loadpatents
name:-0.0062811374664307
name:-0.0048129558563232
name:-0.0013129711151123
TAKAHAMA; Masaru Patent Filings

TAKAHAMA; Masaru

Patent Applications and Registrations

Patent applications and USPTO patent grants for TAKAHAMA; Masaru.The latest application filed is for "silicon etching solution, silicon etching method, and method of producing silicon fin structure".

Company Profile
0.5.7
  • TAKAHAMA; Masaru - Hsinchu City TW
  • Takahama; Masaru - Hsinchu TW
  • Takahama; Masaru - Kawasaki JP
  • TAKAHAMA; Masaru - Kawasaki-shi JP
  • Takahama, Masaru - Kanagawa JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Silicon Etching Solution, Silicon Etching Method, And Method Of Producing Silicon Fin Structure
App 20220195302 - CHUNG; Ming-Yen ;   et al.
2022-06-23
Silicon etching solution, silicon etching method, and method of producing silicon fin structure
Grant 11,306,248 - Chung , et al. April 19, 2
2022-04-19
Silicon Etching Solution, Silicon Etching Method, And Method Of Producing Silicon Fin Structure
App 20200407636 - CHUNG; Ming-Yen ;   et al.
2020-12-31
Cleaning liquid for lithography and method for forming wiring
Grant 8,354,365 - Ohhashi , et al. January 15, 2
2013-01-15
Cleaning liquid for lithography and method for forming wiring
Grant 8,206,509 - Eto , et al. June 26, 2
2012-06-26
Cleaning Liquid For Lithography And Method For Forming Wiring
App 20110195573 - Ohhashi; Takuya ;   et al.
2011-08-11
Cleaning Liquid For Lithography And Method For Forming Wiring
App 20110129998 - ETO; Takahiro ;   et al.
2011-06-02
Composition for forming silica-based coating film
Grant 7,939,590 - Iida , et al. May 10, 2
2011-05-10
Composition For Forming Silica-based Coating Film
App 20090018247 - Iida; Hiroyuki ;   et al.
2009-01-15
Composition For Forming Antireflective Film And Wiring Forming Method Using Same
App 20080318165 - Tanaka; Takeshi ;   et al.
2008-12-25
Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition
App 20050267277 - Takahama, Masaru ;   et al.
2005-12-01

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed