Sputtering Components, Inc.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Sputtering Components, Inc..The latest application filed is for "magnetic force release for sputtering sources with magnetic target materials".
- Sputtering Components, Inc. - Owatonna MN US
- Sputtering Components, Inc. - Livermore CA
- Sputtering Components, Inc. -
Trademarks
| Patent | Date |
|---|---|
| Magnetic force release for sputtering sources with magnetic target materials Grant 10,727,034 - Morse , et al. | 2020-07-28 |
| Magnetic Force Release For Sputtering Sources With Magnetic Target Materials App 20190057848 - Morse; Patrick Lawrence ; et al. | 2019-02-21 |
| Sputtering apparatus Grant RE46,599 - Crowley , et al. November 7, 2 | 2017-11-07 |
| Dual Power Feed Rotary Sputtering Cathode App 20170278685 - Crowley; Daniel Theodore ; et al. | 2017-09-28 |
| Sputtering apparatus Grant 9,758,862 - Morse September 12, 2 | 2017-09-12 |
| Sputtering apparatus Grant 9,418,823 - Crowley , et al. August 16, 2 | 2016-08-16 |
| Sputtering Apparatus App 20160225591 - Crowley; Daniel Theodore ; et al. | 2016-08-04 |
| Plasma enhanced chemical vapor deposition (PECVD) source Grant 9,406,487 - Crowley , et al. August 2, 2 | 2016-08-02 |
| Sputtering apparatus Grant 9,312,108 - Crowley , et al. April 12, 2 | 2016-04-12 |
| Ion Control For A Plasma Source App 20160064191 - Morse; Patrick Lawrence | 2016-03-03 |
| Ion control for a plasma source Grant 9,198,274 - Morse November 24, 2 | 2015-11-24 |
| Decentralized Process Controller App 20150120001 - German; John Robert ; et al. | 2015-04-30 |
| Sputtering apparatus Grant 8,900,428 - Crowley , et al. December 2, 2 | 2014-12-02 |
| Sputtering Apparatus App 20140246310 - Crowley; Daniel Theodore ; et al. | 2014-09-04 |
| Sputtering Apparatus App 20140246312 - Crowley; Daniel Theodore ; et al. | 2014-09-04 |
| Plasma Enhanced Chemical Vapor Deposition (pecvd) Source App 20140184073 - Crowley; Daniel Theodore ; et al. | 2014-07-03 |
| Sputtering Apparatus App 20140061029 - Morse; Patrick Lawrence | 2014-03-06 |
| Ion Control For A Plasma Source App 20140007813 - Morse; Patrick Lawrence | 2014-01-09 |
| Rotary Cathodes For Magnetron Sputtering System App 20130032476 - Crowley; Daniel Theodore ; et al. | 2013-02-07 |
| Sputtering Apparatus App 20120175251 - Crowley; Daniel Theodore ; et al. | 2012-07-12 |
| Rotary cathode for magnetron sputtering apparatus Grant 8,182,662 - Crowley May 22, 2 | 2012-05-22 |
| Indexing Magnet Assembly For Rotary Sputtering Cathode App 20110155568 - Crowley; Daniel Theodore ; et al. | 2011-06-30 |
| Mechanical Seal Assembly For A Rotatable Shaft App 20110024987 - Crowley; Daniel Theodore | 2011-02-03 |
| Rotary Cathode For Magnetron Sputtering Apparatus App 20100243428 - Crowley; Daniel Theodore | 2010-09-30 |
| Cylindrical magnetron target and spindle apparatus Grant 6,905,579 - Crowley June 14, 2 | 2005-06-14 |
| High-power ion sputtering magnetron Grant 6,841,051 - Crowley January 11, 2 | 2005-01-11 |
| High-power ion sputtering magnetron App 20030173217 - Crowley, Daniel T. | 2003-09-18 |
| NCAGE Code | 7UE45 | SPUTTERING COMPONENTS, INC.!DBA SPUTTERING COMPONENTS |
| CAGE Code | 7UE45 | SPUTTERING COMPONENTS, INC. SPUTTERING COMPONENTS |
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