Sung; Mei-Hui
Patent Applications and Registrations
Patent applications and USPTO patent grants for Sung; Mei-Hui.The latest application filed is for "zirconium oxide and hafnium oxide etching using halogen containing chemicals".
- Sung; Mei-Hui - Tao-Yuan TW
- Sung; Mei-Hui - Taoyuan TW
- Sung; Mei-Hui - Sen-Kan TW
- Sung; Mei-Hui - Hsin-Chu TW
- Sung, Mei-Hui - Hsin-chu city TW
| Patent | Date |
|---|---|
| Zirconium oxide and hafnium oxide etching using halogen containing chemicals Grant 7,012,027 - Perng , et al. March 14, 2 | 2006-03-14 |
| Zirconium oxide and hafnium oxide etching using halogen containing chemicals App 20050164479 - Perng, Baw-Ching ; et al. | 2005-07-28 |
| Multi-purpose composite mask for dual damascene patterning Grant 6,689,695 - Lui , et al. February 10, 2 | 2004-02-10 |
| Method of resist stripping over low-k dielectric material Grant 6,647,994 - Lui , et al. November 18, 2 | 2003-11-18 |
| Method for forming a dual damascene aperture while employing a peripherally localized intermediate etch stop layer Grant 6,582,974 - Lui , et al. June 24, 2 | 2003-06-24 |
| Method For Forming A Dual Damascene Aperture While Employing A Peripherally Localized Intermediate Etch Stop Layer App 20030092260 - Lui, Lawrence MH ; et al. | 2003-05-15 |
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