant 7,285,369 - Takahashi October 23, 2 | 2007-10-23 |
Positive photosensitive composition and method of forming pattern using the same App 20070172761 - Takahashi; Hyou ;   et al. | 2007-07-26 |
Positive-working resist composition Grant 7,241,551 - Takahashi , et al. July 10, 2 | 2007-07-10 |
Positive resist composition Grant 7,105,273 - Yasunami , et al. September 12, 2 | 2006-09-12 |
Stimulus sensitive compound and stimulus sensitive composition containing the same Grant 7,094,515 - Kodama , et al. August 22, 2 | 2006-08-22 |
Resist composition Grant 7,083,892 - Takahashi , et al. August 1, 2 | 2006-08-01 |
Resist composition App 20060147837 - Takahashi; Hyou ;   et al. | 2006-07-06 |
Resist composition and method of pattern formation with the same App 20060068320 - Takahashi; Hyou ;   et al. | 2006-03-30 |
Chemical amplification resist composition and pattern-forming method using the same App 20060040208 - Tarutani; Shinji ;   et al. | 2006-02-23 |
Resist composition for immersion exposure and pattern formation method using the same App 20050186503 - Nishiyama, Fumiyuki ;   et al. | 2005-08-25 |
Resist composition Grant 6,902,862 - Takahashi , et al. June 7, 2 | 2005-06-07 |
Positive resist composition and pattern forming method using the same App 20050079441 - Takahashi, Hyou | 2005-04-14 |
Positive resist composition and pattern formation method using the same App 20050064329 - Takahashi, Hyou | 2005-03-24 |
Positive-working resist composition App 20040248035 - Takahashi, Hyou ;   et al. | 2004-12-09 |
Stimulus sensitive compound and stimulus sensitive composition containing the same App 20040185378 - Kodama, Kunihiko ;   et al. | 2004-09-23 |
Resist composition App 20040058272 - Takahashi, Hyou ;   et al. | 2004-03-25 |
Resist composition App 20040053160 - Takahashi, Hyou ;   et al. | 2004-03-18 |
Positive resist composition App 20040043323 - Yasunami, Shoichiro ;   et al. | 2004-03-04 |
Resist composition App 20040005513 - Takahashi, Hyou ;   et al. | 2004-01-08 |
Resist composition for electron beam, EUV or X-ray App 20030198894 - Mizutani, Kazuyoshi ;   et al. | 2003-10-23 |
Negative resist composition App 20030165772 - Takahashi, Hyou ;   et al. | 2003-09-04 |