Sziklas; Laurie

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sziklas; Laurie.The latest application filed is for "direct-deposition system including standoffs for controlling substrate-mask separation".

Company Profile

3.4.5

Sziklas; Laurie - Hopewell Junction NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Linear source apparatus, system and method of use Grant 11,313,033 - Ali , et al. April 26, 2	2022-04-26
Direct-Deposition System Including Standoffs for Controlling Substrate-Mask Separation App 20210285087 - DONOGHUE; Evan P. ; et al.	2021-09-16
Direct-deposition system including standoffs for controlling substrate-mask separation Grant 11,035,033 - Donoghue , et al. June 15, 2	2021-06-15
Linear Source Apparatus, System And Method Of Use App 20200407839 - ALI; Tariq ; et al.	2020-12-31
Linear source apparatus, system and method of use Grant 10,815,563 - Ali , et al. October 27, 2	2020-10-27
Direct-Deposition System Including Standoffs for Controlling Substrate-Mask Separation App 20200131617 - DONOGHUE; Evan P. ; et al.	2020-04-30
Apparatus and method of directly patterning high resolution active matrix organic light emitting diodes using high-resolution shadow mask Grant 10,636,969 - Donoghue , et al.	2020-04-28
Linear Source Apparatus, System And Method Of Use App 20190106782 - ALI; Tariq ; et al.	2019-04-11
Apparatus And Method Of Directly Patterning High Resolution Active Matrix Organic Light Emitting Diodes Using High-resolution Shadow Mask App 20180315926 - DONOGHUE; Evan P. ; et al.	2018-11-01

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