Sproul; William D.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sproul; William D..The latest application filed is for "sensor array for measuring plasma characteristics in plasma processing environments".

Company Profile

0.10.2

Sproul; William D. - Fort Collins CO US
Sproul; William D. - Palatine IL
Sproul; William D. - Palantine IL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sensor array for measuring plasma characteristics in plasma processing environments Grant 8,545,669 - Mahoney , et al. October 1, 2	2013-10-01
Sensor array for measuring plasma characteristics in plasma processing environments App 20050151544 - Mahoney, Leonard J. ; et al.	2005-07-14
Sensor array for measuring plasma characteristics in plasma processing environments Grant 6,902,646 - Mahoney , et al. June 7, 2	2005-06-07
Sensor array for measuring plasma characteristics in plasma processing enviroments App 20050034811 - Mahoney, Leonard J. ; et al.	2005-02-17
Method for sputtering compounds on a substrate Grant 5,942,089 - Sproul , et al. August 24, 1	1999-08-24
Multilayer oxide coatings Grant 5,789,071 - Sproul , et al. August 4, 1	1998-08-04
Polycrystalline supperlattice coated substrate and method/apparatus for making same Grant 5,783,295 - Barnett , et al. July 21, 1	1998-07-21
Superhard composite materials including compounds of carbon and nitrogen deposited on metal and metal nitride, carbide and carbonitride Grant 5,776,615 - Wong , et al. July 7, 1	1998-07-07
Superhard composite materials including compounds of carbon and nitrogen deposited on metal and metal nitride carbide and carbonitride Grant 5,725,913 - Wong , et al. March 10, 1	1998-03-10
Process and kit for working metals Grant 4,670,172 - Sproul , et al. June 2, 1	1987-06-02
Rapid rate reactive sputtering of metallic compounds Grant 4,428,812 - Sproul January 31, 1	1984-01-31

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