Steger; Robert J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Steger; Robert J..The latest application filed is for "method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support".

Company Profile

0.32.17

Steger; Robert J. - Los Altos CA
Steger; Robert J. - San Jose CA
Steger, Robert J. - Cupertino CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support Grant 8,921,740 - Benjamin , et al. December 30, 2	2014-12-30
Substrate support having dynamic temperature control Grant 8,747,559 - Steger June 10, 2	2014-06-10
Method And Apparatus For Controlling The Spatial Temperature Distribution Across The Surface Of A Workpiece Support App 20140034608 - Benjamin; Neil ; et al.	2014-02-06
Substrate Support Having Dynamic Temperature Control App 20110262315 - Steger; Robert J.	2011-10-27
Substrate support having dynamic temperature control Grant 7,993,460 - Steger August 9, 2	2011-08-09
Electrostatic chuck having radial temperature control capability Grant 7,718,932 - Steger May 18, 2	2010-05-18
Cleaning of electrostatic chucks using ultrasonic agitation and applied electric fields Grant 7,648,582 - Steger January 19, 2	2010-01-19
Methods Of Making Gas Distribution Members For Plasma Processing Apparatuses App 20090120583 - Steger; Robert J.	2009-05-14
Methods of making gas distribution members for plasma processing apparatuses Grant 7,480,974 - Steger January 27, 2	2009-01-27
Switched uniformity control Grant 7,282,454 - Gottscho , et al. October 16, 2	2007-10-16
Faraday Shield Disposed Within An Inductively Coupled Plasma Etching apparatus App 20070181257 - Comendant; Keith ; et al.	2007-08-09
Cleaning of electrostatic chucks using ultrasonic agitation and applied electric fields App 20070144554 - Steger; Robert J.	2007-06-28
Faraday shield disposed within an inductively coupled plasma etching apparatus Grant 7,223,321 - Comendant , et al. May 29, 2	2007-05-29
Electrostatic Chuck Having Radial Temperature Control Capability App 20070086144 - Steger; Robert J.	2007-04-19
Method and apparatus for the compensation of edge ring wear in a plasma processing chamber Grant 7,176,403 - Steger February 13, 2	2007-02-13
Electrostatic Chuck Having Radial Temperature Control Capability App 20070007276 - Steger; Robert J.	2007-01-11
Electrostatic chuck having radial temperature control capability Grant 7,161,121 - Steger January 9, 2	2007-01-09
Methods of making gas distribution members for plasma processing apparatuses App 20060180275 - Steger; Robert J.	2006-08-17
Methods and apparatus for in situ substrate temperature monitoring Grant 6,976,782 - Steger December 20, 2	2005-12-20
Method and apparatus for the compensation of edge ring wear in a plasma processing chamber Grant 6,896,765 - Steger May 24, 2	2005-05-24
Method and apparatus for the compensation of edge ring wear in a plasma processing chamber App 20050056622 - Steger, Robert J.	2005-03-17
Method for balancing return currents in plasma processing apparatus App 20050022736 - Steger, Robert J.	2005-02-03
Substrate support having dynamic temperature control App 20040261721 - Steger, Robert J.	2004-12-30
Low contamination plasma chamber components and methods for making the same App 20040224128 - Chang, Christopher C. ; et al.	2004-11-11
Low contamination plasma chamber components and methods for making the same Grant 6,805,952 - Chang , et al. October 19, 2	2004-10-19
Electrostatic chuck having dielectric member with stacked layers and manufacture App 20040190215 - Weldon, Edwin C. ; et al.	2004-09-30
Critical dimension variation compensation across a wafer by means of local wafer temperature control Grant 6,770,852 - Steger August 3, 2	2004-08-03
Electrostatic chuck having composite dielectric layer and method of manufacture Grant 6,721,162 - Weldon , et al. April 13, 2	2004-04-13
Method and apparatus for the compensation of edge ring wear in a plasma processing chamber App 20040053428 - Steger, Robert J.	2004-03-18
Switched uniformity control App 20040031564 - Gottscho, Richard A. ; et al.	2004-02-19
Switched uniformity control Grant 6,632,322 - Gottscho , et al. October 14, 2	2003-10-14
Electrostatic chuck having composite dielectric layer and method of manufacture App 20020135969 - Weldon, Edwin C. ; et al.	2002-09-26
Low contamination plasma chamber components and methods for making the same App 20020086118 - Chang, Christopher C. ; et al.	2002-07-04
Symmetric tunable inductively coupled HDP-CVD reactor Grant 6,170,428 - Redeker , et al. January 9, 2	2001-01-09
Electrostatic chuck having improved gas conduits Grant 6,108,189 - Weldon , et al. August 22, 2	2000-08-22
Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck Grant 5,904,776 - Donde , et al. May 18, 1	1999-05-18
Apparatus and method for cleaning of semiconductor process chamber surfaces Grant 5,788,799 - Steger , et al. August 4, 1	1998-08-04
Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck Grant 5,720,818 - Donde , et al. February 24, 1	1998-02-24
Method and structure for improving gas breakdown resistance and reducing the potential of arcing in an electrostatic chuck Grant 5,715,132 - Steger , et al. February 3, 1	1998-02-03
Method for supporting a wafer in a combined wafer support and temperature monitoring device Grant 5,567,909 - Sugarman , et al. October 22, 1	1996-10-22
Electrostatic chuck having a grooved surface Grant 5,522,131 - Steger June 4, 1	1996-06-04
Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances Grant 5,494,523 - Steger , et al. February 27, 1	1996-02-27
Combined wafer support and temperature monitoring device Grant 5,356,486 - Sugarman , et al. October 18, 1	1994-10-18
Uniformity for magnetically enhanced plasma chambers Grant 5,308,417 - Groechel , et al. May 3, 1	1994-05-03
Plasma etching apparatus with conductive means for inhibiting arcing Grant 5,292,399 - Lee , et al. March 8, 1	1994-03-08
Method of forming plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion Grant 5,268,200 - Steger December 7, 1	1993-12-07
Semiconductor wafer transfer in processing systems Grant 5,100,502 - Murdoch , et al. March 31, 1	1992-03-31
Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion Grant 5,085,727 - Steger February 4, 1	1992-02-04

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