Tadera; Takamitsu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tadera; Takamitsu.The latest application filed is for "plasma processing apparatus".
- Tadera; Takamitsu - Tenri JP
- Tadera, Takamitsu - Tenri-shi JP
- Tadera; Takamitsu - Nara JP
- Tadera, Takamitsu - Nara-shi JP
| Patent | Date |
|---|---|
| Plasma processing apparatus Grant 6,866,747 - Tadera , et al. March 15, 2 | 2005-03-15 |
| Plasma processing apparatus App 20040206456 - Tadera, Takamitsu ; et al. | 2004-10-21 |
| Backing plate used for sputtering apparatus and sputtering method Grant 6,776,879 - Yamamoto , et al. August 17, 2 | 2004-08-17 |
| Plasma processing apparatus Grant 6,753,496 - Tadera , et al. June 22, 2 | 2004-06-22 |
| Plasma processing apparatus Grant 6,726,802 - Tadera , et al. April 27, 2 | 2004-04-27 |
| Plasma process apparatus Grant 6,638,392 - Yamamoto , et al. October 28, 2 | 2003-10-28 |
| Plasma process apparatus Grant 6,527,908 - Kanetsuki , et al. March 4, 2 | 2003-03-04 |
| Plasma processing apparatus App 20030024647 - Tadera, Takamitsu ; et al. | 2003-02-06 |
| Plasma process device Grant 6,446,573 - Hirayama , et al. September 10, 2 | 2002-09-10 |
| Backing plate used for sputtering apparatus and sputtering method App 20020100680 - Yamamoto, Tatsushi ; et al. | 2002-08-01 |
| Plasma processing apparatus App 20020079294 - Tadera, Takamitsu ; et al. | 2002-06-27 |
| Plasma process apparatus App 20020043341 - Kanetsuki, Norio ; et al. | 2002-04-18 |
| Plasma process device App 20010052322 - Hirayama, Masaki ; et al. | 2001-12-20 |
| Plasma process device Grant 6,286,454 - Hirayama , et al. September 11, 2 | 2001-09-11 |
| Plasma process apparatus App 20010010207 - Yamamoto, Naoko ; et al. | 2001-08-02 |
| Magnetic recording/reproducing apparatus Grant 5,491,594 - Yamamoto , et al. February 13, 1 | 1996-02-13 |
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