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Patent applications and USPTO patent grants for Starik; Sergey.The latest application filed is for "optical metrology models for in-line film thickness measurements".
Patent | Date |
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Optical Metrology Models For In-line Film Thickness Measurements App 20220290974 - Ng; Eric Chin Hong ;   et al. | 2022-09-15 |
Pecvd Process App 20200399756 - RAJAGOPALAN; Nagarajan ;   et al. | 2020-12-24 |
PECVD process Grant 10,793,954 - Rajagopalan , et al. October 6, 2 | 2020-10-06 |
Pecvd Process App 20180258535 - RAJAGOPALAN; Nagarajan ;   et al. | 2018-09-13 |
PECVD process Grant 10,060,032 - Rajagopalan , et al. August 28, 2 | 2018-08-28 |
PECVD apparatus and process Grant 10,030,306 - Rajagopalan , et al. July 24, 2 | 2018-07-24 |
Pecvd Process App 20180066364 - RAJAGOPALAN; Nagarajan ;   et al. | 2018-03-08 |
PECVD process Grant 9,816,187 - Rajagopalan , et al. November 14, 2 | 2017-11-14 |
Pecvd Process App 20170016118 - RAJAGOPALAN; Nagarajan ;   et al. | 2017-01-19 |
Method of aligning substrate-scale mask with substrate Grant 9,490,154 - Ravid , et al. November 8, 2 | 2016-11-08 |
PECVD process Grant 9,458,537 - Rajagopalan , et al. October 4, 2 | 2016-10-04 |
Substrate-scale Mask Alignment App 20160211185 - Ravid; Abraham ;   et al. | 2016-07-21 |
Pecvd Process App 20160017497 - RAJAGOPALAN; NAGARAJAN ;   et al. | 2016-01-21 |
PECVD process Grant 9,157,730 - Rajagopalan , et al. October 13, 2 | 2015-10-13 |
Pecvd Apparatus And Process App 20150226540 - Rajagopalan; Nagarajan ;   et al. | 2015-08-13 |
Measurement Of Film Thickness On An Arbitrary Substrate App 20150203966 - BUDIARTO; Edward ;   et al. | 2015-07-23 |
Pecvd Process App 20140118751 - RAJAGOPALAN; Nagarajan ;   et al. | 2014-05-01 |
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