loadpatents
name:-0.08643102645874
name:-0.061169147491455
name:-0.00048208236694336
Strang; Eric J. Patent Filings

Strang; Eric J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Strang; Eric J..The latest application filed is for "dry non-plasma treatment system".

Company Profile
0.63.62
  • Strang; Eric J. - Driftwood TX
  • Strang; Eric J. - Gilbert AZ US
  • Strang; Eric J. - Chandler AZ
  • Strang; Eric J - Chandler AZ
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dry Non-plasma Treatment System
App 20150314313 - Kent; Martin ;   et al.
2015-11-05
Method for chemical vapor deposition control
Grant 9,139,910 - Lee , et al. September 22, 2
2015-09-22
Dry non-plasma treatment system and method of using
Grant 9,115,429 - Kent , et al. August 25, 2
2015-08-25
Thermally zoned substrate holder assembly
Grant 8,927,907 - Fink , et al. January 6, 2
2015-01-06
Dry Non-plasma Treatment System And Method Of Using
App 20140360979 - Kent; Martin ;   et al.
2014-12-11
Shower head gas injection apparatus with secondary high pressure pulsed gas injection
Grant 8,877,000 - Strang November 4, 2
2014-11-04
Apparatus for chemical vapor deposition control
Grant 8,852,347 - Lee , et al. October 7, 2
2014-10-07
Dry non-plasma treatment system and method of using
Grant 8,828,185 - Kent , et al. September 9, 2
2014-09-09
Method and apparatus for atomic layer deposition
Grant 8,562,743 - Strang October 22, 2
2013-10-22
System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool
Grant 8,296,687 - Strang , et al. October 23, 2
2012-10-23
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
Grant 8,207,476 - Tsukamoto , et al. June 26, 2
2012-06-26
Method For Forming A Pattern And A Semiconductor Device Manufacturing Method
App 20120083127 - Clark; Robert D. ;   et al.
2012-04-05
Thermally Zoned Substrate Holder Assembly
App 20120067866 - FINK; Steven T. ;   et al.
2012-03-22
Thermally zoned substrate holder assembly
Grant 8,092,602 - Fink , et al. January 10, 2
2012-01-10
Method for chemical vapor deposition control
App 20110305831 - LEE; Eric M. ;   et al.
2011-12-15
Apparatus for chemical vapor deposition control
App 20110303145 - LEE; Eric M. ;   et al.
2011-12-15
System and method for using first-principles simulation to control a semiconductor manufacturing process
Grant 8,073,667 - Strang , et al. December 6, 2
2011-12-06
System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process
Grant 8,050,900 - Mitrovic , et al. November 1, 2
2011-11-01
Method and system for controlling radical distribution
Grant 8,038,834 - Funk , et al. October 18, 2
2011-10-18
System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model
Grant 8,036,869 - Strang , et al. October 11, 2
2011-10-11
System and method for using first-principles simulation to facilitate a semiconductor manufacturing process
Grant 8,032,348 - Mitrovic , et al. October 4, 2
2011-10-04
System and method for using first-principles simulation to characterize a semiconductor manufacturing process
Grant 8,014,991 - Mitrovic , et al. September 6, 2
2011-09-06
Method And Apparatus For Atomic Layer Deposition
App 20110203523 - STRANG; ERIC J.
2011-08-25
Dry Non-plasma Treatment System And Method Of Using
App 20100237046 - Kent; Martin ;   et al.
2010-09-23
Method And System For Controlling Radical Distribution
App 20100193471 - FUNK; Merritt ;   et al.
2010-08-05
High rate atomic layer deposition apparatus and method of using
Grant 7,740,704 - Strang June 22, 2
2010-06-22
Method and apparatus for wall film monitoring
Grant 7,732,227 - Strang , et al. June 8, 2
2010-06-08
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
Grant 7,723,648 - Tsukamoto , et al. May 25, 2
2010-05-25
Method and system for controlling radical distribution
Grant 7,718,030 - Funk , et al. May 18, 2
2010-05-18
Dry non-plasma treatment system and method of using
Grant 7,718,032 - Kent , et al. May 18, 2
2010-05-18
Temperature Controlled Substrate Holder With Non-uniform Insulation Layer For A Substrate Processing System
App 20100078424 - TSUKAMOTO; YUJI ;   et al.
2010-04-01
Apparatus and method of gas injection sequencing
Grant 7,666,479 - Strang February 23, 2
2010-02-23
Method and apparatus for an improved focus ring in a plasma processing system
Grant 7,582,186 - Strang , et al. September 1, 2
2009-09-01
Method and apparatus for gas injection system with minimum particulate contamination
Grant 7,563,328 - Strang July 21, 2
2009-07-21
Method and apparatus for electron density measurement
Grant 7,544,269 - Strang June 9, 2
2009-06-09
Inductively coupled high-density plasma source
Grant 7,482,757 - Quon , et al. January 27, 2
2009-01-27
Method and apparatus for improved baffle plate
Grant 7,461,614 - Fink , et al. December 9, 2
2008-12-09
Method and apparatus for determining consumable lifetime
Grant 7,384,876 - Strang June 10, 2
2008-06-10
Thermally Zoned Substrate Holder Assembly
App 20080092818 - Fink; Steven T. ;   et al.
2008-04-24
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
App 20080083723 - Tsukamoto; Yuji ;   et al.
2008-04-10
Method and system for monitoring component consumption
Grant 7,353,141 - Mitrovic , et al. April 1, 2
2008-04-01
Thermally zoned substrate holder assembly
Grant 7,347,901 - Fink , et al. March 25, 2
2008-03-25
A Dry Non-plasma Treatment System And Method Of Using
App 20070298972 - KENT; MARTIN ;   et al.
2007-12-27
Apparatus for active temperature control of susceptors
Grant 7,311,782 - Strang , et al. December 25, 2
2007-12-25
Apparatus And Method Of Gas Injection Sequencing
App 20070204907 - Strang; Eric J.
2007-09-06
Method and apparatus for electron density measurement and verifying process status
Grant 7,263,447 - Strang August 28, 2
2007-08-28
Method and apparatus for monitoring and verifying equipment status
Grant 7,260,500 - Strang August 21, 2
2007-08-21
Method And System For Monitoring Component Consumption
App 20070192059 - Mitrovic; Andrej S. ;   et al.
2007-08-16
Method and system for monitoring component consumption
Grant 7,233,878 - Mitrovic , et al. June 19, 2
2007-06-19
Directed gas injection apparatus for semiconductor processing
Grant 7,217,336 - Strang May 15, 2
2007-05-15
Method and apparatus for wall film monitoring
Grant 7,214,289 - Strang , et al. May 8, 2
2007-05-08
Apparatus and method for plasma processing
Grant 7,199,328 - Strang April 3, 2
2007-04-03
Method and system for controlling radical distribution
App 20070068625 - Funk; Merritt ;   et al.
2007-03-29
Method and system for electron density measurement
Grant 7,177,781 - Strang , et al. February 13, 2
2007-02-13
Method and apparatus for wall film monitoring
App 20070020776 - Strang; Eric J. ;   et al.
2007-01-25
Pulsed plasma processing method and apparatus
Grant 7,166,233 - Johnson , et al. January 23, 2
2007-01-23
Method and apparatus for improved plasma processing uniformity
Grant 7,164,236 - Mitrovic , et al. January 16, 2
2007-01-16
Method and apparatus for determining consumable lifetime
Grant 7,108,751 - Strang September 19, 2
2006-09-19
Directed gas injection apparatus for semiconductor processing
Grant 7,103,443 - Strang September 5, 2
2006-09-05
Method of and structure for controlling electrode temperature
Grant 7,075,031 - Strang , et al. July 11, 2
2006-07-11
Method and system for flowing a supercritical fluid in a high pressure processing system
App 20060130966 - Babic; Darko ;   et al.
2006-06-22
Method and apparatus for atomic layer deposition
App 20060093746 - Strang; Eric J.
2006-05-04
Electrically controlled plasma uniformity in a high density plasma source
Grant 7,019,253 - Johnson , et al. March 28, 2
2006-03-28
Plasma processing system and method
App 20060060303 - Fink; Steven T. ;   et al.
2006-03-23
Method and system for electron density measurement
App 20060032287 - Strang; Eric J. ;   et al.
2006-02-16
High rate atomic layer deposition apparatus and method of using
App 20050284370 - Strang, Eric J.
2005-12-29
Method and apparatus for tuning a plasma reactor chamber
Grant 6,960,887 - Strang , et al. November 1, 2
2005-11-01
Method and apparatus for monitoring film deposition in a process chamber
App 20050235917 - Fordemwalt, Jim N. ;   et al.
2005-10-27
Apparatus and method for improving microwave coupling to a resonant cavity
Grant 6,954,077 - Strang October 11, 2
2005-10-11
Method and system for performing atomic layer deposition
App 20050221021 - Strang, Eric J.
2005-10-06
Method and apparatus for active temperature control of susceptors
Grant 6,949,722 - Strang , et al. September 27, 2
2005-09-27
Method and apparatus for active temperature control of susceptors
App 20050178335 - Strang, Eric J. ;   et al.
2005-08-18
Method and system for monitoring component consumption
App 20050171730 - Mitrovic, Andrej S. ;   et al.
2005-08-04
Method of adjusting the thickness of an electrode in a plasma processing system
Grant 6,913,703 - Strang , et al. July 5, 2
2005-07-05
Monitoring erosion of system components by optical emission
Grant 6,894,769 - Ludviksson , et al. May 17, 2
2005-05-17
Method and apparatus for improved electrode plate
App 20050098106 - Fink, Steven T. ;   et al.
2005-05-12
Method and apparatus for improved baffle plate
App 20050098265 - Fink, Steven T. ;   et al.
2005-05-12
Inductively coupled high-density plasma source
App 20050099133 - Quon, Bill H. ;   et al.
2005-05-12
Plasma processing apparatus for spatial control of dissociation and ionization
Grant 6,887,341 - Strang , et al. May 3, 2
2005-05-03
System and method for using first-principles simulation to control a semiconductor manufacturing process
App 20050071035 - Strang, Eric J.
2005-03-31
System and method for using first-principles simulation to control a semiconductor manufacturing process
App 20050071038 - Strang, Eric J.
2005-03-31
System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool
App 20050071037 - Strang, Eric J.
2005-03-31
Method of and apparatus for tunable gas injection in a plasma processing system
Grant 6,872,259 - Strang March 29, 2
2005-03-29
Apparatus and method for improving microwave coupling to a resonant cavity
App 20050046427 - Strang, Eric J.
2005-03-03
Method and apparatus for electron density measurement and verifying process status
App 20050030003 - Strang, Eric J.
2005-02-10
Method and apparatus for monitoring and verifying equipment status
App 20040267547 - Strang, Eric J
2004-12-30
Method and apparatus for wall film monitoring
App 20040232920 - Strang, Eric J ;   et al.
2004-11-25
Monitoring material buildup on system components by optical emission
Grant 6,806,949 - Ludviksson , et al. October 19, 2
2004-10-19
Method and structure to segment RF coupling to silicon electrode
Grant 6,806,653 - Strang , et al. October 19, 2
2004-10-19
Apparatus and method for plasma processing
App 20040195216 - Strang, Eric J.
2004-10-07
Method and apparatus for electron density measurement
App 20040189325 - Strang, Eric J
2004-09-30
Method and apparatus for improved plasma processing uniformity
App 20040168770 - Mitrovic, Andrej S. ;   et al.
2004-09-02
Directed gas injection apparatus for semiconductor processing
App 20040163761 - Strang, Eric J
2004-08-26
Directed gas injection apparatus for semiconductor processing
App 20040166597 - Strang, Eric J.
2004-08-26
Method and apparatus for an improved focus ring in a plasma processing system
App 20040129226 - Strang, Eric J. ;   et al.
2004-07-08
Method and apparatus for determining consumable lifetime
App 20040129217 - Strang, Eric J.
2004-07-08
Shower head gas injection apparatus with secondary high pressure pulsed gas injection
App 20040123803 - Strang, Eric J.
2004-07-01
Monitoring erosion of system components by optical emission
App 20040125360 - Ludviksson, Audunn ;   et al.
2004-07-01
Monitoring material buildup on system components by optical emission
App 20040125359 - Ludviksson, Audunn ;   et al.
2004-07-01
Thermally zoned substrate holder assembly
App 20040115947 - Fink, Steven T. ;   et al.
2004-06-17
Multi-zone resistance heater
Grant 6,740,853 - Johnson , et al. May 25, 2
2004-05-25
Method and apparatus for gas injection system with minimum particulate contamination
App 20040079484 - Strang, Eric J.
2004-04-29
Method and apparatus for active temperature control of susceptors
App 20040063312 - Strang, Eric J. ;   et al.
2004-04-01
Method and apparatus for determination and control of plasma state
Grant 6,713,969 - Sirkis , et al. March 30, 2
2004-03-30
Method of and structure for controlling electrode temperature
App 20040011770 - Strang, Eric J. ;   et al.
2004-01-22
Plasma processing apparatus and method of controlling chemistry
Grant 6,674,241 - Strang , et al. January 6, 2
2004-01-06
Method and apparatus for tuning a plasma reactor chamber
App 20030227258 - Strang, Eric J. ;   et al.
2003-12-11
Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor
Grant 6,642,661 - Strang November 4, 2
2003-11-04
Method and apparatus for determination and control of plasma state
App 20030141822 - Sirkis, Murray ;   et al.
2003-07-31
Method and structure to segment RF coupling to silicon electrode
App 20030141795 - Strang, Eric J. ;   et al.
2003-07-31
Method and apparatus for improved plasma processing uniformity
App 20030137251 - Mitrovic, Andrej S. ;   et al.
2003-07-24
Method of adjusting the thickness of an electrode in a plasma processing system
App 20030121886 - Strang, Eric J. ;   et al.
2003-07-03
Plasma processing apparatus for spatial control of dissociation and ionization
App 20030094238 - Strang, Eric J. ;   et al.
2003-05-22
Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor
App 20030057847 - Strang, Eric J.
2003-03-27
Method of and apparatus for tunable gas injection in a plasma processing system
App 20030019580 - Strang, Eric J.
2003-01-30
Plasma processing apparatus and method of controlling chemistry
App 20030020411 - Strang, Eric J. ;   et al.
2003-01-30
Electrically controlled plasma uniformity in a high density plasma source
App 20030006019 - Johnson, Wayne L. ;   et al.
2003-01-09
Apparatus and method of gas injection sequencing
App 20030000924 - Strang, Eric J.
2003-01-02
Pulsed plasma processing method and apparatus
App 20020160125 - Johnson, Wayne L. ;   et al.
2002-10-31

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