Patent | Date |
---|
Argon addition to remote plasma oxidation Grant 11,081,340 - Lo , et al. August 3, 2 | 2021-08-03 |
Thin film treatment process Grant 10,971,357 - Liu , et al. April 6, 2 | 2021-04-06 |
Argon Addition To Remote Plasma Oxidation App 20200251331 - Kind Code | 2020-08-06 |
Argon addition to remote plasma oxidation Grant 10,636,650 - Lo , et al. | 2020-04-28 |
Thin Film Treatment Process App 20200111659 - LIU; Wei ;   et al. | 2020-04-09 |
Fluorination during ALD high-k, fluorination post high-k and use of a post fluorination anneal to engineer fluorine bonding and incorporation Grant 10,580,643 - Swenberg , et al. | 2020-03-03 |
Hydrogenation and nitridization processes for modifying effective oxide thickness of a film Grant 10,510,545 - Graoui , et al. Dec | 2019-12-17 |
Hydrogenation and nitridization processes for reducing oxygen content in a film Grant 10,504,779 - Swenberg , et al. Dec | 2019-12-10 |
Hydrogenation and nitridization processes for modifying effective oxide thickness of a film Grant 10,431,466 - Swenberg , et al. O | 2019-10-01 |
Modifying Work Function Of A Metal Film With A Plasma Process App 20190287805 - HUNG; Steven C. H. ;   et al. | 2019-09-19 |
Argon Addition To Remote Plasma Oxidation App 20190221427 - LO; Hansel ;   et al. | 2019-07-18 |
Modifying work function of a metal film with a plasma process Grant 10,347,492 - Hung , et al. July 9, 2 | 2019-07-09 |
Hydrogenation And Nitridization Processes For Modifying Effective Oxide Thickness Of A Film App 20190172716 - Graoui; Houda ;   et al. | 2019-06-06 |
Hydrogenation And Nitridization Processes For Reducing Oxygen Content In A Film App 20190157143 - SWENBERG; Johanes S. ;   et al. | 2019-05-23 |
Hydrogenation And Nitridization Processes For Modifying Effective Oxide Thickness Of A Film App 20190115219 - SWENBERG; Johanes S. ;   et al. | 2019-04-18 |
Gas Injector With Baffle App 20190105614 - PANDEY; Vishwas Kumar ;   et al. | 2019-04-11 |
Hydrogenation and nitridization processes for reducing oxygen content in a film Grant 10,236,207 - Swenberg , et al. | 2019-03-19 |
Hydrogenation and nitridization processes for modifying effective oxide thickness of a film Grant 10,103,027 - Swenberg , et al. October 16, 2 | 2018-10-16 |
Modifying Work Function Of A Metal Film With A Plasma Process App 20180218911 - HUNG; Steven C. H. ;   et al. | 2018-08-02 |
Hydrogenation And Nitridization Processes For Reducing Oxygen Content In A Film App 20170365512 - SWENBERG; Johanes S. ;   et al. | 2017-12-21 |
Hydrogenation And Nitridization Processes For Modifying Effective Oxide Thickness Of A Film App 20170365480 - SWENBERG; Johanes S. ;   et al. | 2017-12-21 |
Fluorination During Ald High-k, Fluorination Post High-k And Use Of A Post Fluorination Anneal To Engineer Fluorine Bonding And Incorporation App 20170236702 - SWENBERG; Johanes S. ;   et al. | 2017-08-17 |
Method and apparatus for single step selective nitridation Grant 9,023,700 - Ganguly , et al. May 5, 2 | 2015-05-05 |
Method And Apparatus For Single Step Selective Nitridation App 20140342543 - GANGULY; Udayan ;   et al. | 2014-11-20 |
Remote radical hydride dopant incorporation for delta doping in silicon Grant 8,846,509 - Olsen , et al. September 30, 2 | 2014-09-30 |
Method and apparatus for single step selective nitridation Grant 8,748,259 - Ganguly , et al. June 10, 2 | 2014-06-10 |
Remote Radical Hydride Dopant Incorporation For Delta Doping In Silicon App 20130137249 - Olsen; Christopher S. ;   et al. | 2013-05-30 |
Method And Apparatus For Cleaning A Substrate Surface App 20130068390 - SANCHEZ; Errol Antonio C. ;   et al. | 2013-03-21 |
Dual Plasma Source, Lamp Heated Plasma Chamber App 20120222618 - Olsen; Christopher ;   et al. | 2012-09-06 |
Dual Zone Gas Injection Nozzle App 20120164845 - Liu; Wei ;   et al. | 2012-06-28 |
Dual zone gas injection nozzle Grant 8,137,463 - Liu , et al. March 20, 2 | 2012-03-20 |
Method And Apparatus For Single Step Selective Nitridation App 20110217834 - Ganguly; Udayan ;   et al. | 2011-09-08 |
Dual Zone Gas Injection Nozzle App 20090159424 - Liu; Wei ;   et al. | 2009-06-25 |