SUPERCRITICAL SYSTEMS, INC.

Patent Applications and Registrations

Patent applications and USPTO patent grants for SUPERCRITICAL SYSTEMS, INC..The latest application filed is for "phase change based heating element system and method".

Company Profile

0.3.19

SUPERCRITICAL SYSTEMS, INC. - Gilbert AZ
Supercritical Systems, Inc. -
Supercritical Systems, Inc. - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Phase Change Based Heating Element System And Method App 20100000681 - Bertram; Ronald T. ; et al.	2010-01-07
Gate valve for plus-atmospheric pressure semiconductor process vessels Grant 7,494,107 - Sheydayi , et al. February 24, 2	2009-02-24
Computer architecture for communicating between objects App 20080109509 - Dickerson; Joel Lee ; et al.	2008-05-08
Method and apparatus for selectively filtering residue from a processing chamber App 20060102282 - Scott; Douglas Michael	2006-05-18
Temperature controlled high pressure pump App 20060073041 - Goshi; Gentaro	2006-04-06
Ionic fluid in supercritical fluid for semiconductor processing App 20050227187 - Schilling, Paul E.	2005-10-13
Pump design for circulating supercritical carbon dioxide App 20050112003 - Jones, William Dale ; et al.	2005-05-26
Processing chamber including a circulation loop integrally formed in a chamber housing App 20050067002 - Jones, William Dale	2005-03-31
Alignment means for chamber closure to reduce wear on surfaces App 20050034660 - Hillman, Joseph	2005-02-17
Vacuum chuck apparatus and method for holding a wafer during high pressure processing App 20050035514 - Hillman, Joseph ; et al.	2005-02-17
Regulation of flow of processing chemistry only into a processing chamber App 20050022850 - Jones, William Dale	2005-02-03
Control of fluid flow in the processing of an object with a fluid App 20050025628 - Jones, William Dale	2005-02-03
High-pressure processing chamber for a semiconductor wafer App 20050014370 - Jones, William Dale	2005-01-20
Apparatus and method of securing a workpiece during high-pressure processing App 20040211447 - Yokomizo, Kenji	2004-10-28
Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal App 20040177867 - Schilling, Paul E.	2004-09-16
Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing App 20040154647 - Sheydayi, Alexei ; et al.	2004-08-12
High-pressure processing chamber for a semiconductor wafer App 20040157463 - Jones, William Dale	2004-08-12
Vacuum chuck utilizing sintered material and method of providing thereof App 20040157420 - Sheydayi, Alexei	2004-08-12
Method and apparatus for supercritical processing of multiple workpieces Grant 6,736,149 - Biberger , et al. May 18, 2	2004-05-18
Pressure enhanced diaphragm valve App 20030155541 - Sheydayi, Alexei	2003-08-21
Removal of CMP residue from semiconductors using supercritical carbon dioxide process Grant 6,277,753 - Mullee , et al. August 21, 2	2001-08-21
Removal of polishing residue from substrate using supercritical fluid process App 20010008800 - Koch, Robert	2001-07-19

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