Su; Wei-Yu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Su; Wei-Yu.The latest application filed is for "mask haze early detection".
- Su; Wei-Yu - Banciao TW
- Su; Wei-Yu - Miao-Li TW
- Su; Wei-Yu - Taipei TW
- Su; Wei-Yu - Banciao City TW
| Patent | Date |
|---|---|
| System and method for photolithography in semiconductor manufacturing Grant 7,968,258 - Su , et al. June 28, 2 | 2011-06-28 |
| Active matrix liquid crystal display and driving method thereof Grant 7,834,837 - Syu , et al. November 16, 2 | 2010-11-16 |
| Mask haze early detection Grant 7,796,249 - Wang , et al. September 14, 2 | 2010-09-14 |
| Reticle with antistatic coating Grant 7,514,184 - Su , et al. April 7, 2 | 2009-04-07 |
| Mask Haze Early Detection App 20090063074 - Wang; Wen-Chuan ; et al. | 2009-03-05 |
| Method For Reduction Of Photomask Defects App 20070248895 - Su; Wei-Yu | 2007-10-25 |
| Active matrix liquid crystal display and driving method thereof App 20070146276 - Syu; Yi-Zhong ; et al. | 2007-06-28 |
| Fully electric field shielding reticle pod App 20070076292 - Su; Wei-Yu ; et al. | 2007-04-05 |
| System and method for photolithography in semiconductor manufacturing App 20060257765 - Su; Wei-Yu ; et al. | 2006-11-16 |
| Reticle with antistatic coating Grant 7,029,800 - Su , et al. April 18, 2 | 2006-04-18 |
| Reticle pod and reticle with cut areas Grant 6,948,619 - Su , et al. September 27, 2 | 2005-09-27 |
| Reticle with antistatic coating App 20050186488 - Su, Wei-Yu ; et al. | 2005-08-25 |
| Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks Grant 6,869,733 - Su March 22, 2 | 2005-03-22 |
| Reticle with antistatic coating App 20040076834 - Su, Wei-Yu ; et al. | 2004-04-22 |
| Reticle pod App 20040005209 - Su, Wei-Yu ; et al. | 2004-01-08 |
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