loadpatents
name:-0.0060868263244629
name:-0.011271953582764
name:-0.00037789344787598
STRIPPE; David C. Patent Filings

STRIPPE; David C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for STRIPPE; David C..The latest application filed is for "methods of manufacturing semiconductor devices and a semiconductor structure".

Company Profile
0.9.6
  • STRIPPE; David C. - Westford VT
  • Strippe; David C. - Waterbury Center VT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods Of Manufacturing Semiconductor Devices And A Semiconductor Structure
App 20150130064 - ANDERSON; Felix P. ;   et al.
2015-05-14
Methods of manufacturing semiconductor devices and a semiconductor structure
Grant 8,969,195 - Anderson , et al. March 3, 2
2015-03-03
Sputtering target fixture
Grant 8,157,970 - Murphy , et al. April 17, 2
2012-04-17
Methods Of Manufacturing Semiconductor Devices And A Semiconductor Structure
App 20090212434 - Anderson; Felix P. ;   et al.
2009-08-27
Method Of System Maintenance Planning Based On Continual Robot Parameter Monitoring
App 20090078562 - Johnson; Gary J. ;   et al.
2009-03-26
Sputtering target fixture
Grant 7,485,210 - Murphy , et al. February 3, 2
2009-02-03
Sputtering Target Fixture
App 20080264783 - Murphy; William J. ;   et al.
2008-10-30
Sputtering Target Fixture
App 20060076230 - Murphy; William J. ;   et al.
2006-04-13
Sputtered tungsten diffusion barrier for improved interconnect robustness
Grant 6,838,364 - Brodsky , et al. January 4, 2
2005-01-04
Version with markings to show changes made
App 20010029096 - Brodsky, Stephen B. ;   et al.
2001-10-11
Sputtered tungsten diffusion barrier for improved interconnect robustness
Grant 6,245,668 - Brodsky , et al. June 12, 2
2001-06-12
High power capacity magnetron cathode
Grant 5,628,889 - Gardell , et al. May 13, 1
1997-05-13
Method of depositing conductors in high aspect ratio apertures under high temperature conditions
Grant 5,529,670 - Ryan , et al. June 25, 1
1996-06-25
Method of depositing conductors in high aspect ratio apertures using a collimator
Grant 5,401,675 - Lee , et al. March 28, 1
1995-03-28

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