Tagawa; Seiichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tagawa; Seiichi.The latest application filed is for "resist pattern formation method".

Company Profile

1.12.16

Tagawa; Seiichi - Suita JP
TAGAWA; Seiichi - Suita-shi JP
Tagawa; Seiichi - Osaka JP
Tagawa; Seiichi - Ageo JP
Tagawa; Seiichi - Saitama JP
Tagawa, Seiichi - Ageo-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resist patterning method and resist material Grant 11,187,984 - Tagawa November 30, 2	2021-11-30
Resist Pattern Formation Method App 20210216016 - TAGAWA; Seiichi	2021-07-15
Resist patterning method, latent resist image forming device, resist patterning device, and resist material Grant 10,670,967 - Tagawa , et al.	2020-06-02
Photo-sensitized chemically amplified resist (PS-CAR) simulation Grant 10,429,745 - Carcasi , et al. O	2019-10-01
Resist Patterning Method And Resist Material App 20180356731 - TAGAWA; Seiichi	2018-12-13
Chemically amplified resist material, pattern-forming method, compound, and production method of compound Grant 10,073,349 - Nakagawa , et al. September 11, 2	2018-09-11
Resist-pattern-forming method and chemically amplified resist material Grant 10,073,348 - Nakagawa , et al. September 11, 2	2018-09-11
Resist Patterning Method, Latent Resist Image Forming Device, Resist Patterning Device, And Resist Material App 20180231892 - TAGAWA; Seiichi ; et al.	2018-08-16
Substrate treatment system Grant 10,025,190 - Nagahara , et al. July 17, 2	2018-07-17
Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting Grant 10,025,187 - Nagahara , et al. July 17, 2	2018-07-17
Resist patterning method, latent resist image forming device, resist patterning device, and resist material Grant 9,977,332 - Tagawa , et al. May 22, 2	2018-05-22
Pattern-forming method Grant 9,971,247 - Nakagawa , et al. May 15, 2	2018-05-15
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation App 20170242342 - Carcasi; Michael ; et al.	2017-08-24
Resist Patterning Method, Latent Resist Image Forming Device, And Resist Material App 20170097570 - TAGAWA; Seiichi	2017-04-06
Pattern-forming Method App 20170052450 - NAKAGAWA; Hisashi ; et al.	2017-02-23
Chemically Amplified Resist Material, Pattern-forming Method, Compound, And Production Method Of Compound App 20170052449 - NAKAGAWA; HISASHI ; et al.	2017-02-23
Resist-pattern-forming Method And Chemically Amplified Resist Material App 20170052448 - NAKAGAWA; Hisashi ; et al.	2017-02-23
Substrate Treatment System App 20170031245 - NAGAHARA; Seiji ; et al.	2017-02-02
Photosensitization Chemical-amplification Type Resist Material, Method For Forming Pattern Using Same, Semiconductor Device, Mask For Lithography, And Template For Nanoimprinting App 20160357103 - NAGAHARA; Seiji ; et al.	2016-12-08
Microstructural Materials And Fabrication Method Thereof App 20160193756 - OSHIMA; Akihiro ; et al.	2016-07-07
Resist Patterning Method, Latent Resist Image Forming Device, Resist Patterning Device, And Resist Material App 20160004160 - TAGAWA; Seiichi ; et al.	2016-01-07
Microstructural Materials And Fabrication Method Thereof App 20120231220 - Oshima; Akihiro ; et al.	2012-09-13
Ceramic nanowires and a process for producing them by ion beam irradiation Grant 7,731,927 - Sugimoto , et al. June 8, 2	2010-06-08
Ceramic Nanowires And A Process For Producing Them By Ion Beam Irradiation App 20100111805 - Sugimoto; Masaki ; et al.	2010-05-06
Damper and process thereof Grant 7,354,637 - Tagawa , et al. April 8, 2	2008-04-08
Damper and process thereof Grant 6,984,432 - Tagawa , et al. January 10, 2	2006-01-10
Damper and process thereof App 20050250584 - Tagawa, Seiichi ; et al.	2005-11-10
Damper and process thereof App 20030035966 - Tagawa, Seiichi ; et al.	2003-02-20

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