Stow; Clifford C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Stow; Clifford C..The latest application filed is for "point of use recycling system for cmp slurry".

Company Profile

0.8.12

Stow; Clifford C. - Boulder Creek CA
Stow; Clifford C. - Santa Clara CA
Stow; Clifford C - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Point Of Use Recycling System For Cmp Slurry App 20110070811 - Neuber; Andreas ; et al.	2011-03-24
Methods And Apparatus For Process Abatement With Recovery And Reuse Of Abatement Effluent App 20110023908 - NEUBER; ANDREAS ; et al.	2011-02-03
Method of coating semiconductor processing apparatus with protective yttrium-containing coatings App 20080213496 - Sun; Jennifer Y. ; et al.	2008-09-04
Semiconductor processing apparatus including plasma-resistant, welded aluminum structures Grant 7,055,732 - Thach , et al. June 6, 2	2006-06-06
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus Grant 7,048,814 - Lin , et al. May 23, 2	2006-05-23
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus Grant 7,033,447 - Lin , et al. April 25, 2	2006-04-25
Method of cleaning a coated process chamber component Grant 6,902,628 - Wang , et al. June 7, 2	2005-06-07
Reusable ceramic-comprising component which includes a scrificial surface layer Grant 6,899,798 - Weldon , et al. May 31, 2	2005-05-31
Electrochemically roughened aluminum semiconductor chamber surfaces App 20040224171 - Sun, Jennifer Y. ; et al.	2004-11-11
Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers Grant 6,776,873 - Sun , et al. August 17, 2	2004-08-17
Method of cleaning a coated process chamber component App 20040099285 - Wang, Hong ; et al.	2004-05-27
Clean aluminum alloy for semiconductor processing equipment Grant 6,713,188 - Wu , et al. March 30, 2	2004-03-30
Semiconductor processing apparatus including plasma-resistant, welded aluminum structures App 20040041004 - Thach, Senh ; et al.	2004-03-04
Plasma-resistant, welded aluminum structures for use in semiconductor apparatus Grant 6,659,331 - Thach , et al. December 9, 2	2003-12-09
Clean Aluminum Alloy For Semiconductor Processing Equipment App 20030224188 - Wu, Shun ; et al.	2003-12-04
Halogen-resistant, anodized aluminium for use in semiconductor processing apparatus App 20030205479 - Lin, Yixing ; et al.	2003-11-06
Plasma-resistant, welded aluminum structures for use in semiconductor apparatus App 20030160085 - Thach, Senh ; et al.	2003-08-28
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus App 20030150530 - Lin, Yixing ; et al.	2003-08-14
Methods of roughening a ceramic surface App 20030116276 - Weldon, Edwin Charles ; et al.	2003-06-26
Electrochemically roughened aluminum semiconductor processing apparatus surfaces App 20030047464 - Sun, Jennifer Y. ; et al.	2003-03-13

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