Sundberg; Linda K.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sundberg; Linda K..The latest application filed is for "multifunctional polymers".

Company Profile

4.16.17

Sundberg; Linda K. - Los Gatos CA
Sundberg; Linda K. - Armonk NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers Grant 10,915,023 - Han , et al. February 9, 2	2021-02-09
Multifunctional Polymers App 20200278607 - Bozano; Luisa D. ; et al.	2020-09-03
Negative-tone resist compositions and multifunctional polymers therein Grant 10,345,700 - Bozano , et al. July 9, 2	2019-07-09
Nitrogen Heterocycle-containing Monolayers On Metal Oxides For Binding Biopolymers App 20190137879 - Han; Shu-Jen ; et al.	2019-05-09
Porous tin oxide films Grant 10,236,184 - Bowers , et al.	2019-03-19
Adhesive resins for wafer bonding Grant 10,174,229 - Allen , et al. J	2019-01-08
Porous Tin Oxide Films App 20180330955 - Bowers; Amy N. ; et al.	2018-11-15
Porous tin oxide films Grant 10,020,199 - Bowers , et al. July 10, 2	2018-07-10
Adhesive Resins For Wafer Bonding App 20180072926 - ALLEN; ROBERT D. ; et al.	2018-03-15
Adhesive resins for wafer bonding Grant 9,850,406 - Allen , et al. December 26, 2	2017-12-26
Resist performance for the negative tone develop organic development process Grant 9,389,516 - Bozano , et al. July 12, 2	2016-07-12
Adhesive Resins For Wafer Bonding App 20160133499 - ALLEN; ROBERT D. ; et al.	2016-05-12
Negative-tone Resist Compositions And Multifunctional Polymers Therein App 20160070169 - Bozano; Luisa D. ; et al.	2016-03-10
Resist Performance For The Negative Tone Develop Organic Development Process App 20150309415 - BOZANO; LUISA D. ; et al.	2015-10-29
Resist performance for the negative tone develop organic development process Grant 9,057,960 - Bozano , et al. June 16, 2	2015-06-16
Positive tone organic solvent developed chemically amplified resist Grant 8,900,802 - Allen , et al. December 2, 2	2014-12-02
Positive Tone Organic Solvent Developed Chemically Amplified Resist App 20140242526 - Allen; Robert D. ; et al.	2014-08-28
Resist Performance for the Negative Tone Develop Organic Development Process App 20140220495 - Bozano; Luisa D. ; et al.	2014-08-07
Organic Solvent Developable Photoresist Composition App 20130344441 - SOORIYAKUMARAN; RATNAM ; et al.	2013-12-26
Fluoroalcohol containing molecular photoresist materials and processes of use Grant 8,530,136 - Bozano , et al. September 10, 2	2013-09-10
Graded topcoat materials for immersion lithography Grant 8,440,387 - Allen , et al. May 14, 2	2013-05-14
Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use App 20120156611 - Bozano; Luisa D. ; et al.	2012-06-21
Calixarene blended molecular glass photoresists and processes of use Grant 7,993,812 - Bozano , et al. August 9, 2	2011-08-09
Self-topcoating photoresist for photolithography Grant 7,951,524 - Allen , et al. May 31, 2	2011-05-31
Calixarene Blended Molecular Glass Photoresists and Processes of Use App 20110020756 - Bozano; Luisa D. ; et al.	2011-01-27
Graded Topcoat Materials For Immersion Lithography App 20100168337 - Allen; Robert D. ; et al.	2010-07-01
Graded topcoat materials for immersion lithography Grant 7,678,537 - Allen , et al. March 16, 2	2010-03-16
Graded Topcoat Materials For Immersion Lithography App 20080311506 - Allen; Robert D. ; et al.	2008-12-18
Graded Topcoat Materials For Immersion Lithography App 20080311530 - Allen; Robert D. ; et al.	2008-12-18
Self-topcoating Photoresist For Photolithography App 20080193879 - Allen; Robert ; et al.	2008-08-14

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