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Patent applications and USPTO patent grants for Suganuma; Wakako.The latest application filed is for "methods for determining focus and astigmatism in charged-particle-beam microlithography".
Patent | Date |
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Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons Grant 6,972,417 - Suganuma , et al. December 6, 2 | 2005-12-06 |
Methods for determining focus and astigmatism in charged-particle-beam microlithography App 20030043358 - Suganuma, Wakako ;   et al. | 2003-03-06 |
Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons App 20020012853 - Suganuma, Wakako ;   et al. | 2002-01-31 |
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