| Patent | Date |
|---|
Material For Forming Organic Film, Patterning Process, Compound, And Polymer
App 20220214617 - KORI; Daisuke ; et al. | 2022-07-07 |
Material For Forming Organic Film, Patterning Process, And Polymer
App 20220214618 - KORI; Daisuke ; et al. | 2022-07-07 |
Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
Grant 11,307,497 - Tachibana , et al. April 19, 2 | 2022-04-19 |
Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate
Grant 11,267,937 - Kori , et al. March 8, 2 | 2022-03-08 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20210311395 - KORI; Daisuke ; et al. | 2021-10-07 |
Material For Forming Organic, Film Patterning Process, And Polymer
App 20210269597 - KORI; Daisuke ; et al. | 2021-09-02 |
Composition for forming organic film
Grant 11,042,090 - Tachibana , et al. June 22, 2 | 2021-06-22 |
Compound and composition for forming organic film
Grant 11,022,882 - Tachibana , et al. June 1, 2 | 2021-06-01 |
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
Grant 11,018,015 - Ogihara , et al. May 25, 2 | 2021-05-25 |
Resist Material And Patterning Process
App 20210063871 - Kobayashi; Tomohiro ; et al. | 2021-03-04 |
Resist Material And Patterning Process
App 20210063873 - KOBAYASHI; Tomohiro ; et al. | 2021-03-04 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Polymer
App 20210003920 - KORI; Daisuke ; et al. | 2021-01-07 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, And Patterning Process
App 20200381247 - KORI; Daisuke ; et al. | 2020-12-03 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20200333709 - KORI; Daisuke ; et al. | 2020-10-22 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20200332062 - KORI; Daisuke ; et al. | 2020-10-22 |
Thermosetting Silicon-containing Compound, Composition For Forming A Silicon-containing Film, And Patterning Process
App 20200216670 - YANO; Toshiharu ; et al. | 2020-07-09 |
Method For Producing Silicon Compound, And Silicon Compound
App 20200115400 - MITSUI; Ryo ; et al. | 2020-04-16 |
Compound, method for manufacturing the compound, and composition for forming organic film
Grant 10,604,618 - Tachibana , et al. | 2020-03-31 |
Compound, Method For Manufacturing The Compound, And Composition For Forming Organic Film
App 20190390000 - TACHIBANA; Seiichiro ; et al. | 2019-12-26 |
Compound And Composition For Forming Organic Film
App 20190391493 - TACHIBANA; Seiichiro ; et al. | 2019-12-26 |
Resist multilayer film-attached substrate and patterning process
Grant 10,514,605 - Tachibana , et al. Dec | 2019-12-24 |
Compound, Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic
App 20190300498 - TACHIBANA; Seiichiro ; et al. | 2019-10-03 |
Resist Composition And Patterning Process
App 20190258160 - Satoh; Hironori ; et al. | 2019-08-22 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, And Pat
App 20190198341 - OGIHARA; Tsutomu ; et al. | 2019-06-27 |
Method For Producing Dihydroxynaphthalene Condensate And Dihydroxynaphthalene Condensate
App 20190194391 - KORI; Daisuke ; et al. | 2019-06-27 |
Method For Purifying Dihydroxynaphthalene
App 20190194102 - TACHIBANA; Seiichiro ; et al. | 2019-06-27 |
Resist Multilayer Film-attached Substrate And Patterning Process
App 20190041753 - TACHIBANA; Seiichiro ; et al. | 2019-02-07 |
Composition For Forming Organic Film
App 20190041752 - TACHIBANA; Seiichiro ; et al. | 2019-02-07 |
Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound
Grant 10,131,603 - Nakahara , et al. November 20, 2 | 2018-11-20 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 10,007,183 - Tachibana , et al. June 26, 2 | 2018-06-26 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,977,330 - Tachibana , et al. May 22, 2 | 2018-05-22 |
Composition for forming a coating type BPSG film, substrate, and patterning process
Grant 9,902,875 - Tachibana , et al. February 27, 2 | 2018-02-27 |
Composition for forming a coating type silicon-containing film, substrate, and patterning process
Grant 9,880,470 - Tachibana , et al. January 30, 2 | 2018-01-30 |
Method For Reducing Metal Of Sugar-alcohol Compound And Sugar-alcohol Compound
App 20170369407 - NAKAHARA; Takayoshi ; et al. | 2017-12-28 |
Polymer for resist under layer film composition, resist under layer film composition, and patterning process
Grant 9,805,943 - Kikuchi , et al. October 31, 2 | 2017-10-31 |
Wet strippable gap fill materials
Grant 9,671,694 - Glodde , et al. June 6, 2 | 2017-06-06 |
Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
Grant 9,627,204 - Ogihara , et al. April 18, 2 | 2017-04-18 |
Patterning process using a boron phosphorus silicon glass film
Grant 9,580,623 - Tachibana , et al. February 28, 2 | 2017-02-28 |
Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin
Grant 9,522,979 - Watanabe , et al. December 20, 2 | 2016-12-20 |
Wet strip process for an antireflective coating layer
Grant 9,460,934 - Glodde , et al. October 4, 2 | 2016-10-04 |
Polymer For Resist Under Layer Film Composition, Resist Under Layer Film Composition, And Patterning Process
App 20160284559 - KIKUCHI; Rie ; et al. | 2016-09-29 |
Patterning Process
App 20160276152 - TACHIBANA; Seiichiro ; et al. | 2016-09-22 |
Fluorine-containing Silicon Compound, Method For Producing Same, And Method For Producing Fluorine-containing Silicon Resin
App 20160229960 - WATANABE; Takeru ; et al. | 2016-08-11 |
Compositon for forming metal oxide-containing film and patterning process
Grant 9,377,690 - Ogihara , et al. June 28, 2 | 2016-06-28 |
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
Grant 9,372,404 - Watanabe , et al. June 21, 2 | 2016-06-21 |
Method for producing semiconductor apparatus substrate
Grant 9,312,127 - Ogihara , et al. April 12, 2 | 2016-04-12 |
Composition For Forming A Coating Type Bpsg Film, Substrate, And Patterning Process
App 20160096978 - TACHIBANA; Seiichiro ; et al. | 2016-04-07 |
Composition For Forming A Coating Type Silicon-containing Film, Substrate, And Patterning Process
App 20160096977 - TACHIBANA; Seiichiro ; et al. | 2016-04-07 |
Method For Producing Semiconductor Apparatus Substrate
App 20160064220 - OGIHARA; Tsutomu ; et al. | 2016-03-03 |
Resist composition and patterning process
Grant 9,274,425 - Hatakeyama , et al. March 1, 2 | 2016-03-01 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,261,788 - Tachibana , et al. February 16, 2 | 2016-02-16 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160027653 - TACHIBANA; Seiichiro ; et al. | 2016-01-28 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160018735 - TACHIBANA; Seiichiro ; et al. | 2016-01-21 |
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
Grant 9,233,919 - Ohsawa , et al. January 12, 2 | 2016-01-12 |
Method for forming a resist under layer film and patterning process
Grant 9,230,827 - Nonaka , et al. January 5, 2 | 2016-01-05 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,188,866 - Ogihara , et al. November 17, 2 | 2015-11-17 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,176,382 - Ogihara , et al. November 3, 2 | 2015-11-03 |
Negative pattern forming process
Grant 9,091,933 - Kobayashi , et al. July 28, 2 | 2015-07-28 |
Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
Grant 9,046,764 - Tachibana , et al. June 2, 2 | 2015-06-02 |
Monomer, polymer, chemically amplified positive resist composition, and patterning process
Grant 9,017,918 - Hatakeyama , et al. April 28, 2 | 2015-04-28 |
Resist Composition And Patterning Process
App 20150099228 - Hatakeyama; Jun ; et al. | 2015-04-09 |
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
Grant 8,999,625 - Glodde , et al. April 7, 2 | 2015-04-07 |
Composition For Forming A Coating Type Bpsg Film, Substrate Formed A Film By Said Composition, And Patterning Process Using Said Composition
App 20150004791 - OGIHARA; Tsutomu ; et al. | 2015-01-01 |
Method For Forming A Resist Under Layer Film And Patterning Process
App 20140335692 - NONAKA; Shiori ; et al. | 2014-11-13 |
Sulfonium Salt-containing Polymer, Resist Composition, Patterning Process, And Sulfonium Salt Monomer And Making Method
App 20140296561 - OHSAWA; Youichi ; et al. | 2014-10-02 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273448 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Wet Strip Process For An Antireflective Coating Layer
App 20140273501 - Glodde; Martin ; et al. | 2014-09-18 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273447 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes
App 20140227641 - Glodde; Martin ; et al. | 2014-08-14 |
Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
Grant 8,791,288 - Kinsho , et al. July 29, 2 | 2014-07-29 |
Acetal compound, polymer, resist composition, and patterning process
Grant 8,791,290 - Hasegawa , et al. July 29, 2 | 2014-07-29 |
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
Grant 8,785,105 - Ohsawa , et al. July 22, 2 | 2014-07-22 |
Compositon For Forming Metal Oxide-containing Film And Patterning Process
App 20140193757 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140193975 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Patterning process
Grant 8,759,220 - Ogihara , et al. June 24, 2 | 2014-06-24 |
Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer
Grant 8,722,307 - Tachibana , et al. May 13, 2 | 2014-05-13 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20130337649 - TACHIBANA; Seiichiro ; et al. | 2013-12-19 |
Organic Film Composition, Method For Forming Organic Film And Patterning Process Using This, And Heat-decomposable Polymer
App 20130302990 - WATANABE; Takeru ; et al. | 2013-11-14 |
Positive resist composition and patterning process
Grant 8,501,384 - Hatakeyama , et al. August 6, 2 | 2013-08-06 |
Resist Underlayer Film Composition, Method For Producing Polymer For Resist Underlayer Film, And Patterning Process Using The Resist Underlayer Film Composition
App 20130171569 - TACHIBANA; Seiichiro ; et al. | 2013-07-04 |
Near-infrared Absorbing Film Composition For Lithographic Application
App 20130157463 - Goldfarb; Dario L. ; et al. | 2013-06-20 |
Positive resist composition and patterning process
Grant 8,450,042 - Hatakeyama , et al. May 28, 2 | 2013-05-28 |
Negative Pattern Forming Process
App 20130130183 - Kobayashi; Tomohiro ; et al. | 2013-05-23 |
Positive Resist Composition And Patterning Process
App 20130065179 - MAEDA; Kazunori ; et al. | 2013-03-14 |
Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film
Grant 8,323,536 - Ohashi , et al. December 4, 2 | 2012-12-04 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film Comprising Near-infrared Absorptive Layer
App 20120301828 - TACHIBANA; Seiichiro ; et al. | 2012-11-29 |
Antireflective coating composition, antireflective coating, and patterning process
Grant 8,313,890 - Tachibana , et al. November 20, 2 | 2012-11-20 |
Resist lower layer film-formed substrate
Grant 8,288,072 - Hatakeyama , et al. October 16, 2 | 2012-10-16 |
Positive resist composition and patterning process
Grant 8,211,618 - Hatakeyama , et al. July 3, 2 | 2012-07-03 |
Polymer, Positive Resist Composition, And Patterning Process
App 20120135357 - KOBAYASHI; Tomohiro ; et al. | 2012-05-31 |
Sulfonium Salt-containing Polymer, Resist Composition, Patterning Process, And Sulfonium Salt Monomer And Making Method
App 20120129103 - Ohsawa; Youichi ; et al. | 2012-05-24 |
Near-infrared Absorbing Dye, Near-infrared Absorptive Film-forming Composition, And Near-infrared Absorptive Film
App 20120119171 - OHASHI; Masaki ; et al. | 2012-05-17 |
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
Grant 8,129,086 - Hatakeyama , et al. March 6, 2 | 2012-03-06 |
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Grant 8,105,748 - Ohashi , et al. January 31, 2 | 2012-01-31 |
Monomer, Polymer, Chemically Amplified Positive Resist Composition, And Patterning Process
App 20110294070 - Hatakeyama; Jun ; et al. | 2011-12-01 |
Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
Grant 8,062,831 - Shinachi , et al. November 22, 2 | 2011-11-22 |
Positive resist composition and patterning process
Grant 8,062,828 - Ohsawa , et al. November 22, 2 | 2011-11-22 |
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Grant 8,057,985 - Ohashi , et al. November 15, 2 | 2011-11-15 |
Sulfonium salt-containing polymer, resist composition, and patterning process
Grant 8,048,610 - Ohsawa , et al. November 1, 2 | 2011-11-01 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262863 - TACHIBANA; Seiichiro ; et al. | 2011-10-27 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262862 - OHASHI; Masaki ; et al. | 2011-10-27 |
Sulfonium salt-containing polymer, resist composition, and patterning process
Grant 8,039,198 - Tachibana , et al. October 18, 2 | 2011-10-18 |
Acetal Compound, Polymer, Resist Composition, And Patterning Process
App 20110236831 - HASEGAWA; Koji ; et al. | 2011-09-29 |
Resist Polymer, Preparing Method, Resist Composition And Patterning Process
App 20110054133 - Tachibana; Seiichiro ; et al. | 2011-03-03 |
Antireflective coating composition, antireflective coating, and patterning process
Grant 7,879,530 - Tachibana , et al. February 1, 2 | 2011-02-01 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,871,752 - Hasegawa , et al. January 18, 2 | 2011-01-18 |
Acid-labile Ester Monomer Having Spirocyclic Structure, Polymer, Resist Composition, And Patterning Process
App 20100304295 - Kinsho; Takeshi ; et al. | 2010-12-02 |
Positive Resist Composition And Patterning Process
App 20100227274 - Hatakeyama; Jun ; et al. | 2010-09-09 |
Positive Resist Composition And Patterning Process
App 20100227273 - Hatakeyama; Jun ; et al. | 2010-09-09 |
Antireflective Coating Composition, Antireflective Coating , And Patterning Process
App 20100151381 - TACHIBANA; Seiichiro ; et al. | 2010-06-17 |
Antireflection film composition and patterning process using the same
Grant 7,687,228 - Hatakeyama , et al. March 30, 2 | 2010-03-30 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
Grant 7,687,222 - Watanabe , et al. March 30, 2 | 2010-03-30 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,678,530 - Hasegawa , et al. March 16, 2 | 2010-03-16 |
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process
App 20100055608 - Ohashi; Masaki ; et al. | 2010-03-04 |
Polymer, resist composition and patterning process
Grant 7,666,571 - Watanabe , et al. February 23, 2 | 2010-02-23 |
Resist composition and patterning process using the same
Grant 7,629,106 - Hatakeyama , et al. December 8, 2 | 2009-12-08 |
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
App 20090297979 - Hatakeyama; Jun ; et al. | 2009-12-03 |
Positive resist composition and patterning process
Grant 7,618,765 - Nishi , et al. November 17, 2 | 2009-11-17 |
Carboxyl-containing Lactone Compound, Polymer, Resist Composition, And Patterning Process
App 20090274984 - SHINACHI; Satoshi ; et al. | 2009-11-05 |
Sulfonium Salt-containing Polymer, Resist Composition, And Patterning Process
App 20090269696 - OHSAWA; Youichi ; et al. | 2009-10-29 |
Polymer, resist composition and patterning process
Grant 7,601,479 - Tachibana , et al. October 13, 2 | 2009-10-13 |
Polymer, resist composition and patterning process
Grant 7,598,015 - Tachibana , et al. October 6, 2 | 2009-10-06 |
Sulfonium Salt-containing Polymer, Resist Composition, And Patterning Process
App 20090233223 - TACHIBANA; Seiichiro ; et al. | 2009-09-17 |
Positive Resist Composition And Patterning Process
App 20090202943 - Ohsawa; Youichi ; et al. | 2009-08-13 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
Grant 7,569,326 - Ohsawa , et al. August 4, 2 | 2009-08-04 |
Positive resist composition and patterning process
Grant 7,541,133 - Nishi , et al. June 2, 2 | 2009-06-02 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,531,289 - Kinsho , et al. May 12, 2 | 2009-05-12 |
Antireflective Coating Composition, Antireflective Coating, And Patterning Process
App 20090087799 - Tachibana; Seiichiro ; et al. | 2009-04-02 |
Resist composition and patterning process using the same
Grant 7,459,261 - Hatakeyama , et al. December 2, 2 | 2008-12-02 |
Positive resist composition and patterning process
App 20080254386 - Nishi; Tsunehiro ; et al. | 2008-10-16 |
Resist lower layer film composition and patterning process using the same
App 20080227037 - Hatakeyama; Jun ; et al. | 2008-09-18 |
Antireflection film composition and patterning process using the same
App 20080220381 - Hatakeyama; Jun ; et al. | 2008-09-11 |
Positive resist composition and patterning process
App 20080124652 - Nishi; Tsunehiro ; et al. | 2008-05-29 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
App 20080102407 - Ohsawa; Youichi ; et al. | 2008-05-01 |
Lactone-containing compound, polymer, resist composition, and patterning process
App 20080026331 - HASEGAWA; Koji ; et al. | 2008-01-31 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
App 20080008962 - Watanabe; Takeru ; et al. | 2008-01-10 |
Resist polymer, preparing method, resist composition and patterning process
App 20070264592 - Tachibana; Seiichiro ; et al. | 2007-11-15 |
Lactone-containing compound, polymer, resist composition, and patterning process
App 20070160929 - Hasegawa; Koji ; et al. | 2007-07-12 |
Resist composition and patterning process using the same
App 20070111140 - Hatakeyama; Jun ; et al. | 2007-05-17 |
Polymer, resist composition and patterning process
App 20070099114 - Watanabe; Takeru ; et al. | 2007-05-03 |
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,202,318 - Kinsho , et al. April 10, 2 | 2007-04-10 |
Resist composition and patterning process using the same
App 20060147836 - Hatakeyama; Jun ; et al. | 2006-07-06 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
App 20060093960 - Kinsho; Takeshi ; et al. | 2006-05-04 |
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
App 20060009602 - Kinsho; Takeshi ; et al. | 2006-01-12 |
Polymer, resist composition and patterning process
App 20050282082 - Tachibana, Seiichiro ; et al. | 2005-12-22 |
Acetal compound, polymer, resist composition and patterning process
Grant 6,962,767 - Watanabe , et al. November 8, 2 | 2005-11-08 |
Polymer, resist composition and patterning process
App 20050208424 - Hasegawa, Koji ; et al. | 2005-09-22 |
Polymer, resist composition and patterning process
App 20050058938 - Tachibana, Seiichiro ; et al. | 2005-03-17 |
Polymer, resist composition and patterning process
Grant 6,835,525 - Nishi , et al. December 28, 2 | 2004-12-28 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
Grant 6,794,111 - Nishi , et al. September 21, 2 | 2004-09-21 |
Ether, polymer, resist composition and patterning process
Grant 6,784,268 - Tachibana , et al. August 31, 2 | 2004-08-31 |
Polymer, resist composition and patterning process
Grant 6,780,563 - Hasegawa , et al. August 24, 2 | 2004-08-24 |
Cyclic acetal compound, polymer, resist composition and patterning process
Grant 6,743,566 - Nakashima , et al. June 1, 2 | 2004-06-01 |
Ether, polymer, resist composition and patterning process
App 20040013973 - Tachibana, Seiichiro ; et al. | 2004-01-22 |
Polymer, resist composition and patterning process
Grant 6,673,515 - Nishi , et al. January 6, 2 | 2004-01-06 |
Ester compounds, polymers, resist compositions and patterning process
Grant 6,670,498 - Nishi , et al. December 30, 2 | 2003-12-30 |
Polymer, resist composition and patterning process
Grant 6,660,448 - Tachibana , et al. December 9, 2 | 2003-12-09 |
Novel ester compounds polymers, resist compositions and patterning process
App 20030198891 - Hasegawa, Koji ; et al. | 2003-10-23 |
Ether, polymer, resist composition and patterning process
Grant 6,624,335 - Tachibana , et al. September 23, 2 | 2003-09-23 |
Acetal compound, polymer, resist composition and patterning response
App 20030153706 - Watanabe, Takeru ; et al. | 2003-08-14 |
Polymers, resist compositions and patterning process
Grant 6,566,038 - Nishi , et al. May 20, 2 | 2003-05-20 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20030088115 - Nishi, Tsunehiro ; et al. | 2003-05-08 |
Cyclic acetal compound, polymer, resist composition and patterning process
App 20030045731 - Nakashima, Mutsuo ; et al. | 2003-03-06 |
Polymer, resist composition and patterning process
Grant 6,524,765 - Nishi , et al. February 25, 2 | 2003-02-25 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
App 20020197559 - Nishi, Tsunehiro ; et al. | 2002-12-26 |
Ether, polymer, resist composition and patterning process
App 20020161150 - Tachibana, Seiichiro ; et al. | 2002-10-31 |
Polymer, resist composition and patterning process
App 20020150835 - Nishi, Tsunehiro ; et al. | 2002-10-17 |
Cyclic acetal compound, polymer, resist composition and patterning process
App 20020147290 - Nakashima, Mutsuo ; et al. | 2002-10-10 |
Acetal compound, polymer, resist composition and patterning response
App 20020132970 - Watanabe, Takeru ; et al. | 2002-09-19 |
Polymer, resist composition and patterning process
App 20020091215 - Tachibana, Seiichiro ; et al. | 2002-07-11 |
Polymer, resist composition and patterning process
App 20020061465 - Hasegawa, Koji ; et al. | 2002-05-23 |
Polymer, resist composition and patterning process
App 20020061463 - Nishi, Tsunehiro ; et al. | 2002-05-23 |
Novel ester compounds having alicyclic and oxirane structures and method for preparing the same
App 20020035279 - Watanabe, Takeru ; et al. | 2002-03-21 |
Novel lactone compounds having alicyclic structure and their manufacturing method
App 20020019545 - Kinsho, Takeshi ; et al. | 2002-02-14 |
Novel lactone compounds having alicyclic structure and their manufacturing method
App 20020016477 - Kinsho, Takeshi ; et al. | 2002-02-07 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20020007031 - Nishi, Tsunehiro ; et al. | 2002-01-17 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20020004178 - Hasegawa, Koji ; et al. | 2002-01-10 |
Polymers, resist compositions and patterning process
App 20010051315 - Nishi, Tsunehiro ; et al. | 2001-12-13 |
Novel ester compounds having alicyclic structure and method for preparing same
App 20010051742 - Hasegawa, Koji ; et al. | 2001-12-13 |
Novel ester compounds having alicyclic structure and method for preparing same
App 20010051741 - Watanabe, Takeru ; et al. | 2001-12-13 |
Polymers, resist compositions and patterning process
App 20010051316 - Nishi, Tsunehiro ; et al. | 2001-12-13 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20010044071 - Hasegawa, Koji ; et al. | 2001-11-22 |
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