Stickel; Franz-Josef

Patent Applications and Registrations

Patent applications and USPTO patent grants for Stickel; Franz-Josef.The latest application filed is for "method for polishing a workpiece in the production of an optical element".

Company Profile

7.16.16

Stickel; Franz-Josef - Aalen-Unterrombach DE
Stickel; Franz-Josef - Aalen DE
Stickel; Franz-Josef - Oberkochen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for polishing a workpiece in the production of an optical element Grant 11,213,926 - Wolpert , et al. January 4, 2	2022-01-04
Method For Polishing A Workpiece In The Production Of An Optical Element App 20200376623 - WOLPERT; Andreas ; et al.	2020-12-03
Lithography apparatus and method Grant 10,831,114 - Liebaug , et al. November 10, 2	2020-11-10
Method For Machining A Workpiece In The Production Of An Optical Element App 20200198086 - Matena; Manfred ; et al.	2020-06-25
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,684,551 - Baer , et al.	2020-06-16
Lithography Apparatus And Method App 20190377273 - Liebaug; Bjorn ; et al.	2019-12-12
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20190310555 - Baer; Norman ; et al.	2019-10-10
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,317,802 - Baer , et al.	2019-06-11
Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus Grant 10,146,138 - Hild , et al. De	2018-12-04
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20180299784 - Baer; Norman ; et al.	2018-10-18
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,031,423 - Baer , et al. July 24, 2	2018-07-24
Surface correction of mirrors with decoupling coating Grant 9,921,483 - Dier , et al. March 20, 2	2018-03-20
Method For Producing An Optical Element For An Optical System, In Particular For A Microlithographic Projection Exposure Apparatus App 20170315452 - HILD; Kerstin ; et al.	2017-11-02
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20170315449 - Baer; Norman ; et al.	2017-11-02
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 9,746,778 - Baer , et al. August 29, 2	2017-08-29
Mirror for use in a microlithography projection exposure apparatus Grant 9,568,845 - Rocktaeschel , et al. February 14, 2	2017-02-14
Surface Correction Of Mirrors With Decoupling Coating App 20160209750 - DIER; Oliver ; et al.	2016-07-21
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20160195818 - Baer; Norman ; et al.	2016-07-07
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 9,316,929 - Baer , et al. April 19, 2	2016-04-19
Surface correction on coated mirrors Grant 9,249,501 - Ehm , et al. February 2, 2	2016-02-02
EUV Exposure Apparatus App 20130141707 - Baer; Norman ; et al.	2013-06-06
Surface Correction On Coated Mirrors App 20120300184 - EHM; Dirk Heinrich ; et al.	2012-11-29
Mirror For Use In A Microlithography Projection Exposure Apparatus App 20120229784 - ROCKTAESCHEL; Martin ; et al.	2012-09-13
Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate Grant 8,228,483 - Loering , et al. July 24, 2	2012-07-24
Projection Objective For Microlithography, Projection Exposure Apparatus, Projection Exposure Method And Optical Correction Plate App 20100195070 - Loering; Ulrich ; et al.	2010-08-05
Lithography lens system and projection exposure system provided with at least one lithography lens system of this type Grant 7,551,361 - Rostalski , et al. June 23, 2	2009-06-23
Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type App 20070258134 - Rostalski; Hans-Juergen ; et al.	2007-11-08
Imaging System For A Microlithographic Projection Exposure System App 20070024982 - Stickel; Franz Josef ; et al.	2007-02-01
Objective with at least one aspheric lens Grant 6,831,794 - Schuster , et al. December 14, 2	2004-12-14
Objective With At Least One Aspheric Lens App 20040212899 - Schuster, Karl-Heinz ; et al.	2004-10-28

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