loadpatents
name:-0.0073111057281494
name:-0.010406017303467
name:-0.00039100646972656
Sweeney; Donald W. Patent Filings

Sweeney; Donald W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sweeney; Donald W..The latest application filed is for "method for repairing mask-blank defects using repair-zone compensation".

Company Profile
0.11.5
  • Sweeney; Donald W. - San Ramon CA
  • Sweeney; Donald W. - Livermore CA
  • Sweeney; Donald W. - Alamo CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for repairing mask-blank defects using repair-zone compensation
App 20060234135 - Hau-Riege; Stefan P. ;   et al.
2006-10-19
EUV lithography reticles fabricated without the use of a patterned absorber
Grant 7,049,033 - Stearns , et al. May 23, 2
2006-05-23
Method for the manufacture of phase shifting masks for EUV lithography
Grant 7,022,435 - Stearns , et al. April 4, 2
2006-04-04
Method to repair localized amplitude defects in a EUV lithography mask blank
Grant 6,967,168 - Stearns , et al. November 22, 2
2005-11-22
Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography
Grant 6,821,682 - Stearns , et al. November 23, 2
2004-11-23
EUV lithography reticles fabricated without the use of a patterned absorber
App 20040142250 - Stearns, Daniel G. ;   et al.
2004-07-22
Method for the manufacture of phase shifting masks for EUV lithography
App 20040062999 - Stearns, Daniel G. ;   et al.
2004-04-01
Method for fabricating reticles for EUV lithography without the use of a patterned absorber
Grant 6,635,391 - Stearns , et al. October 21, 2
2003-10-21
Method to repair localized amplitude defects in a EUV lithography mask blank
App 20030006214 - Stearns, Daniel G. ;   et al.
2003-01-09
Method for fabricating reticles for EUV lithography without the use of a patterned absorber
App 20020122989 - Stearns, Daniel G. ;   et al.
2002-09-05
Method for mask repair using defect compensation
Grant 6,235,434 - Sweeney , et al. May 22, 2
2001-05-22
Extreme ultraviolet lithography machine
Grant 6,031,598 - Tichenor , et al. February 29, 2
2000-02-29
Deformable mirror for short wavelength applications
Grant 5,986,795 - Chapman , et al. November 16, 1
1999-11-16
Reflective optical imaging system with balanced distortion
Grant 5,973,826 - Chapman , et al. October 26, 1
1999-10-26
Optical ranked-order filtering using threshold decomposition
Grant 4,949,389 - Allebach , et al. August 14, 1
1990-08-14
Position, rotation, and intensity invariant recognizing method
Grant 4,838,644 - Ochoa , et al. June 13, 1
1989-06-13

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed