Subramonium; Pramod

Patent Applications and Registrations

Patent applications and USPTO patent grants for Subramonium; Pramod.The latest application filed is for "high selectivity, low stress, and low hydrogen diamond-like carbon hardmasks by high power pulsed low frequency rf".

Company Profile

5.39.31

Subramonium; Pramod - Beaverton OR
Subramonium; Pramod - Tualatin OR
Subramonium; Pramod - Portland OR
Subramonium; Pramod - Tigard OR US
Subramonium; Pramod - Salem OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High Selectivity, Low Stress, And Low Hydrogen Diamond-like Carbon Hardmasks By High Power Pulsed Low Frequency Rf App 20220216037 - Weimer; Matthew Scott ; et al.	2022-07-07
Nitride Films With Improved Etch Selectivity For 3d Nand Integration App 20210320004 - Subramonium; Pramod ; et al.	2021-10-14
Systems and methods for tilting a wafer for achieving deposition uniformity Grant 10,541,117 - Swaminathan , et al. Ja	2020-01-21
Pecvd Apparatus For In-situ Deposition Of Film Stacks App 20190376186 - Haverkamp; Jason Dirk ; et al.	2019-12-12
Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition Grant 10,475,627 - Qi , et al. Nov	2019-11-12
PECVD apparatus for in-situ deposition of film stacks Grant 10,214,816 - Haverkamp , et al. Feb	2019-02-26
Plasma activated conformal dielectric film deposition Grant 10,043,655 - Swaminathan , et al. August 7, 2	2018-08-07
Carrier Ring Wall For Reduction Of Back-diffusion Of Reactive Species And Suppression Of Local Parasitic Plasma Ignition App 20170278681 - Qi; Chengzhu ; et al.	2017-09-28
Plasma Activated Conformal Dielectric Film Deposition App 20170148628 - Swaminathan; Shankar ; et al.	2017-05-25
Systems And Methods For Tilting A Wafer For Achieving Deposition Uniformity App 20170121819 - Swaminathan; Shankar ; et al.	2017-05-04
Methods for formation of low-k aluminum-containing etch stop films Grant 9,633,896 - Damjanovic , et al. April 25, 2	2017-04-25
Methods For Formation Of Low-k Aluminum-containing Etch Stop Films App 20170103914 - Damjanovic; Daniel ; et al.	2017-04-13
High selectivity and low stress carbon hardmask by pulsed low frequency RF power Grant 9,589,799 - Reddy , et al. March 7, 2	2017-03-07
Plasma activated conformal dielectric film deposition Grant 9,570,274 - Swaminathan , et al. February 14, 2	2017-02-14
Method and apparatus for purging and plasma suppression in a process chamber Grant 9,399,228 - Breiling , et al. July 26, 2	2016-07-26
Methods of depositing smooth and conformal ashable hard mask films Grant 9,240,320 - Subramonium , et al. January 19, 2	2016-01-19
Cleaning Of Carbon-based Contaminants In Metal Interconnects For Interconnect Capping Applications App 20150380296 - Antonelli; George Andrew ; et al.	2015-12-31
Methods and apparatus for selective deposition of cobalt in semiconductor processing Grant 9,153,482 - Knisley , et al. October 6, 2	2015-10-06
Methods And Apparatus For Selective Deposition Of Cobalt In Semiconductor Processing App 20150221542 - Knisley; Thomas Joseph ; et al.	2015-08-06
Plasma Activated Conformal Dielectric Film Deposition App 20150206719 - Swaminathan; Shankar ; et al.	2015-07-23
In-situ deposition of film stacks Grant 9,028,924 - Haverkamp , et al. May 12, 2	2015-05-12
Plasma activated conformal dielectric film deposition Grant 8,999,859 - Swaminathan , et al. April 7, 2	2015-04-07
High Selectivity And Low Stress Carbon Hardmask By Pulsed Low Frequency Rf Power App 20150093908 - Reddy; Sirish K. ; et al.	2015-04-02
Methods and apparatus for plasma-based deposition Grant 8,962,101 - Subramonium , et al. February 24, 2	2015-02-24
Conformal doping via plasma activated atomic layer deposition and conformal film deposition Grant 8,956,983 - Swaminathan , et al. February 17, 2	2015-02-17
In-situ Deposition Of Film Stacks App 20150013607 - Haverkamp; Jason Dirk ; et al.	2015-01-15
Method And Apparatus For Purging And Plasma Suppression In A Process Chamber App 20140217193 - Breiling; Patrick ; et al.	2014-08-07
Plasma Activated Conformal Dielectric Film Deposition App 20140216337 - Swaminathan; Shankar ; et al.	2014-08-07
Metal And Silicon Containing Capping Layers For Interconnects App 20140216336 - Yu; Jengyi ; et al.	2014-08-07
Metal and silicon containing capping layers for interconnects Grant 8,753,978 - Yu , et al. June 17, 2	2014-06-17
In-situ deposition of film stacks Grant 8,741,394 - Haverkamp , et al. June 3, 2	2014-06-03
Diffusion barrier and etch stop films Grant 8,669,181 - Yu , et al. March 11, 2	2014-03-11
Plasma Clean Method For Deposition Chamber App 20140053867 - Fang; Zhiyuan ; et al.	2014-02-27
Methods And Apparatus For Plasma-based Deposition App 20140057454 - Subramonium; Pramod ; et al.	2014-02-27
Plasma activated conformal dielectric film deposition Grant 8,637,411 - Swaminathan , et al. January 28, 2	2014-01-28
Selective Capping of Metal Interconnect Lines during Air Gap Formation App 20130323930 - Chattopadhyay; Kaushik ; et al.	2013-12-05
Plasma clean method for deposition chamber Grant 8,591,659 - Fang , et al. November 26, 2	2013-11-26
Apparatus including a plasma chamber and controller including instructions for forming a boron nitride layer Grant 8,479,683 - Antonelli , et al. July 9, 2	2013-07-09
In-situ Deposition Of Film Stacks App 20130171834 - Haverkamp; Jason ; et al.	2013-07-04
Metal And Silicon Containing Capping Layers For Interconnects App 20130143401 - Yu; Jengyi ; et al.	2013-06-06
Methods of depositing smooth and conformal ashable hard mask films Grant 8,435,608 - Subramonium , et al. May 7, 2	2013-05-07
Conformal Doping Via Plasma Activated Atomic Layer Deposition And Conformal Film Deposition App 20130040447 - Swaminathan; Shankar ; et al.	2013-02-14
High compressive stress carbon liners for MOS devices Grant 8,362,571 - Wu , et al. January 29, 2	2013-01-29
Depositing Conformal Boron Nitride Films App 20130008378 - Antonelli; George Andrew ; et al.	2013-01-10
Depositing conformal boron nitride film by CVD without plasma Grant 8,288,292 - Antonelli , et al. October 16, 2	2012-10-16
Increasing Etch Selectivity Of Carbon Films With Lower Absorption Co-efficient And Stress App 20120258261 - Reddy; Sirish ; et al.	2012-10-11
Interfacial capping layers for interconnects Grant 8,268,722 - Yu , et al. September 18, 2	2012-09-18
Pulsed PECVD method for modulating hydrogen content in hard mask Grant 8,110,493 - Subramonium , et al. February 7, 2	2012-02-07
Plasma Activated Conformal Dielectric Film Deposition App 20120028454 - Swaminathan; Shankar ; et al.	2012-02-02
Depositing Conformal Boron Nitride Films App 20110244694 - Antonelli; George Andrew ; et al.	2011-10-06
In-Situ Deposition of Film Stacks App 20110236594 - Haverkamp; Jason ; et al.	2011-09-29
Methods of depositing stable and hermetic ashable hardmask films Grant 7,981,777 - Subramonium , et al. July 19, 2	2011-07-19
Methods of depositing highly selective transparent ashable hardmask films Grant 7,981,810 - Subramonium , et al. July 19, 2	2011-07-19
Diffusion barrier and etch stop films Grant 7,915,166 - Yu , et al. March 29, 2	2011-03-29
High compressive stress carbon liners for MOS devices Grant 7,906,817 - Wu , et al. March 15, 2	2011-03-15
Interfacial Capping Layers For Interconnects App 20100308463 - Yu; Jengyi ; et al.	2010-12-09
Pulsed PECVD method for modulating hydrogen content in hard mask Grant 7,381,644 - Subramonium , et al. June 3, 2	2008-06-03