Suzuki; Kazuharu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Suzuki; Kazuharu.The latest application filed is for "raw material for vapor deposition including organoplatinum compound and vapor deposition method using the raw material for vapor".

Company Profile

7.17.15

Suzuki; Kazuharu - Tsukuba JP
SUZUKI; Kazuharu - Tsukuba-shi JP
Suzuki; Kazuharu - Ibaraki JP
- Ibaraki JP
Suzuki; Kazuharu - Yamagata JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Raw material for vapor deposition including organoplatinum compound and vapor deposition method using the raw material for vapor deposition Grant 11,149,045 - Harada , et al. October 19, 2	2021-10-19
Chemical deposition raw material including iridium complex and chemical deposition method using the chemical deposition raw material Grant 11,084,837 - Harada , et al. August 10, 2	2021-08-10
Raw Material For Vapor Deposition Including Organoplatinum Compound And Vapor Deposition Method Using The Raw Material For Vapor App 20200148713 - HARADA; Ryosuke ; et al.	2020-05-14
Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw material Grant 10,526,698 - Harada , et al. J	2020-01-07
Chemical Deposition Raw Material Including Iridium Complex And Chemical Deposition Method Using The Chemical Deposition Raw Mate App 20190367545 - HARADA; Ryosuke ; et al.	2019-12-05
Organoplatinum compound for use in the chemical deposition of platinum compound thin films Grant 10,465,283 - Harada , et al. No	2019-11-05
Heterogeneous polynuclear complex for use in the chemical deposition of composite metal or metal compound thin films Grant 10,407,450 - Harada , et al. Sept	2019-09-10
Chemical Deposition Raw Material Including Heterogeneous Polynuclear Complex And Chemical Deposition Method Using The Chemical D App 20190177837 - HARADA; Ryosuke ; et al.	2019-06-13
Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical deposition Grant 10,131,987 - Harada , et al. November 20, 2	2018-11-20
Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical deposition Grant 10,077,282 - Harada , et al. September 18, 2	2018-09-18
Chemical Deposition Raw Material Including Heterogeneous Polynuclear Complex And Chemical Deposition Method Using The Chemical Deposition Raw Material App 20180119274 - HARADA; Ryosuke ; et al.	2018-05-03
Chemical Deposition Raw Material Including Heterogeneous Polynuclear Complex And Chemical Deposition Method Using The Chemical Deposition Raw Material App 20180079764 - HARADA; Ryosuke ; et al.	2018-03-22
Raw Material For Chemical Deposition Composed Of Organoplatinum Compound, And Chemical Deposition Method Using The Raw Material For Chemical Deposition App 20180072765 - HARADA; Ryosuke ; et al.	2018-03-15
Raw Material For Chemical Deposition Composed Of Organoplatinum Compound, And Chemical Deposition Method Using The Raw Material For Chemical Deposition App 20180066357 - HARADA; Ryosuke ; et al.	2018-03-08
Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrate Grant 9,805,936 - Nabeya , et al. October 31, 2	2017-10-31
Chemical Vapor Deposition Raw Material Comprising Organic Ruthenium Compound And Chemical Vapor Deposition Method Using Chemical Vapor Deposition Raw Material App 20170218509 - HARADA; Ryosuke ; et al.	2017-08-03
Chemical vapor deposition raw material containing organic nickel compound, and chemical vapor deposition method using the chemical vapor deposition raw material Grant 9,447,495 - Suzuki , et al. September 20, 2	2016-09-20
Method For Producing Nickel Thin Film on a Si Substrate By Chemical Vapor Deposition Method, And Method For Producing Ni Silicide Thin Film On Si Substrate App 20160233098 - NABEYA; Shunichi ; et al.	2016-08-11
Chemical vapor deposition raw material comprising organoplatinum compound, and chemical vapor deposition method using the chemical vapor deposition raw material Grant 9,382,616 - Saito , et al. July 5, 2	2016-07-05
Chemical Vapor Deposition Raw Material Containing Organic Nickel Compound, And Chemical Vapor Deposition Method Using The Chemical Vapor Deposition Raw Material App 20160115587 - SUZUKI; Kazuharu ; et al.	2016-04-28
Chemical Vapor Deposition Raw Material Comprising Organoplatinum Compound, And Chemical Vapor Deposition Method Using The Chemical Vapor Deposition Raw Material App 20150030772 - Saito; Masayuki ; et al.	2015-01-29
Cyclooctatetraenetricarbonyl ruthenium complex, method of producing the same, and method of producing film using the complex as raw material Grant 08920875 -	2014-12-30
Cyclooctatetraenetricarbonyl ruthenium complex, method of producing the same, and method of producing film using the complex as raw material Grant 8,920,875 - Suzuki , et al. December 30, 2	2014-12-30
Chemical vapor deposition method using an organoplatinum compound Grant 8,911,827 - Suzuki , et al. December 16, 2	2014-12-16
Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compound Grant 8,642,796 - Saito , et al. February 4, 2	2014-02-04
Organic Platinum Compound For Chemical Vapor Deposition, And Chemical Vapor Deposition Method Using Organic Platinum Compound App 20130344243 - Suzuki; Kazuharu ; et al.	2013-12-26
Organoruthenium Compound For Chemical Deposition And Chemical Deposition Process Using The Organoruthenium Compound App 20110318488 - SAITO; MASAYUKI ; et al.	2011-12-29
Cyclooctatetraenetricarbonyl Ruthenium Complex, Method Of Producing The Same, And Method Of Producing Film Using The Complex As Raw Material App 20110287175 - Suzuki; Kazuharu ; et al.	2011-11-24
Blower Grant 5,266,004 - Tsumurai , et al. November 30, 1	1993-11-30

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