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Photo-assisted Deposition Of Flowable Films App 20180040473 - UNDERWOOD; Brian Saxton ;   et al. | 2018-02-08 |
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Cyclic Sequential Processes For Forming High Quality Thin Films App 20160244879 - LIANG; Jingmei ;   et al. | 2016-08-25 |
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Development of high etch selective hardmask material by ion implantation into amorphous carbon films Grant 9,412,613 - Manna , et al. August 9, 2 | 2016-08-09 |
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Semiconductor Process Equipment App 20160218029 - JANAKIRAMAN; Karthik ;   et al. | 2016-07-28 |
Ultra-thin Dielectric Diffusion Barrier And Etch Stop Layer For Advanced Interconnect Applications App 20160172239 - PADHI; Deenesh ;   et al. | 2016-06-16 |
Processing System Containing An Isolation Region separating a Deposition chamber from a treatment chamber App 20160133489 - JANAKIRAMAN; Karthik ;   et al. | 2016-05-12 |
Method And Apparatus Of Processing Wafers With Compressive Or Tensile Stress At Elevated Temperatures In A Plasma Enhanced Chemical Vapor Deposition System App 20160049323 - YE; Zheng John ;   et al. | 2016-02-18 |
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System And Method For Personalized Add-on Purchase App 20160005070 - Burr; Jonathan R. ;   et al. | 2016-01-07 |
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Enabling Radical-based Deposition Of Dielectric Films App 20150167160 - CHEN; Yihong ;   et al. | 2015-06-18 |
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System And Method For Upload And Synchronization Of Media Content To Cloud Based Media Services App 20140304225 - SURESH; DEEPA ;   et al. | 2014-10-09 |
High Throughput Multi-layer Stack Deposition App 20140287593 - HAN; Xinhai ;   et al. | 2014-09-25 |
Small Plasma Chamber Systems and Methods App 20140151333 - Gottscho; Richard ;   et al. | 2014-06-05 |
High lifetime consumable silicon nitride-silicon dioxide plasma processing components Grant 8,622,021 - Taylor , et al. January 7, 2 | 2014-01-07 |
Hierarchical rate limiting of control packets Grant 8,576,866 - Gupta , et al. November 5, 2 | 2013-11-05 |
Methods for RF pulsing of a narrow gap capacitively coupled reactor Grant 8,337,713 - Loewenhardt , et al. December 25, 2 | 2012-12-25 |
Hierarchical Rate Limiting Of Control Packets App 20120195323 - Gupta; Anubhav ;   et al. | 2012-08-02 |
Process tuning gas injection from the substrate edge Grant 8,097,120 - Dhindsa , et al. January 17, 2 | 2012-01-17 |
RF pulsing of a narrow gap capacitively coupled reactor Grant 7,976,673 - Loewenhardt , et al. July 12, 2 | 2011-07-12 |
Small Plasma Chamber Systems And Methods App 20110132874 - Gottscho; Richard ;   et al. | 2011-06-09 |
High Lifetime Consumable Silicon Nitride-silicon Dioxide Plasma Processing Components App 20110021031 - Taylor; Travis R. ;   et al. | 2011-01-27 |
Hardmask Open And Etch Profile Control With Hardmask Open App 20100327413 - Lee; Jong Pil ;   et al. | 2010-12-30 |
Hierarchical Rate Limiting of Control Packets App 20100278191 - Gupta; Anubhav ;   et al. | 2010-11-04 |
High aspect ratio etch using modulation of RF powers of various frequencies Grant 7,749,353 - Rusu , et al. July 6, 2 | 2010-07-06 |
Etch profile control Grant 7,645,707 - Rusu , et al. January 12, 2 | 2010-01-12 |
Process for etching dielectric films with improved resist and/or etch profile characteristics Grant 7,547,635 - Eppler , et al. June 16, 2 | 2009-06-16 |
Multiple frequency plasma processor method and apparatus Grant 7,405,521 - Dhindsa , et al. July 29, 2 | 2008-07-29 |
Integrated capacitive and inductive power sources for a plasma etching chamber App 20070199658 - Dhindsa; Rajinder ;   et al. | 2007-08-30 |
Process tuning gas injection from the substrate edge App 20070193688 - Dhindsa; Rajinder ;   et al. | 2007-08-23 |
High aspect ratio etch using modulation of RF powers of various frequencies App 20070012659 - Rusu; Camelia ;   et al. | 2007-01-18 |
High aspect ratio etch using modulation of RF powers of various frequencies Grant 7,144,521 - Rusu , et al. December 5, 2 | 2006-12-05 |
Etch profile control App 20060226120 - Rusu; Camelia ;   et al. | 2006-10-12 |
Chamber configuration for confining a plasma Grant 7,094,315 - Chen , et al. August 22, 2 | 2006-08-22 |
High aspect ratio etch using modulation of RF powers of various frequencies App 20060118518 - Rusu; Camelia ;   et al. | 2006-06-08 |
Plasma processor in plasma confinement region within a vacuum chamber Grant 6,984,288 - Dhindsa , et al. January 10, 2 | 2006-01-10 |
Methods of reducing photoresist distortion while etching in a plasma processing system Grant 6,942,816 - Rusu , et al. September 13, 2 | 2005-09-13 |
Chamber configuration for confining a plasma App 20050103442 - Chen, Jian J. ;   et al. | 2005-05-19 |
Chamber configuration for confining a plasma Grant 6,872,281 - Chen , et al. March 29, 2 | 2005-03-29 |
Multiple frequency plasma etch reactor App 20050039682 - Dhindsa, Raj ;   et al. | 2005-02-24 |
Stepped upper electrode for plasma processing uniformity Grant 6,824,627 - Dhindsa , et al. November 30, 2 | 2004-11-30 |
RF pulsing of a narrow gap capacitively coupled reactor App 20040221958 - Loewenhardt, Peter ;   et al. | 2004-11-11 |
Methods of reducing photoresist distortion while etching in a plasma processing system App 20040155012 - Rusu, Camelia ;   et al. | 2004-08-12 |
Probe for direct wafer potential measurements Grant 6,714,033 - Makhratchev , et al. March 30, 2 | 2004-03-30 |
Process for etching dielectric films with improved resist and/or etch profile characteristics App 20030232504 - Eppler, Aaron ;   et al. | 2003-12-18 |
Dual frequency plasma processor App 20030029567 - Dhindsa, Rajinder ;   et al. | 2003-02-13 |
Stepped upper electrode for plasma processing uniformity App 20020187647 - Dhindsa, Rajinder ;   et al. | 2002-12-12 |
Stepped upper electrode for plasma processing uniformity Grant 6,391,787 - Dhindsa , et al. May 21, 2 | 2002-05-21 |