Subawalla; Hoshang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Subawalla; Hoshang.The latest application filed is for "processing of semiconductor components with dense processing fluids".

Company Profile

0.5.11

Subawalla; Hoshang - Spring TX
Subawalla; Hoshang - Macungie PA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for removing carbon-containing residues from a substrate Grant 7,581,549 - Johnson , et al. September 1, 2	2009-09-01
Processing of semiconductor components with dense processing fluids App 20080004194 - McDermott; Wayne Thomas ; et al.	2008-01-03
Processing of semiconductor components with dense processing fluids App 20080000505 - MCDERMOTT; WAYNE THOMAS ; et al.	2008-01-03
Processing of semiconductor components with dense processing fluids and ultrasonic energy Grant 7,267,727 - McDermott , et al. September 11, 2	2007-09-11
Method for removal of flux and other residue in dense fluid systems App 20070137675 - McDermott; Wayne Thomas ; et al.	2007-06-21
Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols Grant 7,211,553 - Subawalla , et al. May 1, 2	2007-05-01
Method for removal of flux and other residue in dense fluid systems Grant 7,195,676 - McDermott , et al. March 27, 2	2007-03-27
Process for the purification of NF.sub.3 Grant 7,074,378 - Hart , et al. July 11, 2	2006-07-11
Dense fluid compositions and processes using same for article treatment and residue removal App 20060081273 - McDermott; Wayne Thomas ; et al.	2006-04-20
Method for removing carbon-containing residues from a substrate App 20060027249 - Johnson; Andrew David ; et al.	2006-02-09
Method for removal of flux and other residue in dense fluid systems App 20060011217 - McDermott; Wayne Thomas ; et al.	2006-01-19
Process for the purification of NF3 App 20050163695 - Hart, James Joseph ; et al.	2005-07-28
Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols App 20050029492 - Subawalla, Hoshang ; et al.	2005-02-10
Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols App 20050029490 - Subawalla, Hoshang ; et al.	2005-02-10
Processing of semiconductor components with dense processing fluids and ultrasonic energy App 20040144399 - McDermott, Wayne Thomas ; et al.	2004-07-29
Processing of semiconductor components with dense processing fluids and ultrasonic energy App 20040055621 - McDermott, Wayne Thomas ; et al.	2004-03-25

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