Su; Yih-Chen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Su; Yih-Chen.The latest application filed is for "method for extreme ultraviolet lithography mask treatment".

Company Profile

4.6.11

Su; Yih-Chen - Taichung City TW
Su; Yih-Chen - Taichung TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for Extreme Ultraviolet Lithography Mask Treatment App 20210311383 - Hsu; Pei-Cheng ; et al.	2021-10-07
Lithography Mask with a Black Border Regions and Method of Fabricating the Same App 20210294203 - Lin; Chin-Hsiang ; et al.	2021-09-23
Method for extreme ultraviolet lithography mask treatment Grant 11,048,158 - Hsu , et al. June 29, 2	2021-06-29
Lithography mask with a black border regions and method of fabricating the same Grant 11,029,593 - Lin , et al. June 8, 2	2021-06-08
Lithography mask with a black border region and method of fabricating the same Grant 10,866,504 - Lin , et al. December 15, 2	2020-12-15
Lithography Mask with a Black Border Regions and Method of Fabricating the Same App 20200050098 - Lin; Chin-Hsiang ; et al.	2020-02-13
Method for Extreme Ultraviolet Lithography Mask Treatment App 20190324364 - Hsu; Pei-Cheng ; et al.	2019-10-24
Lithography Mask With A Black Border Region And Method Of Fabricating The Same App 20190196322 - Lin; Chin-Hsiang ; et al.	2019-06-27
Method of making a lithography mask Grant 8,916,482 - Lee , et al. December 23, 2	2014-12-23
Method Of Making A Lithography Mask App 20130260573 - Lee; Hsin-Chang ; et al.	2013-10-03
Novel Treatment For Mask Surface Chemical Reduction App 20090258159 - Su; Yih-Chen ; et al.	2009-10-15
Photomask cleaning using vacuum ultraviolet (VUV) light cleaning App 20070012336 - Su; Yih-Chen ; et al.	2007-01-18
Photomask cleaning using vacuum ultraviolet (VUV) light cleaning App 20070012335 - Chang; Hsiao Chih ; et al.	2007-01-18
Method to reduce photoresist mask line dimensions Grant 6,962,878 - Su , et al. November 8, 2	2005-11-08
Method to reduce photoresist mask line dimensions App 20040209480 - Su, Yih-Chen ; et al.	2004-10-21

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