TAKAGI; Mariko

Patent Applications and Registrations

Patent applications and USPTO patent grants for TAKAGI; Mariko.The latest application filed is for "pretreatment device for membrane separation, membrane separating system and membrane separating method".

Company Profile

0.9.6

TAKAGI; Mariko - Nagoya-City JP
Takagi; Mariko - Nagoya JP
Takagi; Mariko - Kawasaki JP
Takagi; Mariko - Kawasaki-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pretreatment Device For Membrane Separation, Membrane Separating System And Membrane Separating Method App 20140374355 - TAKAGI; Mariko	2014-12-25
Silica film filter and process for producing silica film filter Grant 8,764,889 - Takagi , et al. July 1, 2	2014-07-01
Silica Film Filter And Process For Producing Silica Film Filter App 20130112078 - TAKAGI; Mariko ; et al.	2013-05-09
Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same Grant 7,638,432 - Miyashita , et al. December 29, 2	2009-12-29
Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same App 20070194382 - Miyashita; Katsura ; et al.	2007-08-23
Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same Grant 7,220,672 - Miyashita , et al. May 22, 2	2007-05-22
Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same App 20050158958 - Miyashita, Katsura ; et al.	2005-07-21
Semiconductor Device Comprising Metal Silicide Films Formed To Cover Gate Electrode And Source-drain Diffusion Layers And Method Of Manufacturing The Same Wherein The Silicide On Gate Is Thicker Than On Source-drain Grant 6,869,867 - Miyashita , et al. March 22, 2	2005-03-22
Semiconductor device with high driving force and less impurity punch-through and method of manufacturing the same App 20030001218 - Takagi, Mariko	2003-01-02
MIS-type semiconductor device having a multi-portion gate electrode Grant 6,362,511 - Mizushima , et al. March 26, 2	2002-03-26
Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same App 20010045605 - Miyashita, Katsura ; et al.	2001-11-29
Semiconductor apparatus and manufacturing method therefor Grant 6,169,019 - Takagi January 2, 2	2001-01-02
Semiconductor device equipped with antifuse elements and a method for manufacturing an FPGA Grant 5,866,938 - Takagi , et al. February 2, 1	1999-02-02
Semiconductor device including anti-fuse element and method of manufacturing the device Grant 5,682,059 - Yoshii , et al. October 28, 1	1997-10-28
Semiconductor device equipped with antifuse elements and a method for manufacturing an FPGA Grant 5,550,400 - Takagi , et al. August 27, 1	1996-08-27

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