Suga; Osamu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Suga; Osamu.The latest application filed is for "method of inspecting mask, mask inspection device, and method of manufacturing mask".

Company Profile

0.11.9

Suga; Osamu - Kanagawa JP
Suga; Osamu - Tokyo N/A JP
Suga; Osamu - Kokubunji JP
Suga; Osamu - Kokubunji-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of inspecting mask, mask inspection device, and method of manufacturing mask Grant 9,229,314 - Terasawa , et al. January 5, 2	2016-01-05
Method Of Inspecting Mask, Mask Inspection Device, And Method Of Manufacturing Mask App 20150253658 - TERASAWA; Tsuneo ; et al.	2015-09-10
Method of inspecting mask, mask inspection device, and method of manufacturing mask Grant 9,063,098 - Terasawa , et al. June 23, 2	2015-06-23
Method of inspecting mask pattern and mask pattern inspection apparatus Grant 8,488,866 - Terasawa , et al. July 16, 2	2013-07-16
Method Of Inspecting Mask, Mask Inspection Device, And Method Of Manufacturing Mask App 20130017475 - TERASAWA; Tsuneo ; et al.	2013-01-17
Reflection-type exposure mask and method of manufacturing a semiconductor device Grant 8,173,332 - Kamo , et al. May 8, 2	2012-05-08
Reflective-type mask Grant 7,960,076 - Kamo , et al. June 14, 2	2011-06-14
Reflective Exposure Mask, Method Of Manufacturing Reflective Exposure Mask, And Method Of Manufacturing Semiconductor Device App 20110117479 - SUGA; Osamu ; et al.	2011-05-19
Reflection-type Exposure Mask And Method Of Manufacturing A Semiconductor Device App 20110020737 - Kamo; Takashi ; et al.	2011-01-27
Method for designing a semiconductor integrated circuit layout capable of reducing the processing time for optical proximity effect correction Grant 7,844,934 - Ono , et al. November 30, 2	2010-11-30
Method Of Inspecting Mask Pattern And Mask Pattern Inspection Apparatus App 20100208978 - TERASAWA; Tsuneo ; et al.	2010-08-19
Reflective-type Mask App 20090148781 - KAMO; Takashi ; et al.	2009-06-11
Method for designing semiconductor integrated circuit layout App 20070124714 - Ono; Yusaku ; et al.	2007-05-31
Method for designing mask pattern and method for manufacturing semiconductor device App 20070074146 - Tanaka; Toshihiko ; et al.	2007-03-29
3-D structure design system, a method for designing 3-D structure and a recording medium readable by a computer having a program allowing the computer to execute the method recorded therein Grant 6,873,942 - Suga March 29, 2	2005-03-29
Electron beam lithography system and method Grant 5,424,173 - Wakabayashi , et al. June 13, 1	1995-06-13
Electron beam lithography system and method Grant 5,097,138 - Wakabayashi , et al. March 17, 1	1992-03-17

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