Starzynski; John S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Starzynski; John S..The latest application filed is for "resonating beam accelerometer".

Company Profile

0.7.9

Starzynski; John S. - North Bend WA
Starzynski; John S. - Brooklyn Park MN
Starzynski, John S. - Plymouth MN
Starzynski; John S. - Salinas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resonating beam accelerometer Grant 9,784,758 - Starzynski October 10, 2	2017-10-10
Resonating Beam Accelerometer App 20150268267 - Starzynski; John S.	2015-09-24
Methods for making a sensitive resonating beam accelerometer Grant 9,009,947 - Starzynski April 21, 2	2015-04-21
Methods and apparatus for improving performance of an accelerometer Grant 8,485,032 - Starzynski July 16, 2	2013-07-16
Methods And Apparatus For Improving Performance Of An Accelerometer App 20120234094 - Starzynski; John S.	2012-09-20
Methods For Making A Sensitive Resonating Beam Accelerometer App 20120227495 - Starzynski; John S.	2012-09-13
Methods for making a sensitive resonating beam accelerometer Grant 8,176,617 - Starzynski May 15, 2	2012-05-15
Methods For Making A Sensitive Resonating Beam Accelerometer App 20110239440 - Starzynski; John S.	2011-10-06
Methods For Accurately Measuring The Thickness Of An Epitaxial Layer On A Silicon Wafer App 20090203156 - Starzynski; John S.	2009-08-13
Isotropic Silicon Etch Using Anisotropic Etchants App 20090111271 - Starzynski; John S.	2009-04-30
Selective removal chemistries for semiconductor applications, methods of production and uses thereof App 20060255315 - Yellowaga; Deborah L. ; et al.	2006-11-16
Equipment and process for creating a custom sloped etch in a substrate App 20050133479 - Youngner, Dan W. ; et al.	2005-06-23
Selective silicon etch chemistries, methods of production and uses thereof App 20050065050 - Starzynski, John S.	2005-03-24
Vertical fuse structure for integrated circuits containing an exposure window in the layer over the fuse structure to facilitate programming thereafter Grant 6,486,527 - MacPherson , et al. November 26, 2	2002-11-26

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