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Patent applications and USPTO patent grants for Stern; Uri.The latest application filed is for "method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask".
Patent | Date |
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Optical system and method for correcting mask defects using the system Grant 11,249,294 - Seesselberg , et al. February 15, 2 | 2022-02-15 |
Method And Apparatus For Determining An Effect Of One Or More Pixels To Be Introduced Into A Substrate Of A Photolithographic Mask App 20210124259 - Welte; Joachim ;   et al. | 2021-04-29 |
Optical System And Method For Correcting Mask Defects Using The System App 20190170991 - Seesselberg; Markus ;   et al. | 2019-06-06 |
Method and apparatus for locally deforming an optical element for photolithography Grant 9,606,444 - Dmitriev , et al. March 28, 2 | 2017-03-28 |
Method And Apparatus For Locally Deforming An Optical Element For Photolithography App 20150085269 - Dmitriev; Vladimir ;   et al. | 2015-03-26 |
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