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Patent applications and USPTO patent grants for Sundberg; Linda K..The latest application filed is for "multifunctional polymers".
Patent | Date |
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Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers Grant 10,915,023 - Han , et al. February 9, 2 | 2021-02-09 |
Multifunctional Polymers App 20200278607 - Bozano; Luisa D. ;   et al. | 2020-09-03 |
Negative-tone resist compositions and multifunctional polymers therein Grant 10,345,700 - Bozano , et al. July 9, 2 | 2019-07-09 |
Nitrogen Heterocycle-containing Monolayers On Metal Oxides For Binding Biopolymers App 20190137879 - Han; Shu-Jen ;   et al. | 2019-05-09 |
Porous tin oxide films Grant 10,236,184 - Bowers , et al. | 2019-03-19 |
Adhesive resins for wafer bonding Grant 10,174,229 - Allen , et al. J | 2019-01-08 |
Porous Tin Oxide Films App 20180330955 - Bowers; Amy N. ;   et al. | 2018-11-15 |
Porous tin oxide films Grant 10,020,199 - Bowers , et al. July 10, 2 | 2018-07-10 |
Adhesive Resins For Wafer Bonding App 20180072926 - ALLEN; ROBERT D. ;   et al. | 2018-03-15 |
Adhesive resins for wafer bonding Grant 9,850,406 - Allen , et al. December 26, 2 | 2017-12-26 |
Resist performance for the negative tone develop organic development process Grant 9,389,516 - Bozano , et al. July 12, 2 | 2016-07-12 |
Adhesive Resins For Wafer Bonding App 20160133499 - ALLEN; ROBERT D. ;   et al. | 2016-05-12 |
Negative-tone Resist Compositions And Multifunctional Polymers Therein App 20160070169 - Bozano; Luisa D. ;   et al. | 2016-03-10 |
Resist Performance For The Negative Tone Develop Organic Development Process App 20150309415 - BOZANO; LUISA D. ;   et al. | 2015-10-29 |
Resist performance for the negative tone develop organic development process Grant 9,057,960 - Bozano , et al. June 16, 2 | 2015-06-16 |
Positive tone organic solvent developed chemically amplified resist Grant 8,900,802 - Allen , et al. December 2, 2 | 2014-12-02 |
Positive Tone Organic Solvent Developed Chemically Amplified Resist App 20140242526 - Allen; Robert D. ;   et al. | 2014-08-28 |
Resist Performance for the Negative Tone Develop Organic Development Process App 20140220495 - Bozano; Luisa D. ;   et al. | 2014-08-07 |
Organic Solvent Developable Photoresist Composition App 20130344441 - SOORIYAKUMARAN; RATNAM ;   et al. | 2013-12-26 |
Fluoroalcohol containing molecular photoresist materials and processes of use Grant 8,530,136 - Bozano , et al. September 10, 2 | 2013-09-10 |
Graded topcoat materials for immersion lithography Grant 8,440,387 - Allen , et al. May 14, 2 | 2013-05-14 |
Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use App 20120156611 - Bozano; Luisa D. ;   et al. | 2012-06-21 |
Calixarene blended molecular glass photoresists and processes of use Grant 7,993,812 - Bozano , et al. August 9, 2 | 2011-08-09 |
Self-topcoating photoresist for photolithography Grant 7,951,524 - Allen , et al. May 31, 2 | 2011-05-31 |
Calixarene Blended Molecular Glass Photoresists and Processes of Use App 20110020756 - Bozano; Luisa D. ;   et al. | 2011-01-27 |
Graded Topcoat Materials For Immersion Lithography App 20100168337 - Allen; Robert D. ;   et al. | 2010-07-01 |
Graded topcoat materials for immersion lithography Grant 7,678,537 - Allen , et al. March 16, 2 | 2010-03-16 |
Graded Topcoat Materials For Immersion Lithography App 20080311506 - Allen; Robert D. ;   et al. | 2008-12-18 |
Graded Topcoat Materials For Immersion Lithography App 20080311530 - Allen; Robert D. ;   et al. | 2008-12-18 |
Self-topcoating Photoresist For Photolithography App 20080193879 - Allen; Robert ;   et al. | 2008-08-14 |
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