Patent | Date |
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Dry Non-plasma Treatment System App 20150314313 - Kent; Martin ;   et al. | 2015-11-05 |
Method for chemical vapor deposition control Grant 9,139,910 - Lee , et al. September 22, 2 | 2015-09-22 |
Dry non-plasma treatment system and method of using Grant 9,115,429 - Kent , et al. August 25, 2 | 2015-08-25 |
Thermally zoned substrate holder assembly Grant 8,927,907 - Fink , et al. January 6, 2 | 2015-01-06 |
Dry Non-plasma Treatment System And Method Of Using App 20140360979 - Kent; Martin ;   et al. | 2014-12-11 |
Shower head gas injection apparatus with secondary high pressure pulsed gas injection Grant 8,877,000 - Strang November 4, 2 | 2014-11-04 |
Apparatus for chemical vapor deposition control Grant 8,852,347 - Lee , et al. October 7, 2 | 2014-10-07 |
Dry non-plasma treatment system and method of using Grant 8,828,185 - Kent , et al. September 9, 2 | 2014-09-09 |
Method and apparatus for atomic layer deposition Grant 8,562,743 - Strang October 22, 2 | 2013-10-22 |
System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool Grant 8,296,687 - Strang , et al. October 23, 2 | 2012-10-23 |
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system Grant 8,207,476 - Tsukamoto , et al. June 26, 2 | 2012-06-26 |
Method For Forming A Pattern And A Semiconductor Device Manufacturing Method App 20120083127 - Clark; Robert D. ;   et al. | 2012-04-05 |
Thermally Zoned Substrate Holder Assembly App 20120067866 - FINK; Steven T. ;   et al. | 2012-03-22 |
Thermally zoned substrate holder assembly Grant 8,092,602 - Fink , et al. January 10, 2 | 2012-01-10 |
Method for chemical vapor deposition control App 20110305831 - LEE; Eric M. ;   et al. | 2011-12-15 |
Apparatus for chemical vapor deposition control App 20110303145 - LEE; Eric M. ;   et al. | 2011-12-15 |
System and method for using first-principles simulation to control a semiconductor manufacturing process Grant 8,073,667 - Strang , et al. December 6, 2 | 2011-12-06 |
System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process Grant 8,050,900 - Mitrovic , et al. November 1, 2 | 2011-11-01 |
Method and system for controlling radical distribution Grant 8,038,834 - Funk , et al. October 18, 2 | 2011-10-18 |
System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model Grant 8,036,869 - Strang , et al. October 11, 2 | 2011-10-11 |
System and method for using first-principles simulation to facilitate a semiconductor manufacturing process Grant 8,032,348 - Mitrovic , et al. October 4, 2 | 2011-10-04 |
System and method for using first-principles simulation to characterize a semiconductor manufacturing process Grant 8,014,991 - Mitrovic , et al. September 6, 2 | 2011-09-06 |
Method And Apparatus For Atomic Layer Deposition App 20110203523 - STRANG; ERIC J. | 2011-08-25 |
Dry Non-plasma Treatment System And Method Of Using App 20100237046 - Kent; Martin ;   et al. | 2010-09-23 |
Method And System For Controlling Radical Distribution App 20100193471 - FUNK; Merritt ;   et al. | 2010-08-05 |
High rate atomic layer deposition apparatus and method of using Grant 7,740,704 - Strang June 22, 2 | 2010-06-22 |
Method and apparatus for wall film monitoring Grant 7,732,227 - Strang , et al. June 8, 2 | 2010-06-08 |
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system Grant 7,723,648 - Tsukamoto , et al. May 25, 2 | 2010-05-25 |
Method and system for controlling radical distribution Grant 7,718,030 - Funk , et al. May 18, 2 | 2010-05-18 |
Dry non-plasma treatment system and method of using Grant 7,718,032 - Kent , et al. May 18, 2 | 2010-05-18 |
Temperature Controlled Substrate Holder With Non-uniform Insulation Layer For A Substrate Processing System App 20100078424 - TSUKAMOTO; YUJI ;   et al. | 2010-04-01 |
Apparatus and method of gas injection sequencing Grant 7,666,479 - Strang February 23, 2 | 2010-02-23 |
Method and apparatus for an improved focus ring in a plasma processing system Grant 7,582,186 - Strang , et al. September 1, 2 | 2009-09-01 |
Method and apparatus for gas injection system with minimum particulate contamination Grant 7,563,328 - Strang July 21, 2 | 2009-07-21 |
Method and apparatus for electron density measurement Grant 7,544,269 - Strang June 9, 2 | 2009-06-09 |
Inductively coupled high-density plasma source Grant 7,482,757 - Quon , et al. January 27, 2 | 2009-01-27 |
Method and apparatus for improved baffle plate Grant 7,461,614 - Fink , et al. December 9, 2 | 2008-12-09 |
Method and apparatus for determining consumable lifetime Grant 7,384,876 - Strang June 10, 2 | 2008-06-10 |
Thermally Zoned Substrate Holder Assembly App 20080092818 - Fink; Steven T. ;   et al. | 2008-04-24 |
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system App 20080083723 - Tsukamoto; Yuji ;   et al. | 2008-04-10 |
Method and system for monitoring component consumption Grant 7,353,141 - Mitrovic , et al. April 1, 2 | 2008-04-01 |
Thermally zoned substrate holder assembly Grant 7,347,901 - Fink , et al. March 25, 2 | 2008-03-25 |
A Dry Non-plasma Treatment System And Method Of Using App 20070298972 - KENT; MARTIN ;   et al. | 2007-12-27 |
Apparatus for active temperature control of susceptors Grant 7,311,782 - Strang , et al. December 25, 2 | 2007-12-25 |
Apparatus And Method Of Gas Injection Sequencing App 20070204907 - Strang; Eric J. | 2007-09-06 |
Method and apparatus for electron density measurement and verifying process status Grant 7,263,447 - Strang August 28, 2 | 2007-08-28 |
Method and apparatus for monitoring and verifying equipment status Grant 7,260,500 - Strang August 21, 2 | 2007-08-21 |
Method And System For Monitoring Component Consumption App 20070192059 - Mitrovic; Andrej S. ;   et al. | 2007-08-16 |
Method and system for monitoring component consumption Grant 7,233,878 - Mitrovic , et al. June 19, 2 | 2007-06-19 |
Directed gas injection apparatus for semiconductor processing Grant 7,217,336 - Strang May 15, 2 | 2007-05-15 |
Method and apparatus for wall film monitoring Grant 7,214,289 - Strang , et al. May 8, 2 | 2007-05-08 |
Apparatus and method for plasma processing Grant 7,199,328 - Strang April 3, 2 | 2007-04-03 |
Method and system for controlling radical distribution App 20070068625 - Funk; Merritt ;   et al. | 2007-03-29 |
Method and system for electron density measurement Grant 7,177,781 - Strang , et al. February 13, 2 | 2007-02-13 |
Method and apparatus for wall film monitoring App 20070020776 - Strang; Eric J. ;   et al. | 2007-01-25 |
Pulsed plasma processing method and apparatus Grant 7,166,233 - Johnson , et al. January 23, 2 | 2007-01-23 |
Method and apparatus for improved plasma processing uniformity Grant 7,164,236 - Mitrovic , et al. January 16, 2 | 2007-01-16 |
Method and apparatus for determining consumable lifetime Grant 7,108,751 - Strang September 19, 2 | 2006-09-19 |
Directed gas injection apparatus for semiconductor processing Grant 7,103,443 - Strang September 5, 2 | 2006-09-05 |
Method of and structure for controlling electrode temperature Grant 7,075,031 - Strang , et al. July 11, 2 | 2006-07-11 |
Method and system for flowing a supercritical fluid in a high pressure processing system App 20060130966 - Babic; Darko ;   et al. | 2006-06-22 |
Method and apparatus for atomic layer deposition App 20060093746 - Strang; Eric J. | 2006-05-04 |
Electrically controlled plasma uniformity in a high density plasma source Grant 7,019,253 - Johnson , et al. March 28, 2 | 2006-03-28 |
Plasma processing system and method App 20060060303 - Fink; Steven T. ;   et al. | 2006-03-23 |
Method and system for electron density measurement App 20060032287 - Strang; Eric J. ;   et al. | 2006-02-16 |
High rate atomic layer deposition apparatus and method of using App 20050284370 - Strang, Eric J. | 2005-12-29 |
Method and apparatus for tuning a plasma reactor chamber Grant 6,960,887 - Strang , et al. November 1, 2 | 2005-11-01 |
Method and apparatus for monitoring film deposition in a process chamber App 20050235917 - Fordemwalt, Jim N. ;   et al. | 2005-10-27 |
Apparatus and method for improving microwave coupling to a resonant cavity Grant 6,954,077 - Strang October 11, 2 | 2005-10-11 |
Method and system for performing atomic layer deposition App 20050221021 - Strang, Eric J. | 2005-10-06 |
Method and apparatus for active temperature control of susceptors Grant 6,949,722 - Strang , et al. September 27, 2 | 2005-09-27 |
Method and apparatus for active temperature control of susceptors App 20050178335 - Strang, Eric J. ;   et al. | 2005-08-18 |
Method and system for monitoring component consumption App 20050171730 - Mitrovic, Andrej S. ;   et al. | 2005-08-04 |
Method of adjusting the thickness of an electrode in a plasma processing system Grant 6,913,703 - Strang , et al. July 5, 2 | 2005-07-05 |
Monitoring erosion of system components by optical emission Grant 6,894,769 - Ludviksson , et al. May 17, 2 | 2005-05-17 |
Method and apparatus for improved electrode plate App 20050098106 - Fink, Steven T. ;   et al. | 2005-05-12 |
Method and apparatus for improved baffle plate App 20050098265 - Fink, Steven T. ;   et al. | 2005-05-12 |
Inductively coupled high-density plasma source App 20050099133 - Quon, Bill H. ;   et al. | 2005-05-12 |
Plasma processing apparatus for spatial control of dissociation and ionization Grant 6,887,341 - Strang , et al. May 3, 2 | 2005-05-03 |
System and method for using first-principles simulation to control a semiconductor manufacturing process App 20050071035 - Strang, Eric J. | 2005-03-31 |
System and method for using first-principles simulation to control a semiconductor manufacturing process App 20050071038 - Strang, Eric J. | 2005-03-31 |
System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool App 20050071037 - Strang, Eric J. | 2005-03-31 |
Method of and apparatus for tunable gas injection in a plasma processing system Grant 6,872,259 - Strang March 29, 2 | 2005-03-29 |
Apparatus and method for improving microwave coupling to a resonant cavity App 20050046427 - Strang, Eric J. | 2005-03-03 |
Method and apparatus for electron density measurement and verifying process status App 20050030003 - Strang, Eric J. | 2005-02-10 |
Method and apparatus for monitoring and verifying equipment status App 20040267547 - Strang, Eric J | 2004-12-30 |
Method and apparatus for wall film monitoring App 20040232920 - Strang, Eric J ;   et al. | 2004-11-25 |
Monitoring material buildup on system components by optical emission Grant 6,806,949 - Ludviksson , et al. October 19, 2 | 2004-10-19 |
Method and structure to segment RF coupling to silicon electrode Grant 6,806,653 - Strang , et al. October 19, 2 | 2004-10-19 |
Apparatus and method for plasma processing App 20040195216 - Strang, Eric J. | 2004-10-07 |
Method and apparatus for electron density measurement App 20040189325 - Strang, Eric J | 2004-09-30 |
Method and apparatus for improved plasma processing uniformity App 20040168770 - Mitrovic, Andrej S. ;   et al. | 2004-09-02 |
Directed gas injection apparatus for semiconductor processing App 20040163761 - Strang, Eric J | 2004-08-26 |
Directed gas injection apparatus for semiconductor processing App 20040166597 - Strang, Eric J. | 2004-08-26 |
Method and apparatus for an improved focus ring in a plasma processing system App 20040129226 - Strang, Eric J. ;   et al. | 2004-07-08 |
Method and apparatus for determining consumable lifetime App 20040129217 - Strang, Eric J. | 2004-07-08 |
Shower head gas injection apparatus with secondary high pressure pulsed gas injection App 20040123803 - Strang, Eric J. | 2004-07-01 |
Monitoring material buildup on system components by optical emission App 20040125359 - Ludviksson, Audunn ;   et al. | 2004-07-01 |
Monitoring erosion of system components by optical emission App 20040125360 - Ludviksson, Audunn ;   et al. | 2004-07-01 |
Thermally zoned substrate holder assembly App 20040115947 - Fink, Steven T. ;   et al. | 2004-06-17 |
Multi-zone resistance heater Grant 6,740,853 - Johnson , et al. May 25, 2 | 2004-05-25 |
Method and apparatus for gas injection system with minimum particulate contamination App 20040079484 - Strang, Eric J. | 2004-04-29 |
Method and apparatus for active temperature control of susceptors App 20040063312 - Strang, Eric J. ;   et al. | 2004-04-01 |
Method and apparatus for determination and control of plasma state Grant 6,713,969 - Sirkis , et al. March 30, 2 | 2004-03-30 |
Method of and structure for controlling electrode temperature App 20040011770 - Strang, Eric J. ;   et al. | 2004-01-22 |
Plasma processing apparatus and method of controlling chemistry Grant 6,674,241 - Strang , et al. January 6, 2 | 2004-01-06 |
Method and apparatus for tuning a plasma reactor chamber App 20030227258 - Strang, Eric J. ;   et al. | 2003-12-11 |
Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor Grant 6,642,661 - Strang November 4, 2 | 2003-11-04 |
Method and apparatus for determination and control of plasma state App 20030141822 - Sirkis, Murray ;   et al. | 2003-07-31 |
Method and structure to segment RF coupling to silicon electrode App 20030141795 - Strang, Eric J. ;   et al. | 2003-07-31 |
Method and apparatus for improved plasma processing uniformity App 20030137251 - Mitrovic, Andrej S. ;   et al. | 2003-07-24 |
Method of adjusting the thickness of an electrode in a plasma processing system App 20030121886 - Strang, Eric J. ;   et al. | 2003-07-03 |
Plasma processing apparatus for spatial control of dissociation and ionization App 20030094238 - Strang, Eric J. ;   et al. | 2003-05-22 |
Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor App 20030057847 - Strang, Eric J. | 2003-03-27 |
Method of and apparatus for tunable gas injection in a plasma processing system App 20030019580 - Strang, Eric J. | 2003-01-30 |
Plasma processing apparatus and method of controlling chemistry App 20030020411 - Strang, Eric J. ;   et al. | 2003-01-30 |
Electrically controlled plasma uniformity in a high density plasma source App 20030006019 - Johnson, Wayne L. ;   et al. | 2003-01-09 |
Apparatus and method of gas injection sequencing App 20030000924 - Strang, Eric J. | 2003-01-02 |
Pulsed plasma processing method and apparatus App 20020160125 - Johnson, Wayne L. ;   et al. | 2002-10-31 |