Sunaoshi; Hitoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sunaoshi; Hitoshi.The latest application filed is for "writing apparatus and writing method".

Company Profile

0.13.10

Sunaoshi; Hitoshi - Kanagawa N/A JP
Sunaoshi; Hitoshi - Numazu N/A JP
Sunaoshi; Hitoshi - Numazu-shi JP
Sunaoshi; Hitoshi - Kanagawa-ken JP
Sunaoshi, Hitoshi - Kanagawa-shi JP
Sunaoshi; Hitoshi - Yokohama JP
Sunaoshi, Hitoshi - Minato-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lithography apparatus and lithography method Grant 8,653,487 - Sunaoshi February 18, 2	2014-02-18
Mask blank and method of manufacturing mask Grant 8,367,276 - Okubo , et al. February 5, 2	2013-02-05
Focusing method of charged particle beam and astigmatism adjusting method of charged particle Grant 8,188,443 - Ohtoshi , et al. May 29, 2	2012-05-29
Writing apparatus and writing method Grant 7,977,654 - Sunaoshi July 12, 2	2011-07-12
Charged particle beam writing method Grant 7,923,704 - Sunaoshi April 12, 2	2011-04-12
Method of calculating deflection aberration correcting voltage and charged particle beam writing method Grant 7,679,068 - Kamikubo , et al. March 16, 2	2010-03-16
Charged-particle beam lithography with grid matching for correction of beam shot position deviation Grant 7,652,271 - Wake , et al. January 26, 2	2010-01-26
Writing Apparatus And Writing Method App 20090258317 - SUNAOSHI; Hitoshi	2009-10-15
Lithography Apparatus And Lithography Method App 20090168044 - SUNAOSHI; Hitoshi	2009-07-02
Mask Blank And Method Of Manufacturing Mask App 20090075185 - OKUBO; Yasushi ; et al.	2009-03-19
Electron beam writing apparatus and writing method Grant 7,485,879 - Sunaoshi , et al. February 3, 2	2009-02-03
Charged Particle Beam Writing Method App 20090001293 - SUNAOSHI; Hitoshi	2009-01-01
Focusing Method Of Charged Particle Beam And Astigmatism Adjusting Method Of Charged Particle App 20080217553 - Ohtoshi; Kenji ; et al.	2008-09-11
Charged-particle Beam Lithography With Grid Matching For Correction Of Beam Shot Position Deviation App 20080067441 - WAKE; Seiji ; et al.	2008-03-20
Method Of Calculating Deflection Aberration Correcting Voltage And Charged Particle Beam Writing Method App 20070158576 - Kamikubo; Takashi ; et al.	2007-07-12
Electron beam writing apparatus and writing method App 20070023703 - Sunaoshi; Hitoshi ; et al.	2007-02-01
Optical system adjusting method for energy beam apparatus Grant 6,836,319 - Ogasawara , et al. December 28, 2	2004-12-28
Optical system adjusting method for energy beam apparatus App 20040190006 - Ogasawara, Munehiro ; et al.	2004-09-30
Charged particle beam system and chamber of charged particle beam system Grant 6,617,592 - Takamatsu , et al. September 9, 2	2003-09-09
Optical system adjusting method for energy beam apparatus Grant 6,606,149 - Ogasawara , et al. August 12, 2	2003-08-12
Charged particle beam system and chamber of charged particle beam system App 20010025931 - Takamatsu, Jun ; et al.	2001-10-04

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