Srinivasan; Sunil

Patent Applications and Registrations

Patent applications and USPTO patent grants for Srinivasan; Sunil.The latest application filed is for "cryogenic atomic layer etch with noble gases".

Company Profile

15.18.21

Srinivasan; Sunil - Milpitas CA
Srinivasan; Sunil - San Jose CA
Srinivasan; Sunil - Pleasanton CA
Srinivasan; Sunil - Milipitas CA
Srinivasan; Sunil - Tampa FL
Srinivasan; Sunil - Sunnyvale CA
Srinivasan, Sunil - St. Petersburg FL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Wafer edge ring lifting solution Grant 11,393,710 - Rice , et al. July 19, 2	2022-07-19
Method of controlling ion energy distribution using a pulse generator Grant 11,284,500 - Dorf , et al. March 22, 2	2022-03-22
Cryogenic Atomic Layer Etch With Noble Gases App 20210398815 - GARCIA DE GORORDO; Alvaro ; et al.	2021-12-23
Cryogenic atomic layer etch with noble gases Grant 11,087,989 - Garcia De Gorordo , et al. August 10, 2	2021-08-10
Universal process kit Grant 11,049,760 - Joubert , et al. June 29, 2	2021-06-29
Adjustable extended electrode for edge uniformity control Grant 10,991,556 - Luere , et al. April 27, 2	2021-04-27
In-situ Atomic Layer Deposition Process App 20200373149 - PARK; Sang Wook ; et al.	2020-11-26
Method Of Controlling Ion Energy Distribution Using A Pulse Generator App 20200352017 - DORF; Leonid ; et al.	2020-11-05
Method of controlling ion energy distribution using a pulse generator with a current-return output stage Grant 10,791,617 - Dorf , et al. September 29, 2	2020-09-29
Integrated Cleaning Process For Substrate Etching App 20200194242 - Zhou; Yi ; et al.	2020-06-18
Method Of Controlling Ion Energy Distribution Using A Pulse Generator With A Current-return Output Stage App 20200154556 - DORF; Leonid ; et al.	2020-05-14
Adjustable Extended Electrode For Edge Uniformity Control App 20200118798 - LUERE; Olivier ; et al.	2020-04-16
Method of controlling ion energy distribution using a pulse generator with a current-return output stage Grant 10,555,412 - Dorf , et al. Fe	2020-02-04
Adjustable extended electrode for edge uniformity control Grant 10,553,404 - Luere , et al. Fe	2020-02-04
In-situ Deposition Process App 20200027717 - PARK; Sang Wook ; et al.	2020-01-23
Adjustable extended electrode for edge uniformity control Grant 10,504,702 - Luere , et al. Dec	2019-12-10
Method Of Controlling Ion Energy Distribution Using A Pulse Generator With A Current-return Output Stage App 20190350072 - DORF; Leonid ; et al.	2019-11-14
Method of controlling ion energy distribution using a pulse generator with a current-return output stage Grant 10,448,494 - Dorf , et al. Oc	2019-10-15
Method of controlling ion energy distribution using a pulse generator with a current-return output stage Grant 10,448,495 - Dorf , et al. Oc	2019-10-15
Processing With Powered Edge Ring App 20190228952 - DORF; Leonid ; et al.	2019-07-25
Adjustable Extended Electrode For Edge Uniformity Control App 20180315583 - LUERE; Olivier ; et al.	2018-11-01
Adjustable extended electrode for edge uniformity control Grant 10,103,010 - Luere , et al. October 16, 2	2018-10-16
Adjustable Extended Electrode For Edge Uniformity Control App 20180233334 - LUERE; Olivier ; et al.	2018-08-16
Adjustable Extended Electrode For Edge Uniformity Control App 20180218933 - LUERE; Olivier ; et al.	2018-08-02
Adjustable extended electrode for edge uniformity control Grant 9,947,517 - Luere , et al. April 17, 2	2018-04-17
Systems And Methods For Controlling A Voltage Waveform At A Substrate During Plasma Processing App 20170358431 - DORF; LEONID ; et al.	2017-12-14
Composite edge ring Grant D797,691 - Joubert , et al. September 19, 2	2017-09-19
Universal Process Kit App 20170256435 - JOUBERT; Olivier ; et al.	2017-09-07
Wafer Edge Ring Lifting Solution App 20170213758 - RICE; Michael R. ; et al.	2017-07-27
Component For Semiconductor Process Chamber Having Surface Treatment To Reduce Particle Emission App 20160056059 - SUN; Jennifer ; et al.	2016-02-25
Multi-film stack etching with polymer passivation of an overlying etched layer Grant 8,747,684 - Srinivasan , et al. June 10, 2	2014-06-10
Method to minimize CD etch bias Grant 8,187,483 - Plumhoff , et al. May 29, 2	2012-05-29
Shallow trench isolation etch process Grant 8,133,817 - Sasano , et al. March 13, 2	2012-03-13
Multi-film Stack Etching With Polymer Passivation Of An Overlying Etched Layer App 20110045672 - Srinivasan; Sunil ; et al.	2011-02-24
Shallow Trench Isolation Etch Process App 20090170333 - Sasano; Hiroki ; et al.	2009-07-02
Method to Minimize CD Etch Bias App 20080035606 - Plumhoff; Jason ; et al.	2008-02-14
Notch-Free Etching of High Aspect SOI Structures Using A Time Division Multiplex Process and RF Bias Modulation App 20070175856 - Johnson; David ; et al.	2007-08-02
Notch-free etching of high aspect SOI structures using a time division multiplex process and RF bias modulation App 20050112891 - Johnson, David ; et al.	2005-05-26

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