Tabara; Suguru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tabara; Suguru.The latest application filed is for "method of manufacturing semiconductor device".

Company Profile

0.17.3

Tabara; Suguru - Hamamatsu JP
Tabara, Suguru - Hamamatsu-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of manufacturing semiconductor device Grant 7,265,058 - Tabara September 4, 2	2007-09-04
Wiring forming method Grant 6,835,651 - Tabara , et al. December 28, 2	2004-12-28
Method of manufacturing semiconductor device App 20040082172 - Tabara, Suguru	2004-04-29
Wiring forming method App 20030029035 - Tabara, Suguru ; et al.	2003-02-13
Wiring forming method App 20020052107 - Tabara, Suguru ; et al.	2002-05-02
Manufacture of semiconductor device with fine patterns Grant 6,187,689 - Tabara February 13, 2	2001-02-13
Conductive layer forming method using etching mask with direction <200> Grant 6,150,250 - Tabara , et al. November 21, 2	2000-11-21
Semiconductor device with multi-layer wiring Grant 6,137,175 - Tabara October 24, 2	2000-10-24
Measurement of electron shading damage Grant 6,114,182 - Tabara September 5, 2	2000-09-05
Method of forming wiring pattern Grant 6,080,681 - Tabara June 27, 2	2000-06-27
Dry etching suppressing formation of notch Grant 6,008,132 - Tabara December 28, 1	1999-12-28
Method of manufacturing a semiconductor device using antireflection coating Grant 5,998,300 - Tabara December 7, 1	1999-12-07
Method of measuring electron shading damage Grant 5,940,682 - Tabara August 17, 1	1999-08-17
Manufacture of semiconductor device with fine pattens Grant 5,910,021 - Tabara June 8, 1	1999-06-08
Metal plug with adhesion layer Grant 5,767,015 - Tabara June 16, 1	1998-06-16
Method for manufacturing a semiconductor device using antireflection coating Grant 5,707,883 - Tabara January 13, 1	1998-01-13
Multilayer aluminum wiring in semiconductor IC Grant 5,519,254 - Tabara May 21, 1	1996-05-21
Method of etching polysilicon using a thin oxide mask formed on the polysilicon while doping Grant 5,514,621 - Tabara May 7, 1	1996-05-07
Method of making a wiring layer wherein the masking material is ashed using an alcohol containing plasma Grant 5,451,293 - Tabara September 19, 1	1995-09-19
Method of forming multilayer aluminum wiring in semiconductor IC Grant 5,399,527 - Tabara March 21, 1	1995-03-21

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