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Method for forming tungsten film at a surface of a processing target material, film-forming apparatus, storage medium and semiconductor device with a tungsten film Grant 8,168,539 - Sugiura , et al. May 1, 2 | 2012-05-01 |
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Processing apparatus and processing method Grant 6,467,491 - Sugiura , et al. October 22, 2 | 2002-10-22 |
Single-substrate-processing CVD method of forming film containing metal element Grant 6,428,850 - Shinriki , et al. August 6, 2 | 2002-08-06 |
Single-substrate-heat-processing apparatus and method for performing reformation and crystallization App 20010018267 - Shinriki, Hiroshi ;   et al. | 2001-08-30 |
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Film forming apparatus and method, and film modifying apparatus and method Grant 6,143,081 - Shinriki , et al. November 7, 2 | 2000-11-07 |
Single-substrate-processing CVD apparatus and method Grant 6,126,753 - Shinriki , et al. October 3, 2 | 2000-10-03 |
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