Patent | Date |
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Method and structure for forming strained SI for CMOS devices Grant 7,928,443 - Steegen , et al. April 19, 2 | 2011-04-19 |
Selective silicon-on-insulator isolation structure and method Grant 7,923,786 - Steegen , et al. April 12, 2 | 2011-04-12 |
Method And Structure For Forming Strained Si For Cmos Devices App 20100109048 - STEEGEN; An L. ;   et al. | 2010-05-06 |
Method and structure for forming strained Si for CMOS devices Grant 7,700,951 - Steegen , et al. April 20, 2 | 2010-04-20 |
CMOS silicide metal gate integration Grant 7,655,557 - Amos , et al. February 2, 2 | 2010-02-02 |
Method and structure for forming strained SI for CMOS devices Grant 7,550,338 - Steegen , et al. June 23, 2 | 2009-06-23 |
Method And Structure For Forming Strained Si For Cmos Devices App 20080283824 - STEEGEN; An L. ;   et al. | 2008-11-20 |
Cmos Silicide Metal Gate Integration App 20080254622 - Amos; Ricky S. ;   et al. | 2008-10-16 |
Method and structure for forming strained SI for CMOS devices Grant 7,429,752 - Steegen , et al. September 30, 2 | 2008-09-30 |
CMOS silicide metal gate integration Grant 7,411,227 - Amos , et al. August 12, 2 | 2008-08-12 |
Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions Grant 7,396,714 - Chen , et al. July 8, 2 | 2008-07-08 |
Selective Silicon-on-insulator Isolation Structure And Method App 20080029818 - Steegen; An L. ;   et al. | 2008-02-07 |
Selective silicon-on-insulator isolation structure and method Grant 7,326,983 - Steegen , et al. February 5, 2 | 2008-02-05 |
Method And Structure For Forming Strained Si For Cmos Devices App 20080003735 - STEEGEN; An L. ;   et al. | 2008-01-03 |
Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions Grant 7,291,528 - Chen , et al. November 6, 2 | 2007-11-06 |
Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions App 20070249114 - Chen; Huajie ;   et al. | 2007-10-25 |
Method and structure for forming strained Si for CMOS devices Grant 7,129,126 - Steegen , et al. October 31, 2 | 2006-10-31 |
Method for forming self-aligned dual salicide in CMOS technologies Grant 7,112,481 - Fang , et al. September 26, 2 | 2006-09-26 |
CMOS silicide metal gate integration App 20060189061 - Amos; Ricky S. ;   et al. | 2006-08-24 |
Trench sidewall passivation for lateral RIE in a selective silicon-on-insulator process flow Grant 7,081,397 - Baiocco , et al. July 25, 2 | 2006-07-25 |
Method for forming self-aligned dual salicide in CMOS technologies Grant 7,067,368 - Fang , et al. June 27, 2 | 2006-06-27 |
Method for forming self-aligned dual salicide in CMOS technologies Grant 7,064,025 - Fang , et al. June 20, 2 | 2006-06-20 |
Method For Forming Self-aligned Dual Salicide In Cmos Technologies App 20060121662 - Fang; Sunfei ;   et al. | 2006-06-08 |
Method for forming self-aligned dual salicide in CMOS technologies App 20060121664 - Fang; Sunfei ;   et al. | 2006-06-08 |
Method For Forming Self-aligned Dual Salicide In Cmos Technologies App 20060121665 - Fang; Sunfei ;   et al. | 2006-06-08 |
CMOS silicide metal gate integration Grant 7,056,782 - Amos , et al. June 6, 2 | 2006-06-06 |
Trench sidewall passivation for lateral rie in a selective silicon-on-insulator process flow App 20060046428 - Baiocco; Christopher V. ;   et al. | 2006-03-02 |
Selective silicon-on-insulator isolation structure and method Grant 6,936,522 - Steegen , et al. August 30, 2 | 2005-08-30 |
CMOS silicide metal gate integration App 20050186747 - Amos, Ricky S. ;   et al. | 2005-08-25 |
Method for integration of silicide contacts and silicide gate metals Grant 6,927,117 - Cabral, Jr. , et al. August 9, 2 | 2005-08-09 |
Selective silicon-on-insulator isolation structure and method App 20050164468 - Steegen, An L. ;   et al. | 2005-07-28 |
Method for forming metal replacement gate of high performance Grant 6,921,711 - Cabral, Jr. , et al. July 26, 2 | 2005-07-26 |
Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions App 20050158931 - Chen, Huajie ;   et al. | 2005-07-21 |
Method for integration of silicide contacts and silicide gate metals App 20050118757 - Cabral, Cyril JR. ;   et al. | 2005-06-02 |
Structure and method of making strained semiconductor CMOS transistors having lattice-mismatched semiconductor regions underlying source and drain regions Grant 6,891,192 - Chen , et al. May 10, 2 | 2005-05-10 |
METHOD AND STRUCTURE FOR FORMING STRAINED Si FOR CMOS DEVICES App 20050093076 - Steegen, An L. ;   et al. | 2005-05-05 |
Silicide Proximity Structures For Cmos Device Performance Improvements App 20050064687 - Chidambarrao, Dureseti ;   et al. | 2005-03-24 |
Silicide proximity structures for CMOS device performance improvements Grant 6,869,866 - Chidambarrao , et al. March 22, 2 | 2005-03-22 |
Structure And Method For Metal Replacement Gate Of High Performance App 20050051854 - Cabral, Cyril JR. ;   et al. | 2005-03-10 |
Structure And Method Of Making Strained Semiconductor Cmos Transistors Having Lattice-mismatched Source And Drain Regions App 20050029601 - Chen, Huajie ;   et al. | 2005-02-10 |