Tachi; Shinichi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tachi; Shinichi.The latest application filed is for "plasma processing apparatus and plasma processing method".
Company Profile
0.32.14
- Tachi; Shinichi - Sayama-shi JP
- Tachi; Shinichi - Sayama JP
- Tachi; Shinichi - Hachioji JP
Patent Activity
| Patent | Date |
|---|---|
| Plasma processing apparatus and plasma processing method App 20060144518 - Kaji; Tetsunori ; et al. | 2006-07-06 |
| Method and apparatus for dry etching Grant 7,071,114 - Kumihashi , et al. July 4, 2 | 2006-07-04 |
| Plasma processing method Grant 6,927,173 - Mori , et al. August 9, 2 | 2005-08-09 |
| Plasma processing apparatus and plasma processing method Grant 6,902,683 - Kaji , et al. June 7, 2 | 2005-06-07 |
| Plasma processing apparatus App 20050082006 - Kaji, Tetsunori ; et al. | 2005-04-21 |
| Method and apparatus for dry etching App 20050074977 - Kumihashi, Takao ; et al. | 2005-04-07 |
| Method of manufacturing a semiconductor device and manufacturing system Grant 6,842,658 - Izawa , et al. January 11, 2 | 2005-01-11 |
| Plasma processing apparatus App 20040178180 - Kaji, Tetsunori ; et al. | 2004-09-16 |
| Method for manufacturing semiconductor device Grant 6,713,401 - Yokogawa , et al. March 30, 2 | 2004-03-30 |
| Dry etching method App 20040058554 - Izawa, Masaru ; et al. | 2004-03-25 |
| Apparatus for cleaning semiconductor wafers in a vacuum environment Grant 6,643,893 - Momonoi , et al. November 11, 2 | 2003-11-11 |
| Method for cleaning semiconductor wafers in a vacuum environment Grant 6,629,538 - Yokogawa , et al. October 7, 2 | 2003-10-07 |
| Plasma processing method App 20030098288 - Mori, Masahito ; et al. | 2003-05-29 |
| Plasma processing system and method for manufacturing a semiconductor device by using the same Grant 6,551,445 - Yokogawa , et al. April 22, 2 | 2003-04-22 |
| Plasma treatment apparatus and plasma treatment method Grant 6,475,918 - Izawa , et al. November 5, 2 | 2002-11-05 |
| Method of manufacturing a semiconductor device and manufacturing system App 20020103563 - Izawa, Masaru ; et al. | 2002-08-01 |
| Method and apparatus for dry etching App 20020098708 - Kumihashi, Takao ; et al. | 2002-07-25 |
| Dry cleaning method App 20020092541 - Yokogawa, Kenetsu ; et al. | 2002-07-18 |
| Method for manufacturing semiconductor device App 20020094691 - Yokogawa, Kenetsu ; et al. | 2002-07-18 |
| Dry cleaning apparatus App 20020092121 - Momonoi, Yoshinori ; et al. | 2002-07-18 |
| Plasma processing apparatus and plasma processing method App 20020069971 - Kaji, Tetsunori ; et al. | 2002-06-13 |
| Dry chemical-mechanical polishing method App 20020037684 - Yamamoto, Seiji ; et al. | 2002-03-28 |
| Plasma Processing System And Method App 20020020494 - YOKOGAWA, KEN?apos;ETSU ; et al. | 2002-02-21 |
| Plasma processing apparatus and plasma processing method Grant 6,197,151 - Kaji , et al. March 6, 2 | 2001-03-06 |
| Method and apparatus for dry etching Grant 6,136,721 - Kumihashi , et al. October 24, 2 | 2000-10-24 |
| Plasma processing apparatus and plasma processing method Grant 6,129,806 - Kaji , et al. October 10, 2 | 2000-10-10 |
| Plasma processing apparatus Grant 6,033,481 - Yokogawa , et al. March 7, 2 | 2000-03-07 |
| Plasma processing apparatus Grant 5,891,252 - Yokogawa , et al. April 6, 1 | 1999-04-06 |
| Semiconductor memory device having improved isolation between electrodes, and process for fabricating the same Grant 5,499,207 - Miki , et al. March 12, 1 | 1996-03-12 |
| Method and apparatus for dry etching Grant 5,474,650 - Kumihashi , et al. December 12, 1 | 1995-12-12 |
| Dry-etching method and apparatus Grant 5,409,562 - Kumihashi , et al. April 25, 1 | 1995-04-25 |
| Dry etching apparatus and method Grant 5,368,685 - Kumihashi , et al. November 29, 1 | 1994-11-29 |
| Dry etching method Grant 5,354,416 - Okudaira , et al. * October 11, 1 | 1994-10-11 |
| Semiconductor device and process of producing the same Grant 5,343,353 - Miki , et al. August 30, 1 | 1994-08-30 |
| Method and apparatus for dry etching Grant 5,318,667 - Kumihashi , et al. June 7, 1 | 1994-06-07 |
| Plasma treatment method and apparatus Grant 5,242,539 - Kumihashi , et al. September 7, 1 | 1993-09-07 |
| Dry etching method Grant 5,147,500 - Tachi , et al. September 15, 1 | 1992-09-15 |
| Dry etching method Grant 4,992,136 - Tachi , et al. February 12, 1 | 1991-02-12 |
| Method of dry etching Grant 4,986,877 - Tachi , et al. January 22, 1 | 1991-01-22 |
| Dry etching by alternately etching and depositing Grant 4,985,114 - Okudaira , et al. January 15, 1 | 1991-01-15 |
| Dry etching apparatus Grant 4,956,043 - Kanetomo , et al. September 11, 1 | 1990-09-11 |
| Etching method Grant 4,943,344 - Tachi , et al. July 24, 1 | 1990-07-24 |
| Plasma treating method and apparatus therefor Grant 4,911,812 - Kudo , et al. March 27, 1 | 1990-03-27 |
| Process for surface treatment Grant 4,857,137 - Tachi , et al. August 15, 1 | 1989-08-15 |
| Gas for selectively etching silicon nitride and process for selectively etching silicon nitride with the gas Grant 4,529,476 - Kawamoto , et al. July 16, 1 | 1985-07-16 |
| Dry etching method Grant 4,406,733 - Tachi September 27, 1 | 1983-09-27 |
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