Steinberg; Walter

Patent Applications and Registrations

Patent applications and USPTO patent grants for Steinberg; Walter.The latest application filed is for "arrangement and method for improving the measurement accuracy in the nm range for optical systems".

Company Profile

0.2.5

Steinberg; Walter - Weilmuenster-Moettau DE
Steinberg; Walter - Weilmuenster-Moettnau DE
Steinberg; Walter - Weilmunster-Mottau DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Measuring system for structures on a substrate for semiconductor manufacture Grant 7,982,950 - Boesser , et al. July 19, 2	2011-07-19
Arrangement and method for improving the measurement accuracy in the nm range for optical systems App 20090066970 - Scheuring; Gerd ; et al.	2009-03-12
Device And Method For Improving The Measurement Accuracy In An Optical Cd Measurement System App 20090015833 - Heiden; Michael ; et al.	2009-01-15
Apparatus With Enhanced Resolution For Measuring Structures On A Substrate For Semiconductor Manufacture And Use Of Apertures In A Measuring Apparatus App 20080278790 - Boesser; Hans-Artur ; et al.	2008-11-13
Test mask for optical and electron optical systems Grant 7,416,819 - Steinberg , et al. August 26, 2	2008-08-26
Test mask for optical and electron optical systems. App 20070031739 - Steinberg; Walter ; et al.	2007-02-08
Apparatus and method for improving measuring accuracy in the determination of structural data App 20060274934 - Boesser; Hans-Artur ; et al.	2006-12-07

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