Tada; Kunihiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tada; Kunihiro.The latest application filed is for "deposition device and deposition method".

Company Profile

1.16.19

Tada; Kunihiro - Nirasaki JP
TADA; Kunihiro - Nirasaki-shi Yamanashi
Tada; Kunihiro - Tokyo N/A JP
Tada; Kunihiro - Yamanashi JP
Tada; Kunihiro - Yamanashi-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Deposition device and deposition method Grant 10,815,567 - Hirose , et al. October 27, 2	2020-10-27
Deposition Device And Deposition Method App 20170314130 - HIROSE; Katsuhito ; et al.	2017-11-02
Method of forming conformal metal silicide films Grant 8,785,310 - Hasegawa , et al. July 22, 2	2014-07-22
Method Of Forming Conformal Metal Silicide Films App 20130196505 - Hasegawa; Toshio ; et al.	2013-08-01
Ti-containing film formation method and storage medium Grant 8,257,790 - Narushima , et al. September 4, 2	2012-09-04
Substrate processing method and substrate processing apparatus Grant 8,124,168 - Tada , et al. February 28, 2	2012-02-28
Processing apparatus and heater unit Grant 8,106,335 - Murakami , et al. January 31, 2	2012-01-31
Film Formation Method And Apparatus Utilizing Plasma Cvd App 20100240216 - TADA; Kunihiro ; et al.	2010-09-23
METHOD FOR FORMING Ti-BASED FILM AND STORAGE MEDIUM App 20100227062 - Narushima; Kensaku ; et al.	2010-09-09
Method For Forming Ti Film And Tin Film, Contact Structure, Computer Readable Storage Medium And Computer Program App 20100216304 - Tada; Kunihiro ; et al.	2010-08-26
Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program Grant 7,737,005 - Tada , et al. June 15, 2	2010-06-15
Method of forming titanium film by CVD App 20090071404 - Tada; Kunihiro ; et al.	2009-03-19
Method of forming titanium film by CVD Grant 7,484,513 - Tada , et al. February 3, 2	2009-02-03
Processing Apparatus and Heater Unit App 20080302781 - Murakami; Seishi ; et al.	2008-12-11
Formation of Titanium Nitride Film App 20080057344 - Murakami; Seishi ; et al.	2008-03-06
Substrate Processing Method and Substrate Processing Apparatus App 20070292598 - Tada; Kunihiro ; et al.	2007-12-20
Method for Forming Ti Film and Tin Film, Contact Structure, Computer Readable Storing Medium and Computer Program App 20070257372 - Tada; Kunihiro ; et al.	2007-11-08
Gas Supplying unit and substrate processing apparatus App 20070131168 - Gomi; Hisashi ; et al.	2007-06-14
TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system Grant 7,153,773 - Otsuki , et al. December 26, 2	2006-12-26
Film-forming method and apparatus using plasma CVD App 20060231032 - Murakami; Seishi ; et al.	2006-10-19
Method for introducing gas to treating apparatus having shower head portion App 20060105104 - Tada; Kunihiro	2006-05-18
Worktable device, film formation apparatus, and film formation method for semiconductor process App 20050257747 - Wakabayashi, Satoshi ; et al.	2005-11-24
Film formation method and apparatus utilizing plasma CVD App 20050233093 - Tada, Kunihiro ; et al.	2005-10-20
Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film Grant 6,919,273 - Otsuki , et al. July 19, 2	2005-07-19
Method of forming titanium film by CVD App 20050136660 - Tada, Kunihiro ; et al.	2005-06-23
Method of forming titanium film by CVD Grant 6,841,203 - Tada , et al. January 11, 2	2005-01-11
TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system App 20040232467 - Otsuki, Hayashi ; et al.	2004-11-25
Method of forming a titanium film and a barrier film on a surface of a substrate through lamination Grant 6,537,621 - Kobayashi , et al. March 25, 2	2003-03-25
Method of forming titanium film by CVD App 20030031794 - Tada, Kunihiro ; et al.	2003-02-13
CVD-Ti film forming method Grant 6,197,674 - Yoshikawa , et al. March 6, 2	2001-03-06
Method of forming a titanium film and a barrier metal film on a surface of a substrate through lamination Grant 6,051,281 - Kobayashi , et al. April 18, 2	2000-04-18
Method for depositing a titanium film Grant 5,942,282 - Tada , et al. August 24, 1	1999-08-24
Film forming and dry cleaning apparatus and method Grant 5,709,757 - Hatano , et al. January 20, 1	1998-01-20

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